DE69400103D1 - Verfahren und Vorrichtung zur Überwachung des Borgehalts in Borophosphosilikat - Google Patents
Verfahren und Vorrichtung zur Überwachung des Borgehalts in BorophosphosilikatInfo
- Publication number
- DE69400103D1 DE69400103D1 DE69400103T DE69400103T DE69400103D1 DE 69400103 D1 DE69400103 D1 DE 69400103D1 DE 69400103 T DE69400103 T DE 69400103T DE 69400103 T DE69400103 T DE 69400103T DE 69400103 D1 DE69400103 D1 DE 69400103D1
- Authority
- DE
- Germany
- Prior art keywords
- borophosphosilicate
- monitoring
- boron content
- boron
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/11—Automated chemical analysis
- Y10T436/117497—Automated chemical analysis with a continuously flowing sample or carrier stream
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/11—Automated chemical analysis
- Y10T436/117497—Automated chemical analysis with a continuously flowing sample or carrier stream
- Y10T436/118339—Automated chemical analysis with a continuously flowing sample or carrier stream with formation of a segmented stream
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/22—Hydrogen, per se
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9304069A FR2703797B1 (fr) | 1993-04-06 | 1993-04-06 | Procede et dispositif de controle de la teneur en bore de borophosphosilicate. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69400103D1 true DE69400103D1 (de) | 1996-04-25 |
DE69400103T2 DE69400103T2 (de) | 1996-08-22 |
Family
ID=9445808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69400103T Expired - Fee Related DE69400103T2 (de) | 1993-04-06 | 1994-04-01 | Verfahren und Vorrichtung zur Überwachung des Borgehalts in Borophosphosilikat |
Country Status (4)
Country | Link |
---|---|
US (2) | US5441893A (de) |
EP (1) | EP0619385B1 (de) |
DE (1) | DE69400103T2 (de) |
FR (1) | FR2703797B1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100453658B1 (ko) * | 1998-01-08 | 2004-12-17 | 삼성전자주식회사 | 엑스피에스를 이용한 비피에스지 막질의 농도 분석 방법 및 그를 위한 프로그램을 저장한 기록매체 |
DE10115750B4 (de) * | 2001-03-20 | 2017-05-24 | Robert Bosch Gmbh | Verfahren und Vorrichtung zur Steuerung und/oder Diagnose eines einen Massenstrom beeinflussenden Steuersystems |
US7142987B2 (en) * | 2001-11-07 | 2006-11-28 | Genvault Corporation | Apparatus, system, and method of archival and retrieval of samples |
US7682557B2 (en) * | 2006-12-15 | 2010-03-23 | Smith International, Inc. | Multiple processes of high pressures and temperatures for sintered bodies |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4226898A (en) * | 1978-03-16 | 1980-10-07 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process |
JPS5933532B2 (ja) * | 1981-04-03 | 1984-08-16 | スタンレー電気株式会社 | 非晶質シリコンの形成方法 |
US4369031A (en) * | 1981-09-15 | 1983-01-18 | Thermco Products Corporation | Gas control system for chemical vapor deposition system |
US4379943A (en) * | 1981-12-14 | 1983-04-12 | Energy Conversion Devices, Inc. | Current enhanced photovoltaic device |
US4532196A (en) * | 1982-01-25 | 1985-07-30 | Stanley Electric Co., Ltd. | Amorphous silicon photoreceptor with nitrogen and boron |
AU1760483A (en) * | 1982-08-05 | 1984-02-09 | Treloar, W.J. And Sons Pty. Ltd. | Resonant sensor for distinguishing fluids |
US4557950A (en) * | 1984-05-18 | 1985-12-10 | Thermco Systems, Inc. | Process for deposition of borophosphosilicate glass |
EP0204182B1 (de) * | 1985-05-22 | 1991-06-05 | Siemens Aktiengesellschaft | Verfahren zum Herstellen von mit Bor und Phosphor dotierten Siliziumoxid-Schichten für integrierte Halbleiterschaltungen |
US4845043A (en) * | 1987-04-23 | 1989-07-04 | Catalano Anthony W | Method for fabricating photovoltaic device having improved short wavelength photoresponse |
US5200043A (en) * | 1989-11-08 | 1993-04-06 | Mitsui Toatsu Chemicals, Inc. | Method for treating waste gas |
JP2643529B2 (ja) * | 1990-04-06 | 1997-08-20 | 日本電気株式会社 | ガスソース分子線エピタキシャル成長装置 |
DE4035032C1 (de) * | 1990-11-03 | 1992-04-30 | Degussa Ag, 6000 Frankfurt, De | |
US5231047A (en) * | 1991-12-19 | 1993-07-27 | Energy Conversion Devices, Inc. | High quality photovoltaic semiconductor material and laser ablation method of fabrication same |
-
1993
- 1993-04-06 FR FR9304069A patent/FR2703797B1/fr not_active Expired - Fee Related
-
1994
- 1994-04-01 EP EP94400725A patent/EP0619385B1/de not_active Expired - Lifetime
- 1994-04-01 DE DE69400103T patent/DE69400103T2/de not_active Expired - Fee Related
- 1994-04-04 US US08/221,965 patent/US5441893A/en not_active Expired - Lifetime
-
1995
- 1995-03-17 US US08/405,770 patent/US5468642A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5468642A (en) | 1995-11-21 |
FR2703797B1 (fr) | 1995-06-23 |
EP0619385A1 (de) | 1994-10-12 |
US5441893A (en) | 1995-08-15 |
EP0619385B1 (de) | 1996-03-20 |
DE69400103T2 (de) | 1996-08-22 |
FR2703797A1 (fr) | 1994-10-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |