DE69327439D1 - Vorrichtung und Verfahren zum Herstellen von inneren Totalreflexionshologrammen hoher Uniformität - Google Patents
Vorrichtung und Verfahren zum Herstellen von inneren Totalreflexionshologrammen hoher UniformitätInfo
- Publication number
- DE69327439D1 DE69327439D1 DE69327439T DE69327439T DE69327439D1 DE 69327439 D1 DE69327439 D1 DE 69327439D1 DE 69327439 T DE69327439 T DE 69327439T DE 69327439 T DE69327439 T DE 69327439T DE 69327439 D1 DE69327439 D1 DE 69327439D1
- Authority
- DE
- Germany
- Prior art keywords
- total reflection
- high uniformity
- internal total
- reflection holograms
- producing internal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9221561A GB2271648B (en) | 1992-10-14 | 1992-10-14 | Apparatus and method for the manufacture of high uniformity total internal reflection holograms |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69327439D1 true DE69327439D1 (de) | 2000-02-03 |
| DE69327439T2 DE69327439T2 (de) | 2000-08-10 |
Family
ID=10723423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69327439T Expired - Fee Related DE69327439T2 (de) | 1992-10-14 | 1993-10-08 | Vorrichtung und Verfahren zum Herstellen von inneren Totalreflexionshologrammen hoher Uniformität |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0593124B1 (de) |
| JP (1) | JP3602560B2 (de) |
| KR (1) | KR100311443B1 (de) |
| DE (1) | DE69327439T2 (de) |
| GB (1) | GB2271648B (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0627666B1 (de) * | 1993-05-24 | 2003-02-05 | Holtronic Technologies Plc | Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters |
| GB2311144B (en) * | 1996-03-12 | 2000-05-24 | Holtronic Technologies Ltd | Method and apparatus for holographically recording an essentially periodic pattern |
| JPH09288444A (ja) * | 1996-04-23 | 1997-11-04 | Komatsu Ltd | 共焦点光学装置及びホログラム露光装置 |
| US6549309B1 (en) * | 1998-02-10 | 2003-04-15 | Illinois Tool Works Inc. | Holography apparatus, method and product |
| US6388780B1 (en) | 2000-05-11 | 2002-05-14 | Illinois Tool Works Inc. | Hologram production technique |
| JP4524992B2 (ja) | 2003-01-28 | 2010-08-18 | セイコーエプソン株式会社 | 薄膜トランジスタ型表示装置、薄膜素子の製造方法、薄膜トランジスタ回路基板、電気光学装置および電子機器 |
| JP4370563B2 (ja) | 2003-09-22 | 2009-11-25 | セイコーエプソン株式会社 | ホログラム露光方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3551018A (en) * | 1969-05-01 | 1970-12-29 | Karl A Stetson | Total internal reflection holography |
| US3650605A (en) * | 1970-10-15 | 1972-03-21 | Xerox Corp | Interferometric apparatus with controlled scanning means |
| GB8908871D0 (en) * | 1989-04-19 | 1989-06-07 | Hugle William B | Manufacture of flat panel displays |
| GB8922341D0 (en) * | 1989-10-04 | 1989-11-22 | Holtronic Technologies Ltd | Apparatus for and method of optical inspection in a total internal reflection holographic imaging system |
-
1992
- 1992-10-14 GB GB9221561A patent/GB2271648B/en not_active Expired - Fee Related
-
1993
- 1993-10-08 DE DE69327439T patent/DE69327439T2/de not_active Expired - Fee Related
- 1993-10-08 EP EP93202866A patent/EP0593124B1/de not_active Expired - Lifetime
- 1993-10-14 KR KR1019930021258A patent/KR100311443B1/ko not_active IP Right Cessation
- 1993-10-14 JP JP25701893A patent/JP3602560B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| GB9221561D0 (en) | 1992-11-25 |
| DE69327439T2 (de) | 2000-08-10 |
| EP0593124B1 (de) | 1999-12-29 |
| EP0593124A2 (de) | 1994-04-20 |
| JP3602560B2 (ja) | 2004-12-15 |
| KR100311443B1 (ko) | 2001-12-28 |
| KR940009787A (ko) | 1994-05-24 |
| GB2271648B (en) | 1996-04-03 |
| JPH06308872A (ja) | 1994-11-04 |
| GB2271648A (en) | 1994-04-20 |
| EP0593124A3 (en) | 1994-08-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |