DE69326920T2 - Verfahren zum prüfen von artikeln - Google Patents

Verfahren zum prüfen von artikeln

Info

Publication number
DE69326920T2
DE69326920T2 DE69326920T DE69326920T DE69326920T2 DE 69326920 T2 DE69326920 T2 DE 69326920T2 DE 69326920 T DE69326920 T DE 69326920T DE 69326920 T DE69326920 T DE 69326920T DE 69326920 T2 DE69326920 T2 DE 69326920T2
Authority
DE
Germany
Prior art keywords
checking items
checking
items
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69326920T
Other languages
English (en)
Other versions
DE69326920D1 (de
Inventor
Zeev Smilansky
Moshe Nissim
Eyal Harel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbotech Ltd
Orbotech Inc
Original Assignee
Orbotech Ltd
Orbotech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd, Orbotech Inc filed Critical Orbotech Ltd
Application granted granted Critical
Publication of DE69326920D1 publication Critical patent/DE69326920D1/de
Publication of DE69326920T2 publication Critical patent/DE69326920T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/74—Image or video pattern matching; Proximity measures in feature spaces
    • G06V10/75—Organisation of the matching processes, e.g. simultaneous or sequential comparisons of image or video features; Coarse-fine approaches, e.g. multi-scale approaches; using context analysis; Selection of dictionaries
    • G06V10/751—Comparing pixel values or logical combinations thereof, or feature values having positional relevance, e.g. template matching
    • G06V10/7515—Shifting the patterns to accommodate for positional errors
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N7/00—Television systems
    • H04N7/18—Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G01N2021/95615—Inspecting patterns on the surface of objects using a comparative method with stored comparision signal
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Biochemistry (AREA)
  • Evolutionary Computation (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Artificial Intelligence (AREA)
  • Computing Systems (AREA)
  • Databases & Information Systems (AREA)
  • Pathology (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Signal Processing (AREA)
  • Image Analysis (AREA)
DE69326920T 1992-01-31 1993-01-28 Verfahren zum prüfen von artikeln Expired - Fee Related DE69326920T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IL10082492A IL100824A (en) 1992-01-31 1992-01-31 Method of inspecting articles
PCT/US1993/000791 WO1993015474A1 (en) 1992-01-31 1993-01-28 Method of inspecting articles

Publications (2)

Publication Number Publication Date
DE69326920D1 DE69326920D1 (de) 1999-12-09
DE69326920T2 true DE69326920T2 (de) 2000-04-20

Family

ID=11063330

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69326920T Expired - Fee Related DE69326920T2 (de) 1992-01-31 1993-01-28 Verfahren zum prüfen von artikeln

Country Status (5)

Country Link
EP (1) EP0578816B1 (de)
JP (1) JPH07504978A (de)
DE (1) DE69326920T2 (de)
IL (1) IL100824A (de)
WO (1) WO1993015474A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10025751A1 (de) * 2000-05-24 2001-12-06 Atg Test Systems Gmbh Verfahren zum Untersuchen einer leiterplatte an einem vorbestimmten Bereich der Leiterplatte und Vorrichtung zum Durchführen des Verfahrens

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5517234A (en) * 1993-10-26 1996-05-14 Gerber Systems Corporation Automatic optical inspection system having a weighted transition database
US6975755B1 (en) 1999-11-25 2005-12-13 Canon Kabushiki Kaisha Image processing method and apparatus
GB2359884B (en) * 1999-11-25 2004-06-30 Canon Kk Image processing method and apparatus
DE10043726C2 (de) * 2000-09-05 2003-12-04 Atg Test Systems Gmbh Verfahren zum Prüfen von Leiterplatten mit einem Paralleltester und eine Vorrichtung zum Ausführen des Verfahrens
JP2007286003A (ja) * 2006-04-20 2007-11-01 Pioneer Electronic Corp 外観計測装置、外観計測方法、及び外観計測プログラム
JP2010237210A (ja) * 2009-03-30 2010-10-21 Koh Young Technology Inc 検査方法
DE102016111200A1 (de) 2016-06-20 2017-12-21 Noris Automation Gmbh Verfahren und Vorrichtung zur berührungslosen funktionalen Überprüfung elektronischer Bauelemente in Schaltungsanordnungen mit örtlicher Fehlerlokalisierung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247203A (en) * 1978-04-03 1981-01-27 Kla Instrument Corporation Automatic photomask inspection system and apparatus
US4926489A (en) * 1983-03-11 1990-05-15 Kla Instruments Corporation Reticle inspection system
JPS61213612A (ja) * 1985-03-19 1986-09-22 Hitachi Ltd プリント基板のパタ−ン検査装置
US4805123B1 (en) * 1986-07-14 1998-10-13 Kla Instr Corp Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems
US4783826A (en) * 1986-08-18 1988-11-08 The Gerber Scientific Company, Inc. Pattern inspection system
JPH02148180A (ja) * 1988-11-29 1990-06-07 Nippon Seiko Kk パターン検査方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10025751A1 (de) * 2000-05-24 2001-12-06 Atg Test Systems Gmbh Verfahren zum Untersuchen einer leiterplatte an einem vorbestimmten Bereich der Leiterplatte und Vorrichtung zum Durchführen des Verfahrens

Also Published As

Publication number Publication date
WO1993015474A1 (en) 1993-08-05
JPH07504978A (ja) 1995-06-01
EP0578816A1 (de) 1994-01-19
IL100824A0 (en) 1992-09-06
IL100824A (en) 1996-12-05
EP0578816A4 (en) 1994-07-20
EP0578816B1 (de) 1999-11-03
DE69326920D1 (de) 1999-12-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee