DE69324616D1 - Mehrfach ungesättigte Diazoniumverbindungen - Google Patents

Mehrfach ungesättigte Diazoniumverbindungen

Info

Publication number
DE69324616D1
DE69324616D1 DE69324616T DE69324616T DE69324616D1 DE 69324616 D1 DE69324616 D1 DE 69324616D1 DE 69324616 T DE69324616 T DE 69324616T DE 69324616 T DE69324616 T DE 69324616T DE 69324616 D1 DE69324616 D1 DE 69324616D1
Authority
DE
Germany
Prior art keywords
diazonium compounds
polyunsaturated
polyunsaturated diazonium
compounds
diazonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69324616T
Other languages
English (en)
Other versions
DE69324616T2 (de
Inventor
Michael John Pratt
Jianrong Ren
John Robert Wade
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Application granted granted Critical
Publication of DE69324616D1 publication Critical patent/DE69324616D1/de
Publication of DE69324616T2 publication Critical patent/DE69324616T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/82—Nitrogen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
  • Paints Or Removers (AREA)
DE1993624616 1992-01-21 1993-01-21 Mehrfach ungesättigte Diazoniumverbindungen Expired - Fee Related DE69324616T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9201237A GB2263906B (en) 1992-01-21 1992-01-21 Improvements in or relating to polyunsaturated diazonium compounds

Publications (2)

Publication Number Publication Date
DE69324616D1 true DE69324616D1 (de) 1999-06-02
DE69324616T2 DE69324616T2 (de) 1999-10-28

Family

ID=10708964

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1993624616 Expired - Fee Related DE69324616T2 (de) 1992-01-21 1993-01-21 Mehrfach ungesättigte Diazoniumverbindungen

Country Status (5)

Country Link
EP (1) EP0554006B1 (de)
JP (1) JPH0687817A (de)
CA (1) CA2083545A1 (de)
DE (1) DE69324616T2 (de)
GB (1) GB2263906B (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4705135B2 (ja) * 2001-10-31 2011-06-22 三菱製紙株式会社 感光性組成物
JP2005200335A (ja) * 2004-01-15 2005-07-28 Fuji Photo Film Co Ltd ジアゾニウム塩及び記録材料

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1000315B (it) * 1972-12-14 1976-03-30 Polychrome Corp Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
FI71845C (fi) * 1979-12-18 1987-02-09 Vickers Ltd Foerbaettringar angaoende straolningskaensliga material.
DE3605717A1 (de) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. Durch strahlung polymerisierbares gemisch

Also Published As

Publication number Publication date
GB9201237D0 (en) 1992-03-11
JPH0687817A (ja) 1994-03-29
DE69324616T2 (de) 1999-10-28
GB2263906A (en) 1993-08-11
GB2263906B (en) 1995-11-08
EP0554006B1 (de) 1999-04-28
EP0554006A1 (de) 1993-08-04
CA2083545A1 (en) 1993-07-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee