DE69324386T2 - Mechanisch stabile Feldemissionsquelle - Google Patents

Mechanisch stabile Feldemissionsquelle

Info

Publication number
DE69324386T2
DE69324386T2 DE69324386T DE69324386T DE69324386T2 DE 69324386 T2 DE69324386 T2 DE 69324386T2 DE 69324386 T DE69324386 T DE 69324386T DE 69324386 T DE69324386 T DE 69324386T DE 69324386 T2 DE69324386 T2 DE 69324386T2
Authority
DE
Germany
Prior art keywords
field emission
emission source
mechanically stable
stable field
mechanically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69324386T
Other languages
English (en)
Other versions
DE69324386D1 (de
Inventor
Mark A Gesley
Daniel B Debra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of DE69324386D1 publication Critical patent/DE69324386D1/de
Application granted granted Critical
Publication of DE69324386T2 publication Critical patent/DE69324386T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69324386T 1992-01-24 1993-01-18 Mechanisch stabile Feldemissionsquelle Expired - Fee Related DE69324386T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/828,538 US5304888A (en) 1992-01-24 1992-01-24 Mechanically stable field emission gun

Publications (2)

Publication Number Publication Date
DE69324386D1 DE69324386D1 (de) 1999-05-20
DE69324386T2 true DE69324386T2 (de) 1999-08-26

Family

ID=25252100

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69324386T Expired - Fee Related DE69324386T2 (de) 1992-01-24 1993-01-18 Mechanisch stabile Feldemissionsquelle

Country Status (6)

Country Link
US (1) US5304888A (de)
EP (1) EP0552700B1 (de)
JP (1) JP3148035B2 (de)
KR (1) KR0174565B1 (de)
CA (1) CA2086976A1 (de)
DE (1) DE69324386T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9472382B2 (en) 2007-04-23 2016-10-18 Plasmology4, Inc. Cold plasma annular array methods and apparatus
US7633231B2 (en) 2007-04-23 2009-12-15 Cold Plasma Medical Technologies, Inc. Harmonic cold plasma device and associated methods
US9440057B2 (en) 2012-09-14 2016-09-13 Plasmology4, Inc. Therapeutic applications of cold plasma
US9656095B2 (en) 2007-04-23 2017-05-23 Plasmology4, Inc. Harmonic cold plasma devices and associated methods
US10039927B2 (en) 2007-04-23 2018-08-07 Plasmology4, Inc. Cold plasma treatment devices and associated methods
US8926715B2 (en) 2007-12-06 2015-01-06 Eliiy Power Co., Ltd. Method and apparatus for manufacturing electrode assembly for rectangular battery
CA2776935C (en) * 2009-10-12 2018-10-09 Perkinelmer Health Sciences, Inc. Assemblies for ion and electron sources and methods of use
WO2013040454A1 (en) 2011-09-15 2013-03-21 Cold Plasma Medical Technologies, Inc. Cold plasma treatment devices and associated methods
EP2931067B1 (de) 2012-12-11 2018-02-07 Plasmology4, Inc. Verfahren und vorrichtung für kaltplasma-lebensmittelkontaktflächendesinfizierung
WO2014106258A1 (en) 2012-12-31 2014-07-03 Cold Plasma Medical Technologies, Inc. Cold plasma electroporation of medication and associated methods

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
US4446403A (en) * 1982-05-26 1984-05-01 International Business Machines Corporation Compact plug connectable ion source
US4748369A (en) * 1986-04-10 1988-05-31 Star Microwave Electron gun assembly useful with traveling wave tubes
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5196707A (en) * 1991-03-04 1993-03-23 Etec Systems, Inc. Low aberration field emission electron gun

Also Published As

Publication number Publication date
US5304888A (en) 1994-04-19
JPH076723A (ja) 1995-01-10
DE69324386D1 (de) 1999-05-20
KR0174565B1 (ko) 1999-02-01
KR930017078A (ko) 1993-08-30
JP3148035B2 (ja) 2001-03-19
EP0552700A1 (de) 1993-07-28
EP0552700B1 (de) 1999-04-14
CA2086976A1 (en) 1993-07-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8327 Change in the person/name/address of the patent owner

Owner name: APPLIED MATERIALS, INC. (N.D.GES.D. STAATES DELAWA