DE69320517D1 - Photoempfindliches Laminat mit Doppelzwischenschichten - Google Patents

Photoempfindliches Laminat mit Doppelzwischenschichten

Info

Publication number
DE69320517D1
DE69320517D1 DE69320517T DE69320517T DE69320517D1 DE 69320517 D1 DE69320517 D1 DE 69320517D1 DE 69320517 T DE69320517 T DE 69320517T DE 69320517 T DE69320517 T DE 69320517T DE 69320517 D1 DE69320517 D1 DE 69320517D1
Authority
DE
Germany
Prior art keywords
intermediate layers
photosensitive laminate
double intermediate
double
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69320517T
Other languages
English (en)
Other versions
DE69320517T2 (de
Inventor
Vinai M Tara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eternal Technology Corp
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton International LLC filed Critical Morton International LLC
Publication of DE69320517D1 publication Critical patent/DE69320517D1/de
Application granted granted Critical
Publication of DE69320517T2 publication Critical patent/DE69320517T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Laminated Bodies (AREA)
DE69320517T 1992-04-07 1993-03-05 Photoempfindliches Laminat mit Doppelzwischenschichten Expired - Lifetime DE69320517T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/864,837 US5270146A (en) 1992-04-07 1992-04-07 Photosensitive laminate having dual intermediate layers

Publications (2)

Publication Number Publication Date
DE69320517D1 true DE69320517D1 (de) 1998-10-01
DE69320517T2 DE69320517T2 (de) 1999-01-07

Family

ID=25344183

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320517T Expired - Lifetime DE69320517T2 (de) 1992-04-07 1993-03-05 Photoempfindliches Laminat mit Doppelzwischenschichten

Country Status (7)

Country Link
US (1) US5270146A (de)
EP (1) EP0565233B1 (de)
JP (1) JP2572928B2 (de)
CA (1) CA2089822C (de)
DE (1) DE69320517T2 (de)
HK (1) HK1005154A1 (de)
SG (1) SG52385A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US6462107B1 (en) 1997-12-23 2002-10-08 The Texas A&M University System Photoimageable compositions and films for printed wiring board manufacture
CN102799070B (zh) * 2012-08-27 2014-03-05 珠海市能动科技光学产业有限公司 双层涂布的负性光致抗蚀干膜
JP6043693B2 (ja) * 2012-10-19 2016-12-14 富士フイルム株式会社 保護膜形成用の樹脂組成物、保護膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
JP6284849B2 (ja) * 2013-08-23 2018-02-28 富士フイルム株式会社 積層体

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2106574A1 (de) * 1970-03-03 1971-09-23 Shpley Co Inc Lichtempfindliches Laminat
US4530896A (en) * 1970-03-03 1985-07-23 Shipley Company Inc. Photosensitive laminate
NL7800122A (nl) * 1978-01-05 1979-07-09 Philips Nv Magnetische registratieband en drager voor een magnetische registratieband.
US4239849A (en) * 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
JPH0750329B2 (ja) * 1986-06-23 1995-05-31 富士写真フイルム株式会社 画像形成材料
US4889790A (en) * 1988-02-26 1989-12-26 Morton Thiokol, Inc. Method of forming a conformable mask on a printed circuit board
US4992354A (en) * 1988-02-26 1991-02-12 Morton International, Inc. Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like

Also Published As

Publication number Publication date
HK1005154A1 (en) 1998-12-24
EP0565233B1 (de) 1998-08-26
EP0565233A1 (de) 1993-10-13
CA2089822A1 (en) 1993-10-08
JP2572928B2 (ja) 1997-01-16
SG52385A1 (en) 1998-09-28
US5270146A (en) 1993-12-14
DE69320517T2 (de) 1999-01-07
JPH0627650A (ja) 1994-02-04
CA2089822C (en) 1998-04-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ETERNAL TECHNOLOGY CORP., COLONIA HEIGHTS, VA., US

8328 Change in the person/name/address of the agent

Representative=s name: WUESTHOFF & WUESTHOFF PATENT- UND RECHTSANWAELTE,

8327 Change in the person/name/address of the patent owner

Owner name: ETERNAL TECHNOLOGY CORP., COLONIAL HEIGHTS, VA, US