DE69308347T2 - Vorlagenbühne und Musterübertragungssystem hierfür - Google Patents
Vorlagenbühne und Musterübertragungssystem hierfürInfo
- Publication number
- DE69308347T2 DE69308347T2 DE69308347T DE69308347T DE69308347T2 DE 69308347 T2 DE69308347 T2 DE 69308347T2 DE 69308347 T DE69308347 T DE 69308347T DE 69308347 T DE69308347 T DE 69308347T DE 69308347 T2 DE69308347 T2 DE 69308347T2
- Authority
- DE
- Germany
- Prior art keywords
- transmission system
- system therefor
- master stage
- pattern transmission
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
- H01J2237/20228—Mechanical X-Y scanning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20278—Motorised movement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7755992A JP3137717B2 (ja) | 1992-03-31 | 1992-03-31 | 移動ステージ装置 |
JP05032053A JP3135404B2 (ja) | 1993-02-22 | 1993-02-22 | ステージ装置とこれを用いたシステム |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69308347D1 DE69308347D1 (de) | 1997-04-10 |
DE69308347T2 true DE69308347T2 (de) | 1997-07-10 |
Family
ID=26370573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69308347T Expired - Lifetime DE69308347T2 (de) | 1992-03-31 | 1993-03-30 | Vorlagenbühne und Musterübertragungssystem hierfür |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0564255B1 (de) |
AT (1) | ATE149699T1 (de) |
DE (1) | DE69308347T2 (de) |
ES (1) | ES2097976T3 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002184686A (ja) * | 2000-10-03 | 2002-06-28 | Advantest Corp | 電子ビーム露光装置 |
JP6342131B2 (ja) | 2013-09-13 | 2018-06-13 | 株式会社東芝 | 受給エネルギー削減情報算出装置、受給エネルギー削減情報算出方法およびプログラム |
JP6779390B2 (ja) * | 2017-12-15 | 2020-11-04 | 三菱電機株式会社 | 推力測定装置 |
CN112873137B (zh) * | 2020-12-29 | 2022-11-04 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 一种剥离工作台 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4425537A (en) * | 1978-06-26 | 1984-01-10 | Optimetrix Corporation | X-Y Addressable workpiece positioner and mask aligner using same |
US4993696A (en) * | 1986-12-01 | 1991-02-19 | Canon Kabushiki Kaisha | Movable stage mechanism |
CA1283143C (en) * | 1987-06-11 | 1991-04-16 | Ralph L. Hollis, Jr. | Magnetically levitated fine motion robot wrist with programmable compliance |
US4814622A (en) * | 1987-11-06 | 1989-03-21 | Bell Communications Research, Inc. | High speed scanning tunneling microscope |
US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
-
1993
- 1993-03-30 EP EP93302498A patent/EP0564255B1/de not_active Expired - Lifetime
- 1993-03-30 AT AT93302498T patent/ATE149699T1/de active
- 1993-03-30 ES ES93302498T patent/ES2097976T3/es not_active Expired - Lifetime
- 1993-03-30 DE DE69308347T patent/DE69308347T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0564255A3 (de) | 1994-02-23 |
EP0564255A2 (de) | 1993-10-06 |
EP0564255B1 (de) | 1997-03-05 |
DE69308347D1 (de) | 1997-04-10 |
ATE149699T1 (de) | 1997-03-15 |
ES2097976T3 (es) | 1997-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |