DE69308347T2 - Vorlagenbühne und Musterübertragungssystem hierfür - Google Patents

Vorlagenbühne und Musterübertragungssystem hierfür

Info

Publication number
DE69308347T2
DE69308347T2 DE69308347T DE69308347T DE69308347T2 DE 69308347 T2 DE69308347 T2 DE 69308347T2 DE 69308347 T DE69308347 T DE 69308347T DE 69308347 T DE69308347 T DE 69308347T DE 69308347 T2 DE69308347 T2 DE 69308347T2
Authority
DE
Germany
Prior art keywords
transmission system
system therefor
master stage
pattern transmission
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69308347T
Other languages
English (en)
Other versions
DE69308347D1 (de
Inventor
Kazunori Iwamoto
Nobushige Korenaga
Youzou Fukagawa
Toshiya Asano
Satoru Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7755992A external-priority patent/JP3137717B2/ja
Priority claimed from JP05032053A external-priority patent/JP3135404B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69308347D1 publication Critical patent/DE69308347D1/de
Application granted granted Critical
Publication of DE69308347T2 publication Critical patent/DE69308347T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20228—Mechanical X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20278—Motorised movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
DE69308347T 1992-03-31 1993-03-30 Vorlagenbühne und Musterübertragungssystem hierfür Expired - Lifetime DE69308347T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7755992A JP3137717B2 (ja) 1992-03-31 1992-03-31 移動ステージ装置
JP05032053A JP3135404B2 (ja) 1993-02-22 1993-02-22 ステージ装置とこれを用いたシステム

Publications (2)

Publication Number Publication Date
DE69308347D1 DE69308347D1 (de) 1997-04-10
DE69308347T2 true DE69308347T2 (de) 1997-07-10

Family

ID=26370573

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69308347T Expired - Lifetime DE69308347T2 (de) 1992-03-31 1993-03-30 Vorlagenbühne und Musterübertragungssystem hierfür

Country Status (4)

Country Link
EP (1) EP0564255B1 (de)
AT (1) ATE149699T1 (de)
DE (1) DE69308347T2 (de)
ES (1) ES2097976T3 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002184686A (ja) * 2000-10-03 2002-06-28 Advantest Corp 電子ビーム露光装置
JP6342131B2 (ja) 2013-09-13 2018-06-13 株式会社東芝 受給エネルギー削減情報算出装置、受給エネルギー削減情報算出方法およびプログラム
JP6779390B2 (ja) * 2017-12-15 2020-11-04 三菱電機株式会社 推力測定装置
CN112873137B (zh) * 2020-12-29 2022-11-04 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 一种剥离工作台

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4425537A (en) * 1978-06-26 1984-01-10 Optimetrix Corporation X-Y Addressable workpiece positioner and mask aligner using same
US4993696A (en) * 1986-12-01 1991-02-19 Canon Kabushiki Kaisha Movable stage mechanism
CA1283143C (en) * 1987-06-11 1991-04-16 Ralph L. Hollis, Jr. Magnetically levitated fine motion robot wrist with programmable compliance
US4814622A (en) * 1987-11-06 1989-03-21 Bell Communications Research, Inc. High speed scanning tunneling microscope
US5220171A (en) * 1990-11-01 1993-06-15 Canon Kabushiki Kaisha Wafer holding device in an exposure apparatus

Also Published As

Publication number Publication date
EP0564255A3 (de) 1994-02-23
EP0564255A2 (de) 1993-10-06
EP0564255B1 (de) 1997-03-05
DE69308347D1 (de) 1997-04-10
ATE149699T1 (de) 1997-03-15
ES2097976T3 (es) 1997-04-16

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