DE69230974D1 - Vorrichtung und verfahren zur beschichtung - Google Patents
Vorrichtung und verfahren zur beschichtungInfo
- Publication number
- DE69230974D1 DE69230974D1 DE69230974T DE69230974T DE69230974D1 DE 69230974 D1 DE69230974 D1 DE 69230974D1 DE 69230974 T DE69230974 T DE 69230974T DE 69230974 T DE69230974 T DE 69230974T DE 69230974 D1 DE69230974 D1 DE 69230974D1
- Authority
- DE
- Germany
- Prior art keywords
- pct
- electrode
- sec
- control unit
- stress control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
- H01J2237/3322—Problems associated with coating
- H01J2237/3328—Problems associated with coating adhesion, stress, lift-off of deposited films
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Luminescent Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB919125771A GB9125771D0 (en) | 1991-12-04 | 1991-12-04 | Deposition apparatus and methods |
PCT/GB1992/002238 WO1993011276A1 (en) | 1991-12-04 | 1992-12-02 | Deposition apparatus and methods |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69230974D1 true DE69230974D1 (de) | 2000-05-31 |
DE69230974T2 DE69230974T2 (de) | 2000-10-19 |
Family
ID=10705675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69230974T Expired - Fee Related DE69230974T2 (de) | 1991-12-04 | 1992-12-02 | Vorrichtung und verfahren zur beschichtung |
Country Status (8)
Country | Link |
---|---|
US (1) | US5492737A (de) |
EP (1) | EP0650536B1 (de) |
JP (1) | JP3392415B2 (de) |
AT (1) | ATE192197T1 (de) |
CA (1) | CA2124215A1 (de) |
DE (1) | DE69230974T2 (de) |
GB (1) | GB9125771D0 (de) |
WO (1) | WO1993011276A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4445177C5 (de) | 1994-11-22 | 2015-09-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung mikromechanischer Bauelemente mit freistehenden Mikrostrukturen |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3123427C2 (de) * | 1981-06-12 | 1985-10-24 | Siemens AG, 1000 Berlin und 8000 München | Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung |
JPH062939B2 (ja) * | 1982-03-16 | 1994-01-12 | 松下電器産業株式会社 | 薄膜生成方法 |
JPS60197875A (ja) * | 1984-03-19 | 1985-10-07 | Ulvac Corp | スパツタ装置用自動成膜制御装置 |
JPS62243765A (ja) * | 1986-04-15 | 1987-10-24 | Sumitomo Heavy Ind Ltd | 薄膜形成時における残留応力緩和方法 |
JPS63317676A (ja) * | 1987-06-19 | 1988-12-26 | Sharp Corp | 無粒構造金属化合物薄膜の製造方法 |
CA2014540A1 (en) * | 1989-04-18 | 1990-10-18 | Mitsui Toatsu Chemicals, Inc. | Method for forming semiconductor thin film |
-
1991
- 1991-12-04 GB GB919125771A patent/GB9125771D0/en active Pending
-
1992
- 1992-12-02 AT AT92924773T patent/ATE192197T1/de active
- 1992-12-02 CA CA002124215A patent/CA2124215A1/en not_active Abandoned
- 1992-12-02 WO PCT/GB1992/002238 patent/WO1993011276A1/en active IP Right Grant
- 1992-12-02 JP JP50996593A patent/JP3392415B2/ja not_active Expired - Fee Related
- 1992-12-02 DE DE69230974T patent/DE69230974T2/de not_active Expired - Fee Related
- 1992-12-02 EP EP92924773A patent/EP0650536B1/de not_active Expired - Lifetime
- 1992-12-02 US US08/244,573 patent/US5492737A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0650536A1 (de) | 1995-05-03 |
JPH07501583A (ja) | 1995-02-16 |
ATE192197T1 (de) | 2000-05-15 |
EP0650536B1 (de) | 2000-04-26 |
US5492737A (en) | 1996-02-20 |
CA2124215A1 (en) | 1993-06-10 |
WO1993011276A1 (en) | 1993-06-10 |
JP3392415B2 (ja) | 2003-03-31 |
GB9125771D0 (en) | 1992-02-05 |
DE69230974T2 (de) | 2000-10-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3580109D1 (de) | Verfahren und vorrichtung zum verteilenden zufuehren von gegenstaenden. | |
DE69405042T2 (de) | Verfahren und Vorrichtung zum Verhindern unbeabsichtigten Gebrauchs von Druckpatronen | |
DE68919007D1 (de) | Verfahren und Vorrichtung zur präzisen Lötzinnzuführung. | |
DE3484837D1 (de) | Verfahren und vorrichtung zur steuerung des photokoagulierens biologischer gewebe. | |
DE3852697D1 (de) | Verfahren und System zur Stromversorgungssteuerung eines Rechnersystems. | |
DE69529616T2 (de) | Verfahren und vorrichtung zur begrenzung der steuerung von parametern eines elektrischen nervengewebsstimulators | |
ATE233509T1 (de) | Verfahren und vorrichtung zum stützen eines körpers, insbesondere eines patienten, mit einer von der steuervorrichtung unabhängigen stützvorrichtung | |
DE69210193T2 (de) | Methode und Vorrichtung zur Regelung des Schubes eines Flugzeuges während des Steigfluges | |
AU1766692A (en) | Apparatus particularly for use in the determination of the condition of the vegetative part of the nervous system | |
DE69328933T2 (de) | Vorrichtung und verfahren zur verhinderung der bildung von verunreinigungen in schankleitungen | |
DE69020547D1 (de) | Verfahren und vorrichtung zum steuern von bohrlochflüssigkeitsparametern. | |
ATE56228T1 (de) | Verfahren und vorrichtung zum auftragen von pulver auf filamenten. | |
DE69211357D1 (de) | Verfahren zum zufuhr von gas zum laserstrahlschneiden und vorrichtung zur durchführung dieses verfahrens | |
ATE122933T1 (de) | Verfahren zum benetzen von körnerfrüchten mit einer flüssigkeit sowie vorrichtung zur durchführung des verfahrens und anwendung des verfahrens. | |
DE3876360T2 (de) | Methode und apparat zur kontrolle des sprueh- und spritzwassers eines fahrzeuges bei gleichzeitiger verminderung des fahrzeugwiederstandes. | |
DE3884585D1 (de) | Verfahren und vorrichtung zum aendern der einstellung von ueberdruck-tellerventilen. | |
DE3582796D1 (de) | Verfahren und vorrichtung zur behandlung von werkstuecken mit verwendung einer sandstrahleinheit. | |
DE58908618D1 (de) | Verfahren und Vorrichtung zur Regelung der Position von Stellventilen. | |
DE69230974D1 (de) | Vorrichtung und verfahren zur beschichtung | |
ATE222491T1 (de) | Melatonin-derivate zur verwendung in der behandlung von schlafstörungen | |
GB9410639D0 (en) | Method of improving fertilization | |
DE3880956T2 (de) | Verfahren und Vorrichtung zum Regeln des Herstellens von Glasfasern. | |
ATE177155T1 (de) | Vorrichtung zum beschicken eines elektrofens mit flüssigmetall | |
DE3583584D1 (de) | Verfahren zum herstellen von bohrungen hoher oberflaechenguete und vorrichtung zur durchfuehrung des verfahrens. | |
DE3586685T2 (de) | Verfahren und vorrichtung zur kontrolle eines bilderzeugungsgeraetes. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |