DE69226514D1 - Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode - Google Patents

Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode

Info

Publication number
DE69226514D1
DE69226514D1 DE69226514T DE69226514T DE69226514D1 DE 69226514 D1 DE69226514 D1 DE 69226514D1 DE 69226514 T DE69226514 T DE 69226514T DE 69226514 T DE69226514 T DE 69226514T DE 69226514 D1 DE69226514 D1 DE 69226514D1
Authority
DE
Germany
Prior art keywords
incidence
angles
light
range
different angles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69226514T
Other languages
English (en)
Other versions
DE69226514T2 (de
Inventor
Richard F Spanier
Robert Wolf
Robert Loiterman
Mitchell Haller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rudolph Technologies Inc
Original Assignee
Rudolph Technologies Inc
Rudolph Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rudolph Technologies Inc, Rudolph Research Corp filed Critical Rudolph Technologies Inc
Application granted granted Critical
Publication of DE69226514D1 publication Critical patent/DE69226514D1/de
Publication of DE69226514T2 publication Critical patent/DE69226514T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Head (AREA)
  • Spectrometry And Color Measurement (AREA)
DE69226514T 1991-01-11 1992-01-10 Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode Expired - Fee Related DE69226514T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64010091A 1991-01-11 1991-01-11
PCT/US1992/000280 WO1992012404A1 (en) 1991-01-11 1992-01-10 Simultaneous multiple angle/multiple wavelength ellipsometer and method

Publications (2)

Publication Number Publication Date
DE69226514D1 true DE69226514D1 (de) 1998-09-10
DE69226514T2 DE69226514T2 (de) 1999-04-08

Family

ID=24566845

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69226514T Expired - Fee Related DE69226514T2 (de) 1991-01-11 1992-01-10 Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode

Country Status (7)

Country Link
EP (1) EP0566657B1 (de)
JP (1) JP3360822B2 (de)
KR (1) KR100203345B1 (de)
AT (1) ATE169400T1 (de)
CA (1) CA2099491A1 (de)
DE (1) DE69226514T2 (de)
WO (1) WO1992012404A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL104708A (en) * 1993-02-12 1995-12-31 Orbotech Ltd Device and method for optical inspection of items
US5408322A (en) * 1993-04-26 1995-04-18 Materials Research Corporation Self aligning in-situ ellipsometer and method of using for process monitoring
US5412473A (en) * 1993-07-16 1995-05-02 Therma-Wave, Inc. Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices
US7215424B1 (en) 1998-03-03 2007-05-08 J.A. Woollam Co., Inc. Broadband ellipsometer or polarimeter system including at least one multiple element lens
US7518725B1 (en) 1995-09-20 2009-04-14 J.A. Woollam Co., Inc. Temperature controlled lens
US5742392A (en) * 1996-04-16 1998-04-21 Seymour Light, Inc. Polarized material inspection apparatus
DE19707926A1 (de) * 1997-02-27 1998-09-03 Gunther Dr Elender Abbildendes Mikro-Ellipsometer
US5979244A (en) * 1998-03-04 1999-11-09 Siemens Aktiengesellschaft Method and apparatus for evaluating internal film stress at high lateral resolution
DE19943312A1 (de) * 1999-09-10 2001-03-15 Haverkamp Mark Vorrichtung und Verfahren zur on-line-Dickenmessung transparenter Schichten/ Medien durch Transmissions-Ellipsometrie
JP3447654B2 (ja) * 2000-03-24 2003-09-16 Ｎｅｃエレクトロニクス株式会社 異方性薄膜評価法及び評価装置
DE10021378A1 (de) * 2000-05-02 2001-11-08 Leica Microsystems Optische Messanordnung mit einem Ellipsometer
FR2809491B1 (fr) * 2000-05-26 2008-07-04 Production Rech S Appliquees Procede et appareil de metrologie ellipsometrique pour echantillon contenu dans une chambre ou analogue
US6750968B2 (en) 2000-10-03 2004-06-15 Accent Optical Technologies, Inc. Differential numerical aperture methods and device
JP4399126B2 (ja) 2001-04-25 2010-01-13 株式会社堀場製作所 分光エリプソメータ
DE10303940A1 (de) * 2003-01-31 2004-08-19 Siemens Ag Verfahren zum Normieren von Röntgenbilddatensätzen und Röntgeneinrichtung
WO2006078718A1 (en) * 2005-01-20 2006-07-27 Zygo Corporation Interferometer for determining characteristics of an object surface
US9903711B2 (en) * 2015-04-06 2018-02-27 KLA—Tencor Corporation Feed forward of metrology data in a metrology system
CN110132420B (zh) * 2018-02-09 2020-11-27 上海微电子装备（集团）股份有限公司 偏振测量装置、偏振测量方法及光配向方法
JP7226243B2 (ja) * 2019-10-29 2023-02-21 横河電機株式会社 フーリエ分光分析装置
CN113985592A (zh) * 2021-09-24 2022-01-28 江苏锐精光电研究院有限公司 基于色散元件的多角度全内反射照明成像装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132039A (en) * 1981-02-09 1982-08-16 Hitachi Ltd Method for measuring carrier distribution
US4434025A (en) * 1981-06-04 1984-02-28 Robillard Jean J Controlling crystallinity and thickness of monocrystalline layer by use of an elliptically polarized beam of light
DE3339970A1 (de) * 1983-11-04 1985-05-15 Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie GmbH & Co, 8046 Garching Einrichtung zum automatischen fokussieren von optischen geraeten
US4672196A (en) * 1984-02-02 1987-06-09 Canino Lawrence S Method and apparatus for measuring properties of thin materials using polarized light
US4838695A (en) * 1987-06-12 1989-06-13 Boston University Apparatus for measuring reflectivity
US4957368A (en) * 1989-03-16 1990-09-18 Photoacoustic Technology, Inc. Apparatus and process for performing ellipsometric measurements of surfaces
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
JPH06103252B2 (ja) * 1989-05-04 1994-12-14 サーマ―ウェイブ・インク 高分解能エリプソメータ装置と方法

Also Published As

Publication number Publication date
EP0566657A1 (de) 1993-10-27
JPH06504845A (ja) 1994-06-02
ATE169400T1 (de) 1998-08-15
CA2099491A1 (en) 1992-07-12
WO1992012404A1 (en) 1992-07-23
KR100203345B1 (ko) 1999-06-15
DE69226514T2 (de) 1999-04-08
KR930703594A (ko) 1993-11-30
JP3360822B2 (ja) 2003-01-07
EP0566657B1 (de) 1998-08-05
EP0566657A4 (de) 1994-04-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: RUDOLPH TECHNOLOGIES, INC., FLANDERS, N.J., US

8339 Ceased/non-payment of the annual fee