DE69223353T2 - Lichtempfindliches Material enthaltend Silberhalogenid, Reduktionsmittel, polymerisierbare Verbindung und Farbbildner - Google Patents

Lichtempfindliches Material enthaltend Silberhalogenid, Reduktionsmittel, polymerisierbare Verbindung und Farbbildner

Info

Publication number
DE69223353T2
DE69223353T2 DE69223353T DE69223353T DE69223353T2 DE 69223353 T2 DE69223353 T2 DE 69223353T2 DE 69223353 T DE69223353 T DE 69223353T DE 69223353 T DE69223353 T DE 69223353T DE 69223353 T2 DE69223353 T2 DE 69223353T2
Authority
DE
Germany
Prior art keywords
reducing agent
silver halide
material containing
photosensitive material
polymerizable compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69223353T
Other languages
English (en)
Other versions
DE69223353D1 (de
Inventor
Hiroshi Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69223353D1 publication Critical patent/DE69223353D1/de
Application granted granted Critical
Publication of DE69223353T2 publication Critical patent/DE69223353T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285—Silver salts, e.g. a latent silver salt image

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69223353T 1991-07-15 1992-07-10 Lichtempfindliches Material enthaltend Silberhalogenid, Reduktionsmittel, polymerisierbare Verbindung und Farbbildner Expired - Fee Related DE69223353T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3198245A JP2740988B2 (ja) 1991-07-15 1991-07-15 熱現像感光材料

Publications (2)

Publication Number Publication Date
DE69223353D1 DE69223353D1 (de) 1998-01-15
DE69223353T2 true DE69223353T2 (de) 1998-04-30

Family

ID=16387924

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69223353T Expired - Fee Related DE69223353T2 (de) 1991-07-15 1992-07-10 Lichtempfindliches Material enthaltend Silberhalogenid, Reduktionsmittel, polymerisierbare Verbindung und Farbbildner

Country Status (4)

Country Link
US (1) US5441843A (de)
EP (1) EP0523565B1 (de)
JP (1) JP2740988B2 (de)
DE (1) DE69223353T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US5870422A (en) * 1997-07-09 1999-02-09 Trw Inc. Gain generator for high-energy chemical lasers
GB2365139B (en) 2000-06-28 2003-09-10 Eastman Kodak Co A method of producing a photographic image
GB2365138B (en) 2000-06-28 2003-07-23 Eastman Kodak Co A method of producing a photographic image
US6544709B1 (en) * 2001-10-19 2003-04-08 Arkwright, Inc. Glossy electrophotographic media comprising an opaque coated substrate
US20070063635A1 (en) * 2005-06-06 2007-03-22 St. Clair Intellectual Property Consultants, Inc. Quenched Phosphor Displays
US20090058259A1 (en) * 2005-04-05 2009-03-05 St. Clair Intellectual Property Consultants, Inc. Quenched phosphor displays with pixel amplification
JP4802707B2 (ja) * 2005-05-17 2011-10-26 住友化学株式会社 光制御膜
US9245202B2 (en) * 2013-06-06 2016-01-26 International Business Machines Corporation Tamper detection with microcaspule rupture

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4578339A (en) * 1984-08-23 1986-03-25 The Mead Corporation Photosensitive imaging system employing oil-containing microcapsules
US4596996A (en) * 1985-02-11 1986-06-24 Appleton Papers Inc. Pressure-sensitive recording sheet
DE3666634D1 (en) * 1985-05-30 1989-11-30 Fuji Photo Film Co Ltd Light-sensitive material containing microcapsules and image-recording method using the same
EP0229661B1 (de) * 1986-01-14 1993-04-14 Fuji Photo Film Co., Ltd. Eine in einer photopolymerisierbaren Verbindung dispergiertes Silberhalogenid enthaltende Zusammensetzung und diese Zusammensetzung enthaltendes lichtempfindliches Material
JPH0627946B2 (ja) * 1986-03-11 1994-04-13 富士写真フイルム株式会社 熱現像用感光材料
JPH0619554B2 (ja) * 1986-03-11 1994-03-16 富士写真フイルム株式会社 感光材料の製造方法
JPS63309943A (ja) * 1987-06-11 1988-12-19 Fuji Photo Film Co Ltd 画像形成方法
JPH0721633B2 (ja) * 1987-07-10 1995-03-08 富士写真フイルム株式会社 感光材料

Also Published As

Publication number Publication date
DE69223353D1 (de) 1998-01-15
JPH0519457A (ja) 1993-01-29
JP2740988B2 (ja) 1998-04-15
EP0523565A1 (de) 1993-01-20
US5441843A (en) 1995-08-15
EP0523565B1 (de) 1997-12-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee