DE69218393D1 - Resistmaterial - Google Patents

Resistmaterial

Info

Publication number
DE69218393D1
DE69218393D1 DE69218393T DE69218393T DE69218393D1 DE 69218393 D1 DE69218393 D1 DE 69218393D1 DE 69218393 T DE69218393 T DE 69218393T DE 69218393 T DE69218393 T DE 69218393T DE 69218393 D1 DE69218393 D1 DE 69218393D1
Authority
DE
Germany
Prior art keywords
resist material
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69218393T
Other languages
English (en)
Other versions
DE69218393T2 (de
Inventor
Fumiyoshi Urano
Keiji Oono
Hirotoshi Fujie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Panasonic Holdings Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd, Matsushita Electric Industrial Co Ltd filed Critical Wako Pure Chemical Industries Ltd
Publication of DE69218393D1 publication Critical patent/DE69218393D1/de
Application granted granted Critical
Publication of DE69218393T2 publication Critical patent/DE69218393T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y10S430/125—Carbonyl in heterocyclic compound

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69218393T 1991-12-16 1992-12-14 Resistmaterial Expired - Fee Related DE69218393T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35275591 1991-12-16

Publications (2)

Publication Number Publication Date
DE69218393D1 true DE69218393D1 (de) 1997-04-24
DE69218393T2 DE69218393T2 (de) 1997-10-16

Family

ID=18426223

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69218393T Expired - Fee Related DE69218393T2 (de) 1991-12-16 1992-12-14 Resistmaterial

Country Status (3)

Country Link
US (1) US5627006A (de)
EP (1) EP0552548B1 (de)
DE (1) DE69218393T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0707015B1 (de) * 1994-10-13 1999-12-15 Arch Specialty Chemicals, Inc. Polymere
EP0709410A3 (de) 1994-10-26 1997-03-26 Ocg Microelectronic Materials Polymere
DE69500616T2 (de) * 1994-12-20 1998-01-02 Ocg Microelectronics Materials Verfahren zur Herstellung von teilgeschützten Phenolharzen
DE69516101T2 (de) * 1994-12-20 2001-01-11 Arch Speciality Chemicals Inc Vernetzte Polymere
DE69515163D1 (de) * 1994-12-20 2000-03-30 Olin Microelectronic Chem Inc Fotolackzusammensetzungen
KR100206664B1 (ko) * 1995-06-28 1999-07-01 세키사와 다다시 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법
TW460753B (en) * 1995-07-20 2001-10-21 Shinetsu Chemical Co Chemically amplified positive resist material
US5849461A (en) * 1995-08-01 1998-12-15 Shin-Etsu Chemical Co., Ltd. Chemically amplified positive resist composition
US5719003A (en) * 1995-09-27 1998-02-17 Shipley Company, L.L.C. Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers
JP3073149B2 (ja) 1995-10-30 2000-08-07 東京応化工業株式会社 ポジ型レジスト組成物
DE69612182T3 (de) * 1996-02-09 2005-08-04 Wako Pure Chemical Industries, Ltd. Polymer und Resistmaterial
US5962180A (en) * 1996-03-01 1999-10-05 Jsr Corporation Radiation sensitive composition
JP3206440B2 (ja) * 1996-06-28 2001-09-10 信越化学工業株式会社 化学増幅ポジ型レジスト材料
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6303263B1 (en) * 1998-02-25 2001-10-16 International Business Machines Machines Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups
US6153733A (en) * 1998-05-18 2000-11-28 Tokyo Ohka Kogyo Co., Ltd. (Disulfonyl diazomethane compounds)
JP2003524669A (ja) 1998-08-18 2003-08-19 スリーエム イノベイティブ プロパティズ カンパニー ケイ素含有アセタールまたはケタール官能基を有するポリマー
KR100316973B1 (ko) * 1999-02-19 2001-12-22 주식회사 동진쎄미켐 화학 증폭 레지스트 수지
KR100316972B1 (ko) * 1999-02-19 2001-12-22 주식회사 동진쎄미켐 화학 증폭 레지스트 수지
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
TW502133B (en) 1999-06-10 2002-09-11 Wako Pure Chem Ind Ltd Resist composition, agent and method for reducing substrate dependence thereof
KR100474544B1 (ko) * 1999-11-12 2005-03-08 주식회사 하이닉스반도체 Ｔｉｐｓ 공정용 포토레지스트 조성물
TW538312B (en) * 2000-03-07 2003-06-21 Shinetsu Chemical Co Chemical amplification, positive resist compositions
JP4562240B2 (ja) * 2000-05-10 2010-10-13 富士フイルム株式会社 ポジ型感放射線性組成物及びそれを用いたパターン形成方法
US6641971B2 (en) * 2001-06-15 2003-11-04 International Business Machines Corporation Resist compositions comprising silyl ketals and methods of use thereof
US7875408B2 (en) 2007-01-25 2011-01-25 International Business Machines Corporation Bleachable materials for lithography
EP2539316B1 (de) 2010-02-24 2019-10-23 Basf Se Latente säuren und ihre verwendung
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1231789A (de) * 1967-09-05 1971-05-12
CH621416A5 (de) * 1975-03-27 1981-01-30 Hoechst Ag
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
US4603101A (en) * 1985-09-27 1986-07-29 General Electric Company Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
US5250669A (en) * 1987-12-04 1993-10-05 Wako Pure Chemical Industries, Ltd. Photosensitive compound
EP0319325A3 (de) * 1987-12-04 1990-12-27 Wako Pure Chemical Industries, Ltd. Photoempfindliches Material und Verfahren zur Herstellung von Strukturen damit
JPH01154048A (ja) * 1987-12-10 1989-06-16 Toshiba Corp 感光性組成物
DE3841571A1 (de) * 1987-12-10 1989-06-29 Toshiba Kawasaki Kk Lichtempfindliche masse
JPH0225850A (ja) * 1988-07-15 1990-01-29 Hitachi Ltd 放射線感応性組成物およびそれを用いたパターン形成法
JPH0262544A (ja) * 1988-08-30 1990-03-02 Tosoh Corp フォトレジスト組成物
DE68926019T2 (de) * 1988-10-28 1996-10-02 Ibm Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
US4959293A (en) * 1988-10-28 1990-09-25 J. T. Baker, Inc. Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
DE3900736A1 (de) * 1989-01-12 1990-07-26 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch enthaltend einen mehrfunktionellen (alpha)-diazo-(beta)-ketoester, verfahren zu dessen herstellung und strahlungsempfindliches aufzeichnungsmaterial enthaltend dieses gemisch
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
EP0440376B1 (de) * 1990-01-30 1996-04-24 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung einer Bildstruktur
EP0440374B1 (de) * 1990-01-30 1997-04-16 Wako Pure Chemical Industries Ltd Chemisch verstärktes Photolack-Material
JPH03282550A (ja) * 1990-03-30 1991-12-12 Oki Electric Ind Co Ltd フォトレジスト組成物
US5225316A (en) * 1990-11-26 1993-07-06 Minnesota Mining And Manufacturing Company An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups
US5403695A (en) * 1991-04-30 1995-04-04 Kabushiki Kaisha Toshiba Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
JP3030672B2 (ja) * 1991-06-18 2000-04-10 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
US5258257A (en) * 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
US5558971A (en) * 1994-09-02 1996-09-24 Wako Pure Chemical Industries, Ltd. Resist material

Also Published As

Publication number Publication date
EP0552548B1 (de) 1997-03-19
US5627006A (en) 1997-05-06
EP0552548A1 (de) 1993-07-28
DE69218393T2 (de) 1997-10-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee