DE69217779D1 - Verfahren und Vorrichtung zur Bestimmung der Ätzgeschwindigkeit - Google Patents

Verfahren und Vorrichtung zur Bestimmung der Ätzgeschwindigkeit

Info

Publication number
DE69217779D1
DE69217779D1 DE69217779T DE69217779T DE69217779D1 DE 69217779 D1 DE69217779 D1 DE 69217779D1 DE 69217779 T DE69217779 T DE 69217779T DE 69217779 T DE69217779 T DE 69217779T DE 69217779 D1 DE69217779 D1 DE 69217779D1
Authority
DE
Germany
Prior art keywords
determining
etching rate
etching
rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69217779T
Other languages
English (en)
Other versions
DE69217779T2 (de
Inventor
Shigeo Hashimoto
Shogo Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C Uyemura and Co Ltd
Original Assignee
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C Uyemura and Co Ltd filed Critical C Uyemura and Co Ltd
Application granted granted Critical
Publication of DE69217779D1 publication Critical patent/DE69217779D1/de
Publication of DE69217779T2 publication Critical patent/DE69217779T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/22—Acidic compositions for etching magnesium or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N7/00—Analysing materials by measuring the pressure or volume of a gas or vapour
    • G01N7/14—Analysing materials by measuring the pressure or volume of a gas or vapour by allowing the material to emit a gas or vapour, e.g. water vapour, and measuring a pressure or volume difference
    • G01N7/18—Analysing materials by measuring the pressure or volume of a gas or vapour by allowing the material to emit a gas or vapour, e.g. water vapour, and measuring a pressure or volume difference by allowing the material to react

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • ing And Chemical Polishing (AREA)
  • Sampling And Sample Adjustment (AREA)
DE69217779T 1991-09-05 1992-09-04 Verfahren und Vorrichtung zur Bestimmung der Ätzgeschwindigkeit Expired - Fee Related DE69217779T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3254792A JP2500402B2 (ja) 1991-09-05 1991-09-05 エッチング速度の測定方法及びエッチング速度測定装置

Publications (2)

Publication Number Publication Date
DE69217779D1 true DE69217779D1 (de) 1997-04-10
DE69217779T2 DE69217779T2 (de) 1997-07-10

Family

ID=17269956

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69217779T Expired - Fee Related DE69217779T2 (de) 1991-09-05 1992-09-04 Verfahren und Vorrichtung zur Bestimmung der Ätzgeschwindigkeit

Country Status (5)

Country Link
US (1) US5393369A (de)
EP (1) EP0531149B1 (de)
JP (1) JP2500402B2 (de)
KR (1) KR100266136B1 (de)
DE (1) DE69217779T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19631178C1 (de) * 1996-08-02 1997-08-21 Siemens Ag Verfahren zur Korrosionsüberwachung
JP5725910B2 (ja) * 2011-02-28 2015-05-27 三菱重工業株式会社 酸洗処理方法及び酸洗処理装置
CN106053290A (zh) * 2016-07-14 2016-10-26 阳江核电有限公司 一种核电站蒸汽发生器冲洗沉渣反应装置
KR20210094196A (ko) 2020-01-20 2021-07-29 대덕전자 주식회사 실시간 금속필름 식각 분석 방법 및 장치

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2180798A (en) * 1936-07-20 1939-11-21 Sprague Specialties Co Electrolytic device
US2827724A (en) * 1955-03-07 1958-03-25 Turco Products Inc Method and apparatus for determining etching depth
US3503817A (en) * 1966-01-24 1970-03-31 Fmc Corp Process for controlling metal etching operation
SU603702A1 (ru) * 1976-08-01 1978-04-03 Предприятие П/Я Р-6115 Устройство дл контрол толщины стравливаемого сло металла
US4137047A (en) * 1977-09-27 1979-01-30 Boeing Commercial Airplane Company Method of determining corrosion resistance of anodized aluminum
SU905327A1 (ru) * 1980-01-16 1982-02-15 Ордена Ленина И Ордена Трудового Красного Знамени Предприятие П/Я Г-4725 Способ травлени магниевых сплавов
DE3035864A1 (de) * 1980-09-23 1982-05-06 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur regenerierung salzsaurer kupferchlorid-aetzloesungen
SU1272099A1 (ru) * 1985-06-20 1986-11-23 Предприятие П/Я В-2323 Устройство дл контрол процесса химической обработки металла
JPS6326386A (ja) * 1986-07-17 1988-02-03 Nec Corp エツチング処理終点検出法
SU1440963A1 (ru) * 1987-01-08 1988-11-30 Предприятие П/Я Р-6115 Устройство дл контрол скорости травлени деталей
JPH04157182A (ja) * 1990-10-19 1992-05-29 Mitsubishi Heavy Ind Ltd 連続的酸度測定方法

Also Published As

Publication number Publication date
DE69217779T2 (de) 1997-07-10
US5393369A (en) 1995-02-28
KR100266136B1 (ko) 2000-09-15
EP0531149A2 (de) 1993-03-10
JPH0565678A (ja) 1993-03-19
KR930006184A (ko) 1993-04-21
JP2500402B2 (ja) 1996-05-29
EP0531149A3 (en) 1993-10-06
EP0531149B1 (de) 1997-03-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee