DE69212061D1 - Verfahren zur Verarbeitung von lichtempfindlichen Kopiermaterialien - Google Patents

Verfahren zur Verarbeitung von lichtempfindlichen Kopiermaterialien

Info

Publication number
DE69212061D1
DE69212061D1 DE69212061T DE69212061T DE69212061D1 DE 69212061 D1 DE69212061 D1 DE 69212061D1 DE 69212061 T DE69212061 T DE 69212061T DE 69212061 T DE69212061 T DE 69212061T DE 69212061 D1 DE69212061 D1 DE 69212061D1
Authority
DE
Germany
Prior art keywords
copying materials
processing photosensitive
photosensitive copying
processing
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69212061T
Other languages
English (en)
Other versions
DE69212061T2 (de
Inventor
Tadao Toyama
Atsushi Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9928791A external-priority patent/JPH04328750A/ja
Priority claimed from JP3099286A external-priority patent/JP2984713B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69212061D1 publication Critical patent/DE69212061D1/de
Publication of DE69212061T2 publication Critical patent/DE69212061T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69212061T 1991-04-30 1992-04-29 Verfahren zur Verarbeitung von lichtempfindlichen Kopiermaterialien Expired - Fee Related DE69212061T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9928791A JPH04328750A (ja) 1991-04-30 1991-04-30 感光性複写材料の処理方法
JP3099286A JP2984713B2 (ja) 1991-04-30 1991-04-30 感光性複写材料およびその処理方法

Publications (2)

Publication Number Publication Date
DE69212061D1 true DE69212061D1 (de) 1996-08-14
DE69212061T2 DE69212061T2 (de) 1996-11-28

Family

ID=26440431

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69212061T Expired - Fee Related DE69212061T2 (de) 1991-04-30 1992-04-29 Verfahren zur Verarbeitung von lichtempfindlichen Kopiermaterialien

Country Status (3)

Country Link
US (1) US5326674A (de)
EP (1) EP0511659B1 (de)
DE (1) DE69212061T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5498661A (en) * 1994-08-29 1996-03-12 Westvaco Corporation Binder for chemical-resistant inks
DE69705137T2 (de) * 1996-02-19 2002-01-31 Agfa Gevaert Nv Blindplatte für den Offsetdruck
JP3707856B2 (ja) * 1996-03-07 2005-10-19 富士通株式会社 レジストパターンの形成方法
US6057079A (en) * 1997-09-24 2000-05-02 Shipley Company, L.L.C. Dry film photoresist construction suitable for rolling up on itself
US6268109B1 (en) * 1999-10-12 2001-07-31 E. I. Du Pont De Nemours And Company Composite photosensitive element
US6455231B1 (en) 1999-11-03 2002-09-24 Shipley Company, L.L.C. Dry film photoimageable compositions
US6660445B2 (en) * 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
US6663304B2 (en) 2002-01-30 2003-12-16 Hewlett-Packard Development Company, L.P. Simultaneously printing information on two sides of print media

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE620097A (de) * 1958-11-26
JPS5421089B2 (de) * 1973-05-29 1979-07-27
JPS50152803A (de) * 1974-05-29 1975-12-09
JPS5479032A (en) * 1977-12-06 1979-06-23 Fuji Photo Film Co Ltd Image formation emthod
JPS58178348A (ja) * 1982-04-13 1983-10-19 Nippon Synthetic Chem Ind Co Ltd:The 画像形成法
DE3433911A1 (de) * 1984-09-15 1986-03-27 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
GB8820781D0 (en) * 1988-09-02 1988-10-05 Polychrome Corp Process & apparatus for producing printing plates

Also Published As

Publication number Publication date
DE69212061T2 (de) 1996-11-28
EP0511659A1 (de) 1992-11-04
US5326674A (en) 1994-07-05
EP0511659B1 (de) 1996-07-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee