DE69207460D1 - Kapazitiv arbeitende Miniatur-Justiervorrichtung für elektronische Komponenten - Google Patents

Kapazitiv arbeitende Miniatur-Justiervorrichtung für elektronische Komponenten

Info

Publication number
DE69207460D1
DE69207460D1 DE69207460T DE69207460T DE69207460D1 DE 69207460 D1 DE69207460 D1 DE 69207460D1 DE 69207460 T DE69207460 T DE 69207460T DE 69207460 T DE69207460 T DE 69207460T DE 69207460 D1 DE69207460 D1 DE 69207460D1
Authority
DE
Germany
Prior art keywords
electronic components
adjustment device
capacitive
miniature adjustment
capacitive miniature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69207460T
Other languages
English (en)
Inventor
Ephraim Bemis Flint
Edward John Yarmchuk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69207460D1 publication Critical patent/DE69207460D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/30Measuring arrangements characterised by the use of electric or magnetic techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B7/31Measuring arrangements characterised by the use of electric or magnetic techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Gyroscopes (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)
  • Led Device Packages (AREA)
DE69207460T 1991-04-02 1992-03-06 Kapazitiv arbeitende Miniatur-Justiervorrichtung für elektronische Komponenten Expired - Lifetime DE69207460D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/679,412 US5130660A (en) 1991-04-02 1991-04-02 Miniature electronic device aligner using capacitance techniques

Publications (1)

Publication Number Publication Date
DE69207460D1 true DE69207460D1 (de) 1996-02-22

Family

ID=24726808

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69207460T Expired - Lifetime DE69207460D1 (de) 1991-04-02 1992-03-06 Kapazitiv arbeitende Miniatur-Justiervorrichtung für elektronische Komponenten

Country Status (4)

Country Link
US (1) US5130660A (de)
EP (1) EP0507099B1 (de)
JP (1) JPH0652808B2 (de)
DE (1) DE69207460D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5639323A (en) * 1995-02-17 1997-06-17 Aiwa Research And Development, Inc. Method for aligning miniature device components
US6518679B2 (en) 2000-12-15 2003-02-11 International Business Machines Corporation Capacitive alignment structure and method for chip stacking
US7654816B2 (en) * 2004-10-07 2010-02-02 Hewlett-Packard Development Company, L.P. Lithographic mask alignment
EP1763078B1 (de) 2005-09-09 2013-04-10 STMicroelectronics Srl System zur Messung der Ausrichtung zwischen Chips
US7193423B1 (en) * 2005-12-12 2007-03-20 International Business Machines Corporation Wafer-to-wafer alignments
US20090195930A1 (en) * 2008-01-31 2009-08-06 Lille Jeffrey S Magnetic recording slider with flex side pads
DE102015216438A1 (de) 2015-08-27 2017-03-02 Carl Zeiss Smt Gmbh Sensoranordnung für eine Lithographieanlage, Lithographieanlage und Verfahren zum Betreiben einer Lithographieanlage
US11525662B2 (en) * 2020-08-13 2022-12-13 Meta Platforms Technologies, Llc Electromechanical displacement sensor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3808527A (en) * 1973-06-28 1974-04-30 Ibm Alignment determining system
US4607213A (en) * 1983-10-12 1986-08-19 Varian Associates, Inc. Shielded capacitive mask aligner
FR2553532A1 (fr) * 1983-10-12 1985-04-19 Varian Associates Dispositif capacitif d'alignement de masque
US4654581A (en) * 1983-10-12 1987-03-31 Hewlett-Packard Company Capacitive mask aligner
US4566193A (en) * 1984-07-31 1986-01-28 Hewlett-Packard Company Use of an electronic vernier for evaluation of alignment in semiconductor processing
US4736629A (en) * 1985-12-20 1988-04-12 Silicon Designs, Inc. Micro-miniature accelerometer
CH670306A5 (de) * 1986-11-13 1989-05-31 Hans Ulrich Meyer
GB2208943B (en) * 1987-08-19 1991-07-31 Plessey Co Plc Alignment of fibre arrays
US5008619A (en) * 1988-11-18 1991-04-16 Amp-Akzo Corporation Multilevel circuit board precision positioning

Also Published As

Publication number Publication date
EP0507099A1 (de) 1992-10-07
JPH04338682A (ja) 1992-11-25
JPH0652808B2 (ja) 1994-07-06
EP0507099B1 (de) 1996-01-10
US5130660A (en) 1992-07-14

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Legal Events

Date Code Title Description
8332 No legal effect for de