DE69207041D1 - Heizungsanlage für chemische Behälter - Google Patents
Heizungsanlage für chemische BehälterInfo
- Publication number
- DE69207041D1 DE69207041D1 DE69207041T DE69207041T DE69207041D1 DE 69207041 D1 DE69207041 D1 DE 69207041D1 DE 69207041 T DE69207041 T DE 69207041T DE 69207041 T DE69207041 T DE 69207041T DE 69207041 D1 DE69207041 D1 DE 69207041D1
- Authority
- DE
- Germany
- Prior art keywords
- heating system
- chemical containers
- containers
- chemical
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Weting (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI910947A IT1245778B (it) | 1991-04-05 | 1991-04-05 | Apparecchio di riscaldamento per vaschette chimiche |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69207041D1 true DE69207041D1 (de) | 1996-02-08 |
DE69207041T2 DE69207041T2 (de) | 1996-07-25 |
Family
ID=11359464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69207041T Expired - Fee Related DE69207041T2 (de) | 1991-04-05 | 1992-03-26 | Heizungsanlage für chemische Behälter |
Country Status (5)
Country | Link |
---|---|
US (1) | US5353369A (de) |
EP (1) | EP0507387B1 (de) |
JP (1) | JPH0596153A (de) |
DE (1) | DE69207041T2 (de) |
IT (1) | IT1245778B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5550357A (en) * | 1994-05-03 | 1996-08-27 | Huang; James P. S. | Apparatus for producing heat energy without combustion using non-fuel fluid matter |
EP0703604B1 (de) * | 1994-09-20 | 2001-12-05 | Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno | Anlage zum kontrollierten Abkühlen von chemischen Behältern |
US6503363B2 (en) * | 2000-03-03 | 2003-01-07 | Seh America, Inc. | System for reducing wafer contamination using freshly, conditioned alkaline etching solution |
US20040226506A1 (en) * | 2003-05-14 | 2004-11-18 | Lynn David Mark | Coated wafer processing equipment |
KR100752653B1 (ko) * | 2006-02-01 | 2007-08-29 | 삼성전자주식회사 | 약액조 내에 가열부를 구비하는 기판 습식 처리 장치 및상기 장치를 사용한 기판 처리용 케미컬 가열 방법 |
DE102009022477A1 (de) * | 2009-05-25 | 2010-12-16 | Universität Konstanz | Verfahren zum Texturieren einer Oberfläche eines Halbleitersubstrates sowie Vorrichtung zum Durchführen des Verfahrens |
US8684198B2 (en) | 2010-02-01 | 2014-04-01 | Kobelco Construction Machinery Co., Ltd. | Working machine |
JP5496925B2 (ja) * | 2011-01-25 | 2014-05-21 | 東京エレクトロン株式会社 | めっき処理装置、めっき処理方法および記憶媒体 |
CN107275247A (zh) * | 2016-04-07 | 2017-10-20 | 盟立自动化股份有限公司 | 具有气体循环装置的湿法工艺设备 |
CN107316825A (zh) * | 2016-04-27 | 2017-11-03 | 盟立自动化股份有限公司 | 湿式蚀刻装置 |
US11410861B2 (en) * | 2017-02-15 | 2022-08-09 | Tokyo Electron Limited | Substrate liquid processing apparatus |
CN108511368B (zh) * | 2017-02-28 | 2023-09-01 | 东京毅力科创株式会社 | 基板液处理装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US729793A (en) * | 1902-07-08 | 1903-06-02 | Henry S Powell | Water-heater. |
US1053906A (en) * | 1907-11-06 | 1913-02-18 | Pittsburg Water Heater Company | Instantaneous water-heater. |
US1409019A (en) * | 1920-10-11 | 1922-03-07 | Frank Smith | Electrical heating device |
US1937226A (en) * | 1930-02-20 | 1933-11-28 | Horch Rudolf | Apparatus for maintaining the temperature of a fermenting liquid |
US2254387A (en) * | 1939-03-11 | 1941-09-02 | Charles A Olcott | Means for conditioning sugar bearing materials |
US2522373A (en) * | 1944-10-26 | 1950-09-12 | Electrolux Ab | Storage type liquid-heating system |
US3590909A (en) * | 1969-10-29 | 1971-07-06 | Trane Co | Oxygen boiler |
US3609296A (en) * | 1970-03-27 | 1971-09-28 | Fuel Engineering | Electrically heated autoclave apparatus |
US4362149A (en) * | 1980-12-08 | 1982-12-07 | Rockwell International Corporation | Heat storage system and method |
US4815526A (en) * | 1982-01-18 | 1989-03-28 | Leif Liljegren | Central space heating apparatus |
FR2562643B1 (fr) * | 1984-04-09 | 1989-10-27 | Equiptechnic | Appareil pour produire de l'eau chaude au moyen de fluide a haute temperature et son application au chauffage de l'eau sanitaire, notamment au moyen de vapeur a haute pression |
US4841645A (en) * | 1987-12-08 | 1989-06-27 | Micro Contamination Components Industries | Vapor dryer |
DE3906075A1 (de) * | 1989-02-27 | 1990-08-30 | Soehlbrand Heinrich Dr Dipl Ch | Verfahren zur thermischen behandlung von halbleitermaterialien und vorrichtung zur durchfuehrung desselben |
-
1991
- 1991-04-05 IT ITMI910947A patent/IT1245778B/it active IP Right Grant
-
1992
- 1992-03-25 JP JP4067022A patent/JPH0596153A/ja active Pending
- 1992-03-26 DE DE69207041T patent/DE69207041T2/de not_active Expired - Fee Related
- 1992-03-26 EP EP92200864A patent/EP0507387B1/de not_active Expired - Lifetime
- 1992-04-01 US US07/862,003 patent/US5353369A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ITMI910947A0 (it) | 1991-04-05 |
DE69207041T2 (de) | 1996-07-25 |
US5353369A (en) | 1994-10-04 |
IT1245778B (it) | 1994-10-18 |
ITMI910947A1 (it) | 1992-10-05 |
EP0507387A1 (de) | 1992-10-07 |
JPH0596153A (ja) | 1993-04-20 |
EP0507387B1 (de) | 1995-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |