DE69205320D1 - CVD-Verfahren zum Herstellen einer Siliziumdiffusionsschicht und/oder Überzug auf der Oberfläche eines Metallsubstrates. - Google Patents

CVD-Verfahren zum Herstellen einer Siliziumdiffusionsschicht und/oder Überzug auf der Oberfläche eines Metallsubstrates.

Info

Publication number
DE69205320D1
DE69205320D1 DE69205320T DE69205320T DE69205320D1 DE 69205320 D1 DE69205320 D1 DE 69205320D1 DE 69205320 T DE69205320 T DE 69205320T DE 69205320 T DE69205320 T DE 69205320T DE 69205320 D1 DE69205320 D1 DE 69205320D1
Authority
DE
Germany
Prior art keywords
coating
producing
diffusion layer
metal substrate
cvd process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69205320T
Other languages
English (en)
Other versions
DE69205320T2 (de
Inventor
Juichi Arai
Eiichi Ozawa
Jean-Marie Friedt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Publication of DE69205320D1 publication Critical patent/DE69205320D1/de
Application granted granted Critical
Publication of DE69205320T2 publication Critical patent/DE69205320T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
    • C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
DE1992605320 1991-04-17 1992-04-15 CVD-Verfahren zum Herstellen einer Siliziumdiffusionsschicht und/oder Überzug auf der Oberfläche eines Metallsubstrates. Expired - Fee Related DE69205320T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68648791A 1991-04-17 1991-04-17

Publications (2)

Publication Number Publication Date
DE69205320D1 true DE69205320D1 (de) 1995-11-16
DE69205320T2 DE69205320T2 (de) 1996-03-14

Family

ID=24756492

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992605320 Expired - Fee Related DE69205320T2 (de) 1991-04-17 1992-04-15 CVD-Verfahren zum Herstellen einer Siliziumdiffusionsschicht und/oder Überzug auf der Oberfläche eines Metallsubstrates.

Country Status (4)

Country Link
EP (1) EP0509907B1 (de)
JP (1) JPH05132777A (de)
CA (1) CA2066100A1 (de)
DE (1) DE69205320T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503383A (en) * 1994-06-27 1996-04-02 Kabushiki Kaisha Ace Denken Ground mechanism for a paper strip conveying mechanism
DE102004053502B8 (de) * 2004-10-27 2006-11-30 Universität Stuttgart Verfahren zum Korrosionsschutz von Bauteilen aus warmfestem Stahl
JP5412462B2 (ja) 2011-04-19 2014-02-12 日本パーカライジング株式会社 金属材料用耐食合金コーティング膜及びその形成方法
DE102012211242A1 (de) * 2012-06-29 2014-01-02 Robert Bosch Gmbh Verfahren zum Bearbeiten der Oberfläche eines Bauteils
CN110144567B (zh) * 2019-06-06 2021-01-08 中国科学院金属研究所 采用化学气相沉积工艺在硅基体上制备超厚碳化硅梯度涂层的方法
CN113182731B (zh) * 2021-05-08 2023-04-18 广西辉煌耐磨技术股份有限公司 高性能硬面堆焊药芯焊丝
CN116641035B (zh) * 2023-07-26 2023-10-13 南京诺源医疗器械有限公司 一种用于腹腔镜光学件的镀膜方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4714632A (en) * 1985-12-11 1987-12-22 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
JPS6343157A (ja) * 1986-08-11 1988-02-24 Toshiba Corp 電子写真感光体
FR2649995B1 (fr) * 1989-07-19 1993-08-13 Air Liquide Procede de siliciuration d'aciers par depot chimique en phase gazeuse

Also Published As

Publication number Publication date
EP0509907B1 (de) 1995-10-11
CA2066100A1 (en) 1992-10-18
EP0509907A1 (de) 1992-10-21
DE69205320T2 (de) 1996-03-14
JPH05132777A (ja) 1993-05-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee