DE69132386D1 - Blasrampe - Google Patents

Blasrampe

Info

Publication number
DE69132386D1
DE69132386D1 DE69132386T DE69132386T DE69132386D1 DE 69132386 D1 DE69132386 D1 DE 69132386D1 DE 69132386 T DE69132386 T DE 69132386T DE 69132386 T DE69132386 T DE 69132386T DE 69132386 D1 DE69132386 D1 DE 69132386D1
Authority
DE
Germany
Prior art keywords
ramp
blow
blow ramp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132386T
Other languages
English (en)
Other versions
DE69132386T2 (de
Inventor
Didier Cruz
Jacques Daval
Jean-Pierre Lazzari
Francois Torrecillas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE69132386D1 publication Critical patent/DE69132386D1/de
Application granted granted Critical
Publication of DE69132386T2 publication Critical patent/DE69132386T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • B08B5/023—Cleaning travelling work

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Prevention Of Fouling (AREA)
DE69132386T 1990-04-24 1991-04-22 Blasrampe Expired - Fee Related DE69132386T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR909005210A FR2661117B1 (fr) 1990-04-24 1990-04-24 Procede de protection de surfaces contre la contamination particulaire ambiante a l'aide d'elements soufflants.

Publications (2)

Publication Number Publication Date
DE69132386D1 true DE69132386D1 (de) 2000-10-05
DE69132386T2 DE69132386T2 (de) 2001-03-29

Family

ID=9396031

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69132386T Expired - Fee Related DE69132386T2 (de) 1990-04-24 1991-04-22 Blasrampe

Country Status (5)

Country Link
US (1) US5241758A (de)
EP (1) EP0454555B1 (de)
JP (1) JPH04226011A (de)
DE (1) DE69132386T2 (de)
FR (1) FR2661117B1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439523A (en) * 1994-02-14 1995-08-08 Memc Electronic Materials, Inc. Device for suppressing particle splash onto a semiconductor wafer
US6018842A (en) * 1997-08-13 2000-02-01 Billco Manufacturing, Inc. Glass washing machine
US5934991A (en) * 1998-02-01 1999-08-10 Fortrend Engineering Corporation Pod loader interface improved clean air system
NL1011487C2 (nl) * 1999-03-08 2000-09-18 Koninkl Philips Electronics Nv Werkwijze en inrichting voor het roteren van een wafer.
NL1013989C2 (nl) 1999-12-29 2001-07-02 Asm Int Werkwijze en inrichting voor het behandelen van een wafer.
US6883250B1 (en) 2003-11-04 2005-04-26 Asm America, Inc. Non-contact cool-down station for wafers
JP2005262088A (ja) * 2004-03-18 2005-09-29 Fuji Photo Film Co Ltd 支持体表面の防塵方法及び装置
JP5806702B2 (ja) * 2013-05-16 2015-11-10 川崎重工業株式会社 クリーン機能を備えた板材切断装置
JP5678126B2 (ja) * 2013-05-16 2015-02-25 川崎重工業株式会社 高い清浄度を要する板材加工装置
CN107685047A (zh) * 2016-08-04 2018-02-13 特铨股份有限公司 非接触式光罩或晶圆洁净装置
WO2019236695A1 (en) * 2018-06-05 2019-12-12 Illinois Tool Works Inc. Air rinsing apparatus and systems for rinsing containers
CN109529980B (zh) * 2018-11-16 2021-11-02 成都斯力康科技股份有限公司 适用于硅料入炉前的上游处理系统
CN112354921A (zh) * 2020-10-22 2021-02-12 刘应国 一种海洋监控设备的维护清理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438668A (en) * 1965-08-26 1969-04-15 Gen Electric Contactless lifter
US4037830A (en) * 1976-09-07 1977-07-26 International Business Machines Corporation Wafer handler
US4236851A (en) * 1978-01-05 1980-12-02 Kasper Instruments, Inc. Disc handling system and method
EP0224034A1 (de) * 1985-10-29 1987-06-03 Präzisions-Werkzeuge AG Verfahren und Anordnung zur Verhinderung der Absenkung von Schwebepartikeln und thermische Behandlungsstation an einer Durchlauf-Innenbeschichtungsanlage
FR2632617B1 (fr) * 1988-06-09 1990-08-17 Commissariat Energie Atomique Couloir adaptable pour le transport de pieces dans un environnement ultra-propre
JP2801014B2 (ja) * 1988-06-17 1998-09-21 アドヴァンスド、セミコンダクター・マテリアルズ・アメリカ・インコーポレーテッド ベルヌーイのピックアップを備えるウエーハ取り扱いシステム

Also Published As

Publication number Publication date
EP0454555A1 (de) 1991-10-30
EP0454555B1 (de) 2000-08-30
JPH04226011A (ja) 1992-08-14
DE69132386T2 (de) 2001-03-29
US5241758A (en) 1993-09-07
FR2661117A1 (fr) 1991-10-25
FR2661117B1 (fr) 1994-09-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee