DE69115276T2 - Vorrichtung und verfahren zur herstellung von optischen wellenleitern auf metallischen substraten. - Google Patents

Vorrichtung und verfahren zur herstellung von optischen wellenleitern auf metallischen substraten.

Info

Publication number
DE69115276T2
DE69115276T2 DE69115276T DE69115276T DE69115276T2 DE 69115276 T2 DE69115276 T2 DE 69115276T2 DE 69115276 T DE69115276 T DE 69115276T DE 69115276 T DE69115276 T DE 69115276T DE 69115276 T2 DE69115276 T2 DE 69115276T2
Authority
DE
Germany
Prior art keywords
production
optical wave
metal substrates
wave guides
guides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69115276T
Other languages
English (en)
Other versions
DE69115276D1 (de
Inventor
Cheng-Ko Sun
Shigeki Sakaguchi
Tadashi Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Viavi Solutions Inc
Original Assignee
PHOTONIC INTEGRATION RESEARCH Inc COLUMBUS OHIO US
Photonic Integration Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PHOTONIC INTEGRATION RESEARCH Inc COLUMBUS OHIO US, Photonic Integration Research Inc filed Critical PHOTONIC INTEGRATION RESEARCH Inc COLUMBUS OHIO US
Application granted granted Critical
Publication of DE69115276D1 publication Critical patent/DE69115276D1/de
Publication of DE69115276T2 publication Critical patent/DE69115276T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
DE69115276T 1990-06-29 1991-06-26 Vorrichtung und verfahren zur herstellung von optischen wellenleitern auf metallischen substraten. Expired - Fee Related DE69115276T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/545,874 US5059475A (en) 1990-06-29 1990-06-29 Apparatus and method of forming optical waveguides on metalized substrates
PCT/US1991/004560 WO1992000189A1 (en) 1990-06-29 1991-06-26 Apparatus and method of forming optical waveguides on metalized substrates

Publications (2)

Publication Number Publication Date
DE69115276D1 DE69115276D1 (de) 1996-01-18
DE69115276T2 true DE69115276T2 (de) 1996-07-25

Family

ID=24177894

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69115276T Expired - Fee Related DE69115276T2 (de) 1990-06-29 1991-06-26 Vorrichtung und verfahren zur herstellung von optischen wellenleitern auf metallischen substraten.

Country Status (5)

Country Link
US (1) US5059475A (de)
EP (1) EP0536312B1 (de)
JP (1) JP2651509B2 (de)
DE (1) DE69115276T2 (de)
WO (1) WO1992000189A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
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DE69224454T2 (de) * 1991-09-30 1998-07-30 At & T Corp Verfahren zur Herstellung von planaren optischen Wellenleitern
US5261022A (en) * 1991-10-21 1993-11-09 Photonic Integration Research, Inc. Optical waveguide of silica glass film on ceramic substrate
GB9202463D0 (en) * 1992-02-05 1992-03-18 British Telecomm Silica waveguide structure
US5238877A (en) * 1992-04-30 1993-08-24 The United States Of America As Represented By The Secretary Of The Navy Conformal method of fabricating an optical waveguide on a semiconductor substrate
JP2637891B2 (ja) * 1993-03-26 1997-08-06 日本電気株式会社 光導波路の製造方法
SE503905C2 (sv) * 1994-03-16 1996-09-30 Ericsson Telefon Ab L M Förfarande för framställning av en optokomponent samt optokomponent
SE513183C2 (sv) * 1994-03-18 2000-07-24 Ericsson Telefon Ab L M Förfarande för framställning av en optokomponent samt kapslad optokomponent
FR2727768B1 (fr) * 1994-12-05 1997-01-10 Alcatel Nv Procede pour former une couche de silice a eliminer ulterieurement et procede pour rapporter un composant en optique integree
AUPN258095A0 (en) * 1995-04-21 1995-05-18 Unisearch Limited Low temperature fabrication of silica-based pecvd channel waveguides
AU713117B2 (en) * 1995-04-21 1999-11-25 Unisearch Limited Fabrication of silica-based optical devices and opto-electronic devices
US5800860A (en) * 1995-06-28 1998-09-01 Lucent Technologies Inc. Method of manufacturing planar optical waveguides
FR2746545B1 (fr) 1996-03-25 1998-06-12 Alcatel Sel Aktiengesellsohaft Procede pour fabriquer un composant a substrat de silicium cristallin
US5949934A (en) * 1996-04-05 1999-09-07 Fujikura, Ltd. Optical waveguide grating and production method therefor
US5841931A (en) * 1996-11-26 1998-11-24 Massachusetts Institute Of Technology Methods of forming polycrystalline semiconductor waveguides for optoelectronic integrated circuits, and devices formed thereby
DE19805170A1 (de) * 1998-02-10 1999-08-12 Cit Alcatel Planarer optischer Wellenleiter und Verfahren zu seiner Herstellung
US6845184B1 (en) 1998-10-09 2005-01-18 Fujitsu Limited Multi-layer opto-electronic substrates with electrical and optical interconnections and methods for making
US6706546B2 (en) 1998-10-09 2004-03-16 Fujitsu Limited Optical reflective structures and method for making
US6684007B2 (en) 1998-10-09 2004-01-27 Fujitsu Limited Optical coupling structures and the fabrication processes
US6611635B1 (en) 1998-10-09 2003-08-26 Fujitsu Limited Opto-electronic substrates with electrical and optical interconnections and methods for making
US6690845B1 (en) 1998-10-09 2004-02-10 Fujitsu Limited Three-dimensional opto-electronic modules with electrical and optical interconnections and methods for making
US6785447B2 (en) 1998-10-09 2004-08-31 Fujitsu Limited Single and multilayer waveguides and fabrication process
US6343171B1 (en) 1998-10-09 2002-01-29 Fujitsu Limited Systems based on opto-electronic substrates with electrical and optical interconnections and methods for making
JP2001274528A (ja) 2000-01-21 2001-10-05 Fujitsu Ltd 薄膜デバイスの基板間転写方法
WO2002031566A1 (de) * 2000-10-10 2002-04-18 Siemens Aktiengesellschaft Leiterplatte mit optischen lagen aus glas
US7043133B2 (en) * 2001-07-12 2006-05-09 Little Optics, Inc. Silicon-oxycarbide high index contrast, low-loss optical waveguides and integrated thermo-optic devices
US6614977B2 (en) 2001-07-12 2003-09-02 Little Optics, Inc. Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides
WO2003009011A2 (en) 2001-07-20 2003-01-30 Nufern Optical fiber grating having high temperature insensitivity
US6603916B1 (en) * 2001-07-26 2003-08-05 Lightwave Microsystems Corporation Lightwave circuit assembly having low deformation balanced sandwich substrate
MY134020A (en) * 2001-08-03 2007-11-30 Asml Us Inc Oxide structure useable for optical waveguide and method of forming the oxide structure
US6542671B1 (en) 2001-12-12 2003-04-01 Super Light Wave Corp. Integrated 3-dimensional multi-layer thin-film optical couplers and attenuators
US6904214B2 (en) * 2002-05-14 2005-06-07 Nufern Method of providing an optical fiber having a minimum temperature sensitivity at a selected temperature
US20040075062A1 (en) * 2002-08-27 2004-04-22 Fuji Photo Film Co., Ltd. Stimulable phosphor sheet
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US20060024067A1 (en) * 2004-07-28 2006-02-02 Koontz Elisabeth M Optical I/O chip for use with distinct electronic chip
US7529440B2 (en) * 2006-12-31 2009-05-05 Motorola, Inc. Circuit substrate supporting optically and electrically conveyed signals, and method for forming same
CN104090335B (zh) * 2014-07-30 2017-02-15 四川飞阳科技有限公司 一种平面光波导器件的制作方法

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US3934061A (en) * 1972-03-30 1976-01-20 Corning Glass Works Method of forming planar optical waveguides
US3873339A (en) * 1972-03-30 1975-03-25 Corning Glass Works Method of forming optical waveguide circuit path
US3933454A (en) * 1974-04-22 1976-01-20 Corning Glass Works Method of making optical waveguides
US4236930A (en) * 1978-06-09 1980-12-02 Macedo Pedro B Optical waveguide and method and compositions for producing same
US4125388A (en) * 1976-12-20 1978-11-14 Corning Glass Works Method of making optical waveguides
US4157906A (en) * 1978-02-21 1979-06-12 Corning Glass Works Method of drawing glass optical waveguides
US4263031A (en) * 1978-06-12 1981-04-21 Corning Glass Works Method of producing glass optical filaments
US4203744A (en) * 1979-01-02 1980-05-20 Corning Glass Works Method of making nitrogen-doped graded index optical waveguides
US4298365A (en) * 1980-07-03 1981-11-03 Corning Glass Works Method of making a soot preform compositional profile
JPS5781213A (en) * 1980-11-11 1982-05-21 Nippon Telegr & Teleph Corp <Ntt> Production of thin film for optical waveguide
JPS57106181A (en) * 1980-12-24 1982-07-01 Toshiba Corp Integrated circuit
US4453961A (en) * 1982-07-26 1984-06-12 Corning Glass Works Method of making glass optical fiber
US4486212A (en) * 1982-09-29 1984-12-04 Corning Glass Works Devitrification resistant flame hydrolysis process
JPS5975656A (ja) * 1982-10-25 1984-04-28 Agency Of Ind Science & Technol 半導体集積回路構造
JPS59143109A (ja) * 1983-02-04 1984-08-16 Sumitomo Electric Ind Ltd 光集積回路
US5009476A (en) * 1984-01-16 1991-04-23 Texas Instruments Incorporated Semiconductor layer with optical communication between chips disposed therein
JPS60162207A (ja) * 1984-02-01 1985-08-24 Hitachi Ltd 光導波路およびその製造方法
JPS60243606A (ja) * 1984-05-17 1985-12-03 Canon Inc 薄膜型光学素子
US4701008A (en) * 1984-08-10 1987-10-20 Motorola, Inc. Optical waveguide including superstrate of niobium or silicon oxynitride and method of making same
US4664473A (en) * 1985-04-01 1987-05-12 Corning Glass Works Optical fiber formed of MgO--Al2 O3 --SiO2 glass
JPS62119505A (ja) * 1985-11-20 1987-05-30 Fujitsu Ltd 光導波路デイバイスの形成方法
JPH07119848B2 (ja) * 1986-09-09 1995-12-20 富士通株式会社 石英系光導波路の製造方法
JPS63224252A (ja) * 1987-02-06 1988-09-19 シーメンス、アクチエンゲゼルシヤフト 導波路−ホトダイオードアレー
US4762382A (en) * 1987-06-29 1988-08-09 Honeywell Inc. Optical interconnect circuit for GaAs optoelectronics and Si VLSI/VHSIC
JPH0711606B2 (ja) * 1988-02-01 1995-02-08 日本電信電話株式会社 石英系光導波膜

Also Published As

Publication number Publication date
JPH05507815A (ja) 1993-11-04
EP0536312B1 (de) 1995-12-06
US5059475A (en) 1991-10-22
WO1992000189A1 (en) 1992-01-09
EP0536312A4 (en) 1993-06-30
EP0536312A1 (de) 1993-04-14
JP2651509B2 (ja) 1997-09-10
DE69115276D1 (de) 1996-01-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: JDS UNIPHASE CORP., SAN JOSE, CALIF., US

8328 Change in the person/name/address of the agent

Free format text: PATENTANWALTSKANZLEI KEHL UND KOLLEGEN, 81679 MUENCHEN

8339 Ceased/non-payment of the annual fee