DE69113332D1 - Vakuum-Ultraviolettlichtquelle. - Google Patents

Vakuum-Ultraviolettlichtquelle.

Info

Publication number
DE69113332D1
DE69113332D1 DE69113332T DE69113332T DE69113332D1 DE 69113332 D1 DE69113332 D1 DE 69113332D1 DE 69113332 T DE69113332 T DE 69113332T DE 69113332 T DE69113332 T DE 69113332T DE 69113332 D1 DE69113332 D1 DE 69113332D1
Authority
DE
Germany
Prior art keywords
light source
ultraviolet light
vacuum ultraviolet
vacuum
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69113332T
Other languages
English (en)
Other versions
DE69113332T2 (de
Inventor
Setsuo Suzuki
Etsuo Noda
Osami Morimiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE69113332D1 publication Critical patent/DE69113332D1/de
Application granted granted Critical
Publication of DE69113332T2 publication Critical patent/DE69113332T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/92—Lamps with more than one main discharge path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/09—Hollow cathodes
DE69113332T 1990-06-22 1991-06-21 Vakuum-Ultraviolettlichtquelle. Expired - Lifetime DE69113332T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16271090 1990-06-22

Publications (2)

Publication Number Publication Date
DE69113332D1 true DE69113332D1 (de) 1995-11-02
DE69113332T2 DE69113332T2 (de) 1996-03-14

Family

ID=15759824

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69113332T Expired - Lifetime DE69113332T2 (de) 1990-06-22 1991-06-21 Vakuum-Ultraviolettlichtquelle.

Country Status (3)

Country Link
US (1) US5185552A (de)
EP (1) EP0463815B1 (de)
DE (1) DE69113332T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1041147C (zh) * 1993-04-29 1998-12-09 南开大学 冷阴极低压无汞紫外光气体放电灯
US5382804A (en) * 1993-07-15 1995-01-17 Cetac Technologies Inc. Compact photoinization systems
US5637962A (en) * 1995-06-09 1997-06-10 The Regents Of The University Of California Office Of Technology Transfer Plasma wake field XUV radiation source
US6327897B1 (en) 1997-01-24 2001-12-11 Mainstream Engineering Corporation Method of introducing an in situant into a vapor compression system, especially useful for leak detection, as well as an apparatus for leak detection and a composition useful for leak detection
US6170320B1 (en) 1997-01-24 2001-01-09 Mainstream Engineering Corporation Method of introducing an additive into a fluid system, especially useful for leak detection, as well as an apparatus for leak detection and a composition useful for leak detection
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
US6015759A (en) * 1997-12-08 2000-01-18 Quester Technology, Inc. Surface modification of semiconductors using electromagnetic radiation
US6049086A (en) * 1998-02-12 2000-04-11 Quester Technology, Inc. Large area silent discharge excitation radiator
US6105885A (en) * 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
US6180952B1 (en) 1998-04-03 2001-01-30 Advanced Energy Systems, Inc. Holder assembly system and method in an emitted energy system for photolithography
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
DE19835512C1 (de) * 1998-08-06 1999-12-16 Daimlerchrysler Aerospace Ag Ionentriebwerk
DE19922566B4 (de) * 1998-12-16 2004-11-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Erzeugung von Ultraviolettstrahlung
GB2346007B (en) 1999-01-21 2004-03-03 Imaging & Sensing Tech Corp Getter flash shield
US6369398B1 (en) 1999-03-29 2002-04-09 Barry Gelernt Method of lithography using vacuum ultraviolet radiation
DE19962160C2 (de) 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
US6657370B1 (en) * 2000-08-21 2003-12-02 Micron Technology, Inc. Microcavity discharge device
US6779350B2 (en) 2002-03-21 2004-08-24 Ritchie Enginerring Company, Inc. Compressor head, internal discriminator, external discriminator, manifold design for refrigerant recovery apparatus and vacuum sensor
US6832491B2 (en) * 2002-03-21 2004-12-21 Ritchie Engineering Company, Inc. Compressor head, internal discriminator, external discriminator, manifold design for refrigerant recovery apparatus
US7218596B2 (en) * 2003-05-12 2007-05-15 Invent Technologies, Llc Apparatus and method for optical data storage and retrieval
US20050126200A1 (en) * 2003-12-05 2005-06-16 Ajit Ramachandran Single valve manifold
US20060228242A1 (en) * 2005-04-11 2006-10-12 Ritchie Engineering Company, Inc. Vacuum pump
US20060228246A1 (en) * 2005-04-11 2006-10-12 Ritchie Engineering Company, Inc. Vacuum pump
US7251263B2 (en) * 2005-05-23 2007-07-31 Colorado State University Research Foundation Capillary discharge x-ray laser
CN112635294B (zh) * 2020-12-22 2022-04-19 中国科学技术大学 超高亮度真空紫外灯
CN114220728B (zh) * 2021-11-12 2023-09-12 中国人民解放军战略支援部队航天工程大学 一种惰性气体放电真空紫外光源

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB896744A (en) * 1959-10-19 1962-05-16 Commw Scient Ind Res Org Improvements in and relating to atomic spectral lamps
GB1437796A (en) * 1973-07-09 1976-06-03 Electricity Council Production of ultra-violet radiation
US4525381A (en) * 1983-02-09 1985-06-25 Ushio Denki Kabushiki Kaisha Photochemical vapor deposition apparatus
US4707637A (en) * 1986-03-24 1987-11-17 Hughes Aircraft Company Plasma-anode electron gun

Also Published As

Publication number Publication date
DE69113332T2 (de) 1996-03-14
EP0463815B1 (de) 1995-09-27
EP0463815A1 (de) 1992-01-02
US5185552A (en) 1993-02-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)