DE69102564T2 - Blastür für Behälter mit äusserst sauberer Einschliessung. - Google Patents

Blastür für Behälter mit äusserst sauberer Einschliessung.

Info

Publication number
DE69102564T2
DE69102564T2 DE69102564T DE69102564T DE69102564T2 DE 69102564 T2 DE69102564 T2 DE 69102564T2 DE 69102564 T DE69102564 T DE 69102564T DE 69102564 T DE69102564 T DE 69102564T DE 69102564 T2 DE69102564 T2 DE 69102564T2
Authority
DE
Germany
Prior art keywords
containers
extremely clean
blast door
enclosures
clean enclosures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69102564T
Other languages
English (en)
Other versions
DE69102564D1 (de
Inventor
Didier Cruz
Jacques Daval
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE69102564D1 publication Critical patent/DE69102564D1/de
Publication of DE69102564T2 publication Critical patent/DE69102564T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67757Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/139Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ventilation (AREA)
  • Special Wing (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE69102564T 1990-03-07 1991-03-05 Blastür für Behälter mit äusserst sauberer Einschliessung. Expired - Fee Related DE69102564T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9002871A FR2659263B1 (fr) 1990-03-07 1990-03-07 Porte soufflante pour conteneur de confinement ultrapropre.

Publications (2)

Publication Number Publication Date
DE69102564D1 DE69102564D1 (de) 1994-07-28
DE69102564T2 true DE69102564T2 (de) 1995-01-12

Family

ID=9394467

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69102564T Expired - Fee Related DE69102564T2 (de) 1990-03-07 1991-03-05 Blastür für Behälter mit äusserst sauberer Einschliessung.

Country Status (5)

Country Link
US (1) US5112277A (de)
EP (1) EP0446121B1 (de)
JP (1) JP3036873B2 (de)
DE (1) DE69102564T2 (de)
FR (1) FR2659263B1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303075B1 (ko) 1992-11-06 2001-11-30 조셉 제이. 스위니 집적회로 웨이퍼 이송 방법 및 장치
KR100302012B1 (ko) * 1992-11-06 2001-11-30 조셉 제이. 스위니 미소-환경 콘테이너 연결방법 및 미소-환경 로드 로크
US5378107A (en) * 1993-04-01 1995-01-03 Applied Materials, Inc. Controlled environment enclosure and mechanical interface
US5538390A (en) * 1993-10-29 1996-07-23 Applied Materials, Inc. Enclosure for load lock interface
US5752796A (en) * 1996-01-24 1998-05-19 Muka; Richard S. Vacuum integrated SMIF system
US6048154A (en) * 1996-10-02 2000-04-11 Applied Materials, Inc. High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock
US6231289B1 (en) * 1998-08-08 2001-05-15 Brooks Automation, Inc. Dual plate gas assisted heater module
US6120229A (en) * 1999-02-01 2000-09-19 Brooks Automation Inc. Substrate carrier as batchloader
JP2001284433A (ja) * 2000-01-28 2001-10-12 Sony Corp 基板移載装置及び基板移載方法
US7258520B2 (en) * 2002-08-31 2007-08-21 Applied Materials, Inc. Methods and apparatus for using substrate carrier movement to actuate substrate carrier door opening/closing
JP2005158926A (ja) * 2003-11-25 2005-06-16 Canon Inc ロードロック装置および方法
US10279311B2 (en) * 2012-08-21 2019-05-07 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for operating chemical mechanical polishing process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278380A (en) * 1979-04-30 1981-07-14 Varian Associates, Inc. Lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system
US4724874A (en) * 1986-05-01 1988-02-16 Asyst Technologies Sealable transportable container having a particle filtering system
FR2620049B2 (fr) * 1986-11-28 1989-11-24 Commissariat Energie Atomique Procede de traitement, stockage et/ou transfert d'un objet dans une atmosphere de haute proprete, et conteneur pour la mise en oeuvre de ce procede
DE3814924A1 (de) * 1988-05-03 1989-11-16 Leybold Ag Vorrichtung zum ein- und ausschleusen von substraten aus einem vakuumkessel

Also Published As

Publication number Publication date
US5112277A (en) 1992-05-12
FR2659263A1 (fr) 1991-09-13
JPH04216794A (ja) 1992-08-06
FR2659263B1 (fr) 1992-05-15
JP3036873B2 (ja) 2000-04-24
DE69102564D1 (de) 1994-07-28
EP0446121B1 (de) 1994-06-22
EP0446121A1 (de) 1991-09-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee