DE68907796D1 - Anlage zur beschichtung von halbleiterscheiben. - Google Patents
Anlage zur beschichtung von halbleiterscheiben.Info
- Publication number
- DE68907796D1 DE68907796D1 DE8989109238T DE68907796T DE68907796D1 DE 68907796 D1 DE68907796 D1 DE 68907796D1 DE 8989109238 T DE8989109238 T DE 8989109238T DE 68907796 T DE68907796 T DE 68907796T DE 68907796 D1 DE68907796 D1 DE 68907796D1
- Authority
- DE
- Germany
- Prior art keywords
- coating
- semiconductor disc
- disc
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
- B05C11/1023—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to velocity of target, e.g. to web advancement rate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/198,080 US4850299A (en) | 1988-05-24 | 1988-05-24 | Semiconductor wafer coating apparatus with angular oscillation means |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68907796D1 true DE68907796D1 (de) | 1993-09-02 |
DE68907796T2 DE68907796T2 (de) | 1994-01-27 |
Family
ID=22731914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE89109238T Expired - Fee Related DE68907796T2 (de) | 1988-05-24 | 1989-05-23 | Anlage zur Beschichtung von Halbleiterscheiben. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4850299A (de) |
EP (1) | EP0343589B1 (de) |
DE (1) | DE68907796T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3276449B2 (ja) * | 1993-05-13 | 2002-04-22 | 富士通株式会社 | 回転塗布方法 |
KR100307852B1 (ko) * | 1993-11-12 | 2001-12-01 | 제리 에스터슨 | 평탄한기판의박막코팅방법및장치 |
US5912049A (en) | 1997-08-12 | 1999-06-15 | Micron Technology, Inc. | Process liquid dispense method and apparatus |
US7074726B2 (en) * | 2002-01-31 | 2006-07-11 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating method and substrate treating apparatus |
FR3097142B1 (fr) * | 2019-06-11 | 2022-05-27 | Commissariat Energie Atomique | Procédé de dépôt |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2950990A (en) * | 1957-04-08 | 1960-08-30 | Ibm | Method for applying a uniform coating to a cylindrical body |
JPS6053675B2 (ja) * | 1978-09-20 | 1985-11-27 | 富士写真フイルム株式会社 | スピンコ−テイング方法 |
JPS5727439A (en) * | 1980-07-23 | 1982-02-13 | Yoshiro Nakamatsu | Spin coating system with speed variation |
JPS5959265A (ja) * | 1982-09-28 | 1984-04-05 | Fujitsu Ltd | スピンコ−テイング法 |
-
1988
- 1988-05-24 US US07/198,080 patent/US4850299A/en not_active Expired - Fee Related
-
1989
- 1989-05-23 DE DE89109238T patent/DE68907796T2/de not_active Expired - Fee Related
- 1989-05-23 EP EP89109238A patent/EP0343589B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0343589A1 (de) | 1989-11-29 |
EP0343589B1 (de) | 1993-07-28 |
DE68907796T2 (de) | 1994-01-27 |
US4850299A (en) | 1989-07-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |