DE68904343T2 - BIPOLAR TRANSISTOR WITH INSULATED CONTROL ELECTRODE. - Google Patents

BIPOLAR TRANSISTOR WITH INSULATED CONTROL ELECTRODE.

Info

Publication number
DE68904343T2
DE68904343T2 DE1989604343 DE68904343T DE68904343T2 DE 68904343 T2 DE68904343 T2 DE 68904343T2 DE 1989604343 DE1989604343 DE 1989604343 DE 68904343 T DE68904343 T DE 68904343T DE 68904343 T2 DE68904343 T2 DE 68904343T2
Authority
DE
Germany
Prior art keywords
bipolar transistor
control electrode
insulated control
insulated
bipolar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989604343
Other languages
German (de)
Other versions
DE68904343D1 (en
Inventor
Naoki Sakurai
Mutsuhiro Mori
Tomoyuki Tanaka
Yasumichi Yasuda
Yasunori Nakano
Tsutomu Yatsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE68904343D1 publication Critical patent/DE68904343D1/en
Application granted granted Critical
Publication of DE68904343T2 publication Critical patent/DE68904343T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395Vertical transistors, e.g. vertical IGBT
    • H01L29/7398Vertical transistors, e.g. vertical IGBT with both emitter and collector contacts in the same substrate side
DE1989604343 1988-04-01 1989-04-03 BIPOLAR TRANSISTOR WITH INSULATED CONTROL ELECTRODE. Expired - Fee Related DE68904343T2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63078028A JPH07120799B2 (en) 1988-04-01 1988-04-01 Semiconductor device

Publications (2)

Publication Number Publication Date
DE68904343D1 DE68904343D1 (en) 1993-02-25
DE68904343T2 true DE68904343T2 (en) 1993-06-09

Family

ID=13650358

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989604343 Expired - Fee Related DE68904343T2 (en) 1988-04-01 1989-04-03 BIPOLAR TRANSISTOR WITH INSULATED CONTROL ELECTRODE.

Country Status (3)

Country Link
EP (1) EP0338312B1 (en)
JP (1) JPH07120799B2 (en)
DE (1) DE68904343T2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0716009B2 (en) * 1988-12-02 1995-02-22 株式会社日立製作所 Lateral insulated gate bipolar transistor
GB8901342D0 (en) * 1989-01-21 1989-03-15 Lucas Ind Plc Semiconductor device
DE4006886A1 (en) * 1989-03-06 1990-09-13 Fuji Electric Co Ltd Semiconductor IC - uses MIS-field effect transistor configuration arranged to prevent current capacity sacrifice
WO1991003842A1 (en) * 1989-08-31 1991-03-21 Nippondenso Co., Ltd. Insulated gate bipolar transistor
JP2720574B2 (en) * 1990-05-11 1998-03-04 富士電機株式会社 Dual-gate insulated gate bipolar transistor
JP3085037B2 (en) * 1993-08-18 2000-09-04 富士電機株式会社 Insulated gate bipolar transistor
JP3255547B2 (en) * 1994-03-09 2002-02-12 株式会社東芝 Thyristor with insulated gate
DE19539021A1 (en) * 1995-10-19 1997-04-24 Siemens Ag Field-controlled bipolar transistor
US6831331B2 (en) 1995-11-15 2004-12-14 Denso Corporation Power MOS transistor for absorbing surge current
US6242787B1 (en) 1995-11-15 2001-06-05 Denso Corporation Semiconductor device and manufacturing method thereof
DE19828669C2 (en) * 1998-06-26 2003-08-21 Infineon Technologies Ag Lateral IGBT in SOI construction and manufacturing process
DE19906384A1 (en) * 1999-02-16 2000-08-24 Siemens Ag Insulated gate bipolar transistor with electric pn-junction insulation of adjacent components
DE102004028474B4 (en) * 2004-06-11 2009-04-09 X-Fab Semiconductor Foundries Ag Integrated component in a SOI disk

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE8107136L (en) * 1980-12-02 1982-06-03 Gen Electric STEERING ELECTRICAL EQUIPMENT
GB2125622B (en) * 1982-02-09 1985-10-02 Western Electric Co Field-effect controlled bi-directional lateral thyristor
DE3379302D1 (en) * 1982-12-13 1989-04-06 Gen Electric Lateral insulated-gate rectifier structures
CA1200322A (en) * 1982-12-13 1986-02-04 General Electric Company Bidirectional insulated-gate rectifier structures and method of operation
EP0144654A3 (en) * 1983-11-03 1987-10-07 General Electric Company Semiconductor device structure including a dielectrically-isolated insulated-gate transistor
JPS60260152A (en) * 1984-06-07 1985-12-23 Nec Corp Mos gate bipolar transistor
JPS6124278A (en) * 1984-07-13 1986-02-01 Toshiba Corp Insulated gate type semiconductor device
JPH0779164B2 (en) * 1986-01-30 1995-08-23 三菱電機株式会社 Semiconductor device

Also Published As

Publication number Publication date
EP0338312A3 (en) 1990-03-21
JPH07120799B2 (en) 1995-12-20
DE68904343D1 (en) 1993-02-25
JPH01253278A (en) 1989-10-09
EP0338312B1 (en) 1993-01-13
EP0338312A2 (en) 1989-10-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee