DE60334052D1 - Schattenmaske für die Herstellung eines flachen Displays - Google Patents

Schattenmaske für die Herstellung eines flachen Displays

Info

Publication number
DE60334052D1
DE60334052D1 DE60334052T DE60334052T DE60334052D1 DE 60334052 D1 DE60334052 D1 DE 60334052D1 DE 60334052 T DE60334052 T DE 60334052T DE 60334052 T DE60334052 T DE 60334052T DE 60334052 D1 DE60334052 D1 DE 60334052D1
Authority
DE
Germany
Prior art keywords
making
shadow mask
flat display
flat
display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60334052T
Other languages
English (en)
Inventor
Chang Nam Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Display Co Ltd filed Critical LG Display Co Ltd
Application granted granted Critical
Publication of DE60334052D1 publication Critical patent/DE60334052D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Physical Vapour Deposition (AREA)
DE60334052T 2002-07-03 2003-07-02 Schattenmaske für die Herstellung eines flachen Displays Expired - Lifetime DE60334052D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0038347A KR100480705B1 (ko) 2002-07-03 2002-07-03 유기 ｅｌ 소자 제작용 새도우 마스크 및 그 제조 방법

Publications (1)

Publication Number Publication Date
DE60334052D1 true DE60334052D1 (de) 2010-10-21

Family

ID=36754362

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60334052T Expired - Lifetime DE60334052D1 (de) 2002-07-03 2003-07-02 Schattenmaske für die Herstellung eines flachen Displays

Country Status (6)

Country Link
US (1) US20040003775A1 (de)
EP (1) EP1378933B1 (de)
JP (1) JP2004036001A (de)
KR (1) KR100480705B1 (de)
CN (1) CN1255844C (de)
DE (1) DE60334052D1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW558914B (en) * 2001-08-24 2003-10-21 Dainippon Printing Co Ltd Multi-face forming mask device for vacuum deposition
US7361585B2 (en) * 2004-12-23 2008-04-22 Advantech Global, Ltd System for and method of planarizing the contact region of a via by use of a continuous inline vacuum deposition
US7132361B2 (en) * 2004-12-23 2006-11-07 Advantech Global, Ltd System for and method of forming via holes by multiple deposition events in a continuous inline shadow mask deposition process
US7268431B2 (en) * 2004-12-30 2007-09-11 Advantech Global, Ltd System for and method of forming via holes by use of selective plasma etching in a continuous inline shadow mask deposition process
CN100511563C (zh) * 2006-08-15 2009-07-08 南京华显高科有限公司 表面放电型荫罩式等离子体显示板
CN105779935A (zh) * 2012-01-12 2016-07-20 大日本印刷株式会社 蒸镀掩模的制造方法及有机半导体元件的制造方法
CN103205696A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀掩膜板
CN104060220A (zh) * 2013-03-19 2014-09-24 昆山允升吉光电科技有限公司 一种用于制造有机发光显示器的掩模板
KR102106333B1 (ko) * 2013-07-08 2020-05-06 삼성디스플레이 주식회사 마스크 조립체 및 이를 이용한 유기 발광 표시 장치의 제조 방법
JP5780350B2 (ja) 2013-11-14 2015-09-16 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法
JP6288497B2 (ja) * 2013-12-13 2018-03-07 株式会社ブイ・テクノロジー マスク及びその製造方法
CN104062842B (zh) * 2014-06-30 2019-02-15 上海天马有机发光显示技术有限公司 一种掩模板及其制造方法、工艺装置
KR20170084088A (ko) 2014-10-17 2017-07-19 어드밴텍 글로벌, 리미티드 다중 마스크 정렬 시스템 및 방법
DE102014116076A1 (de) * 2014-11-04 2016-05-04 Osram Opto Semiconductors Gmbh Verfahren zum Aufbringen eines Materials auf einer Oberfläche
CN108396285B (zh) * 2018-03-19 2021-01-26 京东方科技集团股份有限公司 掩模板、显示基板及其制作方法、显示装置
JP2022071292A (ja) * 2020-10-28 2022-05-16 キヤノン株式会社 蒸着マスク、蒸着マスクを用いたデバイスの製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3226255A (en) * 1961-10-31 1965-12-28 Western Electric Co Masking method for semiconductor
US3713922A (en) * 1970-12-28 1973-01-30 Bell Telephone Labor Inc High resolution shadow masks and their preparation
US4256532A (en) * 1977-07-05 1981-03-17 International Business Machines Corporation Method for making a silicon mask
DE2922416A1 (de) * 1979-06-01 1980-12-11 Ibm Deutschland Schattenwurfmaske zum strukturieren von oberflaechenbereichen und verfahren zu ihrer herstellung
US4335161A (en) * 1980-11-03 1982-06-15 Xerox Corporation Thin film transistors, thin film transistor arrays, and a process for preparing the same
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
US4715940A (en) * 1985-10-23 1987-12-29 Gte Products Corporation Mask for patterning electrode structures in thin film EL devices
US5234781A (en) * 1988-11-07 1993-08-10 Fujitsu Limited Mask for lithographic patterning and a method of manufacturing the same
US5326426A (en) * 1991-11-14 1994-07-05 Tam Andrew C Undercut membrane mask for high energy photon patterning
US5669972A (en) * 1995-04-27 1997-09-23 International Business Machines Corporation Flex tab thick film metal mask
US6224936B1 (en) * 1998-10-07 2001-05-01 Micron Technology, Inc. Method for reducing warpage during application and curing of encapsulant materials on a printed circuit board
JP3024641B1 (ja) * 1998-10-23 2000-03-21 日本電気株式会社 シャドウマスク及びその製造方法並びにシャドウマスクを用いた有機ｅｌディスプレイの製造方法
US6469439B2 (en) * 1999-06-15 2002-10-22 Toray Industries, Inc. Process for producing an organic electroluminescent device
KR100382491B1 (ko) * 2000-11-28 2003-05-09 엘지전자 주식회사 유기 ｅｌ의 새도우 마스크
JP3678199B2 (ja) * 2001-05-16 2005-08-03 ソニー株式会社 半導体装置製造用マスクの作製方法、及び半導体装置の製造方法
KR20030002947A (ko) * 2001-07-03 2003-01-09 엘지전자 주식회사 풀칼라 유기 ｅｌ 표시소자 및 제조방법
TW558914B (en) * 2001-08-24 2003-10-21 Dainippon Printing Co Ltd Multi-face forming mask device for vacuum deposition
US6589382B2 (en) * 2001-11-26 2003-07-08 Eastman Kodak Company Aligning mask segments to provide a stitched mask for producing OLED devices
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication

Also Published As

Publication number Publication date
KR100480705B1 (ko) 2005-04-06
KR20040003600A (ko) 2004-01-13
EP1378933A3 (de) 2006-04-19
US20040003775A1 (en) 2004-01-08
CN1476041A (zh) 2004-02-18
EP1378933B1 (de) 2010-09-08
EP1378933A2 (de) 2004-01-07
JP2004036001A (ja) 2004-02-05
CN1255844C (zh) 2006-05-10

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