DE60322526D1 - Verfahren zur herstellung von hydroxylgruppen enthaltenden polymeren mit eröhter reinheit in wasserfreier, flüssiger phase - Google Patents
Verfahren zur herstellung von hydroxylgruppen enthaltenden polymeren mit eröhter reinheit in wasserfreier, flüssiger phaseInfo
- Publication number
- DE60322526D1 DE60322526D1 DE60322526T DE60322526T DE60322526D1 DE 60322526 D1 DE60322526 D1 DE 60322526D1 DE 60322526 T DE60322526 T DE 60322526T DE 60322526 T DE60322526 T DE 60322526T DE 60322526 D1 DE60322526 D1 DE 60322526D1
- Authority
- DE
- Germany
- Prior art keywords
- free
- water
- liquid phase
- hydroxyl groups
- polymers containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 HYDROXYL GROUPS Chemical group 0.000 title 1
- 239000007791 liquid phase Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F120/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/04—Fractionation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/14—Treatment of polymer emulsions
- C08F6/16—Purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/12—Hydrolysis
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/126,563 US6864324B2 (en) | 2002-04-19 | 2002-04-19 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
| PCT/US2003/011261 WO2003089480A1 (en) | 2002-04-19 | 2003-04-10 | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60322526D1 true DE60322526D1 (de) | 2008-09-11 |
Family
ID=29215054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60322526T Expired - Lifetime DE60322526D1 (de) | 2002-04-19 | 2003-04-10 | Verfahren zur herstellung von hydroxylgruppen enthaltenden polymeren mit eröhter reinheit in wasserfreier, flüssiger phase |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6864324B2 (enExample) |
| EP (1) | EP1497339B1 (enExample) |
| JP (1) | JP4261372B2 (enExample) |
| KR (1) | KR100965990B1 (enExample) |
| CN (1) | CN100564401C (enExample) |
| AR (1) | AR039433A1 (enExample) |
| AT (1) | ATE402962T1 (enExample) |
| AU (1) | AU2003221902A1 (enExample) |
| CA (1) | CA2482899A1 (enExample) |
| DE (1) | DE60322526D1 (enExample) |
| TW (1) | TWI250998B (enExample) |
| WO (1) | WO2003089480A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3841399B2 (ja) * | 2002-02-21 | 2006-11-01 | 富士写真フイルム株式会社 | ポジ型レジスト組成物 |
| US7312281B2 (en) * | 2002-04-19 | 2007-12-25 | Dupont Electronic Polymers L.P. | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
| JP4825405B2 (ja) * | 2003-05-08 | 2011-11-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジスト組成物およびそれらの調製方法 |
| JP2005350609A (ja) * | 2004-06-11 | 2005-12-22 | Daicel Chem Ind Ltd | 側鎖にアセタール構造を有する高分子化合物及びその製造法 |
| US7741429B2 (en) * | 2005-12-22 | 2010-06-22 | Dupont Electronic Polymers L.P. | Process for preparing stable photoresist compositions |
| JP4976229B2 (ja) * | 2007-08-03 | 2012-07-18 | 株式会社ダイセル | フォトレジスト用樹脂溶液の製造方法、フォトレジスト組成物およびパターン形成方法 |
| EP2315739B1 (en) | 2008-08-25 | 2014-11-12 | DuPont Electronic Polymers L.P. | New propanoates and processes for preparing the same |
| KR101111491B1 (ko) * | 2009-08-04 | 2012-03-14 | 금호석유화학 주식회사 | 신규 공중합체 및 이를 포함하는 포토레지스트 조성물 |
| FR2972193B1 (fr) | 2011-03-04 | 2014-07-04 | Setup Performance | Polyolefines modifiees, reticulables apres transformation, et procede de fabrication desdites polyolefines |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4636540A (en) | 1985-07-08 | 1987-01-13 | Atlantic Richfield Company | Purification of polymer solutions |
| US4689371A (en) | 1986-07-07 | 1987-08-25 | Celanese Corporation | Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene) |
| US4939070A (en) | 1986-07-28 | 1990-07-03 | Brunsvold William R | Thermally stable photoresists with high sensitivity |
| EP0260104A3 (en) | 1986-09-09 | 1989-03-15 | Celanese Corporation | Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene |
| US4678843A (en) | 1986-09-29 | 1987-07-07 | Celanese Corporation | Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol |
| US4931379A (en) | 1986-10-23 | 1990-06-05 | International Business Machines Corporation | High sensitivity resists having autodecomposition temperatures greater than about 160° C. |
| EP0277721A3 (en) | 1987-01-28 | 1989-03-15 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol) |
| US4822862A (en) | 1987-01-28 | 1989-04-18 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol |
| US4898916A (en) | 1987-03-05 | 1990-02-06 | Hoechst Celanese Corporation | Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification |
| US4877843A (en) | 1987-09-11 | 1989-10-31 | Hoechst Celanese Corporation | Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids |
| US4912173A (en) | 1987-10-30 | 1990-03-27 | Hoechst Celanese Corporation | Hydrolysis of poly(acetoxystyrene) in aqueous suspension |
| US4962147A (en) | 1988-05-26 | 1990-10-09 | Hoechst Celanese Corporation | Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers |
| US5239015A (en) * | 1990-06-29 | 1993-08-24 | Hoechst Celanese Corporation | Process for making low optical density polymers and copolymers for photoresists and optical applications |
| US5087772A (en) | 1990-11-16 | 1992-02-11 | Hoechst Celanese Corporation | Method for preparing 4-hydroxystyrene |
| JPH0768296B2 (ja) | 1991-11-28 | 1995-07-26 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去方法 |
| DE69322946T2 (de) | 1992-11-03 | 1999-08-12 | International Business Machines Corp., Armonk, N.Y. | Photolackzusammensetzung |
| WO1994014858A1 (en) | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Metal ion reduction in polyhydroxystyrene and photoresists |
| US5304610A (en) | 1993-01-12 | 1994-04-19 | Hoechst Celanese Corporation | Amphoteric copolymer derived from vinylpyridine and acetoxystyrene |
| US5861231A (en) | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
| US5789522A (en) | 1996-09-06 | 1998-08-04 | Shipley Company, L.L.C. | Resin purification process |
| US5888751A (en) * | 1997-07-15 | 1999-03-30 | Ludwig Institute For Cancer Research | Method for diagnosis and treating cancers, and methods for identifying pathogenic markers in a sample of normal cells |
| US5919597A (en) | 1997-10-30 | 1999-07-06 | Ibm Corporation Of Armonk | Methods for preparing photoresist compositions |
| AU3005899A (en) * | 1998-05-05 | 1999-11-23 | Triquest, Lp | Preparation of co- and terpolymers of p-hydroxystyrene and alkyl acrylates |
| JP2002514664A (ja) * | 1998-05-08 | 2002-05-21 | アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド | 遮断(blocked)ポリヒドロキシスチレン樹脂の精製溶液を製造する方法 |
| US6414110B1 (en) * | 1999-11-12 | 2002-07-02 | Triquest Lp | Purification means |
| EP1285007A2 (en) * | 2000-06-27 | 2003-02-26 | Triquest, L.P. | Purification process of polymers of alkoxystyrene |
-
2002
- 2002-04-19 US US10/126,563 patent/US6864324B2/en not_active Expired - Lifetime
-
2003
- 2003-04-10 CN CNB038014459A patent/CN100564401C/zh not_active Expired - Lifetime
- 2003-04-10 AT AT03718361T patent/ATE402962T1/de not_active IP Right Cessation
- 2003-04-10 AU AU2003221902A patent/AU2003221902A1/en not_active Abandoned
- 2003-04-10 JP JP2003586199A patent/JP4261372B2/ja not_active Expired - Lifetime
- 2003-04-10 KR KR1020047016757A patent/KR100965990B1/ko not_active Expired - Lifetime
- 2003-04-10 EP EP03718361A patent/EP1497339B1/en not_active Expired - Lifetime
- 2003-04-10 CA CA002482899A patent/CA2482899A1/en not_active Abandoned
- 2003-04-10 DE DE60322526T patent/DE60322526D1/de not_active Expired - Lifetime
- 2003-04-10 WO PCT/US2003/011261 patent/WO2003089480A1/en not_active Ceased
- 2003-04-16 AR ARP030101339A patent/AR039433A1/es not_active Application Discontinuation
- 2003-04-17 TW TW092108925A patent/TWI250998B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1497339B1 (en) | 2008-07-30 |
| AU2003221902A1 (en) | 2003-11-03 |
| KR20050007315A (ko) | 2005-01-17 |
| CA2482899A1 (en) | 2003-10-30 |
| HK1071150A1 (en) | 2005-07-08 |
| WO2003089480A1 (en) | 2003-10-30 |
| AR039433A1 (es) | 2005-02-16 |
| TWI250998B (en) | 2006-03-11 |
| JP2005535737A (ja) | 2005-11-24 |
| JP4261372B2 (ja) | 2009-04-30 |
| CN1578794A (zh) | 2005-02-09 |
| KR100965990B1 (ko) | 2010-06-24 |
| ATE402962T1 (de) | 2008-08-15 |
| US6864324B2 (en) | 2005-03-08 |
| CN100564401C (zh) | 2009-12-02 |
| EP1497339A1 (en) | 2005-01-19 |
| TW200408653A (en) | 2004-06-01 |
| US20030199641A1 (en) | 2003-10-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |