CN100564401C - 无水的液相制备高纯度含羟基聚合物的方法 - Google Patents

无水的液相制备高纯度含羟基聚合物的方法 Download PDF

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Publication number
CN100564401C
CN100564401C CNB038014459A CN03801445A CN100564401C CN 100564401 C CN100564401 C CN 100564401C CN B038014459 A CNB038014459 A CN B038014459A CN 03801445 A CN03801445 A CN 03801445A CN 100564401 C CN100564401 C CN 100564401C
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CN
China
Prior art keywords
solvent
solution
mixture
styrene
polymer
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Expired - Lifetime
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CNB038014459A
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English (en)
Chinese (zh)
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CN1578794A (zh
Inventor
M·T·希恩
J·R·桑尼克
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DuPont Electronic Technologies Inc
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DuPont Electronic Technologies Inc
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Publication of CN1578794A publication Critical patent/CN1578794A/zh
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Publication of CN100564401C publication Critical patent/CN100564401C/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/04—Fractionation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/14—Treatment of polymer emulsions
    • C08F6/16—Purification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CNB038014459A 2002-04-19 2003-04-10 无水的液相制备高纯度含羟基聚合物的方法 Expired - Lifetime CN100564401C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/126,563 2002-04-19
US10/126,563 US6864324B2 (en) 2002-04-19 2002-04-19 Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity

Publications (2)

Publication Number Publication Date
CN1578794A CN1578794A (zh) 2005-02-09
CN100564401C true CN100564401C (zh) 2009-12-02

Family

ID=29215054

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038014459A Expired - Lifetime CN100564401C (zh) 2002-04-19 2003-04-10 无水的液相制备高纯度含羟基聚合物的方法

Country Status (12)

Country Link
US (1) US6864324B2 (enExample)
EP (1) EP1497339B1 (enExample)
JP (1) JP4261372B2 (enExample)
KR (1) KR100965990B1 (enExample)
CN (1) CN100564401C (enExample)
AR (1) AR039433A1 (enExample)
AT (1) ATE402962T1 (enExample)
AU (1) AU2003221902A1 (enExample)
CA (1) CA2482899A1 (enExample)
DE (1) DE60322526D1 (enExample)
TW (1) TWI250998B (enExample)
WO (1) WO2003089480A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3841399B2 (ja) * 2002-02-21 2006-11-01 富士写真フイルム株式会社 ポジ型レジスト組成物
US7312281B2 (en) * 2002-04-19 2007-12-25 Dupont Electronic Polymers L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
TWI284783B (en) * 2003-05-08 2007-08-01 Du Pont Photoresist compositions and processes for preparing the same
JP2005350609A (ja) * 2004-06-11 2005-12-22 Daicel Chem Ind Ltd 側鎖にアセタール構造を有する高分子化合物及びその製造法
WO2007078445A1 (en) * 2005-12-22 2007-07-12 Dupont Electronic Polymers L.P. Process for preparing stable photoresist compositions
JP4976229B2 (ja) * 2007-08-03 2012-07-18 株式会社ダイセル フォトレジスト用樹脂溶液の製造方法、フォトレジスト組成物およびパターン形成方法
EP2315739B1 (en) 2008-08-25 2014-11-12 DuPont Electronic Polymers L.P. New propanoates and processes for preparing the same
KR101111491B1 (ko) * 2009-08-04 2012-03-14 금호석유화학 주식회사 신규 공중합체 및 이를 포함하는 포토레지스트 조성물
FR2972193B1 (fr) 2011-03-04 2014-07-04 Setup Performance Polyolefines modifiees, reticulables apres transformation, et procede de fabrication desdites polyolefines

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1159453C (zh) * 1997-07-15 2004-07-28 路德维格癌症研究所 鉴定正常细胞样品中致病标记的方法

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US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4636540A (en) 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
US4689371A (en) 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
US4939070A (en) 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
EP0260104A3 (en) 1986-09-09 1989-03-15 Celanese Corporation Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene
US4678843A (en) 1986-09-29 1987-07-07 Celanese Corporation Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol
US4931379A (en) 1986-10-23 1990-06-05 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160° C.
EP0277721A3 (en) 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4822862A (en) 1987-01-28 1989-04-18 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol
US4898916A (en) 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
US4877843A (en) 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
US4912173A (en) 1987-10-30 1990-03-27 Hoechst Celanese Corporation Hydrolysis of poly(acetoxystyrene) in aqueous suspension
US4962147A (en) 1988-05-26 1990-10-09 Hoechst Celanese Corporation Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers
US5239015A (en) * 1990-06-29 1993-08-24 Hoechst Celanese Corporation Process for making low optical density polymers and copolymers for photoresists and optical applications
US5087772A (en) 1990-11-16 1992-02-11 Hoechst Celanese Corporation Method for preparing 4-hydroxystyrene
JPH0768296B2 (ja) 1991-11-28 1995-07-26 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去方法
EP0605089B1 (en) 1992-11-03 1999-01-07 International Business Machines Corporation Photoresist composition
WO1994014858A1 (en) 1992-12-29 1994-07-07 Hoechst Celanese Corporation Metal ion reduction in polyhydroxystyrene and photoresists
US5304610A (en) 1993-01-12 1994-04-19 Hoechst Celanese Corporation Amphoteric copolymer derived from vinylpyridine and acetoxystyrene
US5861231A (en) 1996-06-11 1999-01-19 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising copolymer resin binder component
US5789522A (en) 1996-09-06 1998-08-04 Shipley Company, L.L.C. Resin purification process
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EP1076667B1 (en) * 1998-05-05 2004-03-24 Triquest, L.P. Preparation of co-and terpolymers of p-hydroxystyrene and alkyl acrylates
WO1999058579A1 (en) * 1998-05-08 1999-11-18 Arch Specialty Chemicals, Inc. Process for producing purified solutions of blocked polyhydroxystyrene resin
US6414110B1 (en) 1999-11-12 2002-07-02 Triquest Lp Purification means
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Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
CN1159453C (zh) * 1997-07-15 2004-07-28 路德维格癌症研究所 鉴定正常细胞样品中致病标记的方法

Also Published As

Publication number Publication date
TW200408653A (en) 2004-06-01
JP4261372B2 (ja) 2009-04-30
CA2482899A1 (en) 2003-10-30
US20030199641A1 (en) 2003-10-23
KR100965990B1 (ko) 2010-06-24
US6864324B2 (en) 2005-03-08
DE60322526D1 (de) 2008-09-11
WO2003089480A1 (en) 2003-10-30
CN1578794A (zh) 2005-02-09
JP2005535737A (ja) 2005-11-24
TWI250998B (en) 2006-03-11
AU2003221902A1 (en) 2003-11-03
ATE402962T1 (de) 2008-08-15
HK1071150A1 (en) 2005-07-08
AR039433A1 (es) 2005-02-16
EP1497339A1 (en) 2005-01-19
KR20050007315A (ko) 2005-01-17
EP1497339B1 (en) 2008-07-30

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Granted publication date: 20091202