DE60215821D1 - Verfahren zum messen der leistung eine raster-elektronenmikroskops - Google Patents
Verfahren zum messen der leistung eine raster-elektronenmikroskopsInfo
- Publication number
- DE60215821D1 DE60215821D1 DE60215821T DE60215821T DE60215821D1 DE 60215821 D1 DE60215821 D1 DE 60215821D1 DE 60215821 T DE60215821 T DE 60215821T DE 60215821 T DE60215821 T DE 60215821T DE 60215821 D1 DE60215821 D1 DE 60215821D1
- Authority
- DE
- Germany
- Prior art keywords
- sub
- surface areas
- sem
- spectra
- electronic microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2823—Resolution
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01202856 | 2001-07-26 | ||
EP01202856 | 2001-07-26 | ||
PCT/IB2002/003025 WO2003010792A1 (en) | 2001-07-26 | 2002-07-19 | Method of measuring the performance of a scanning electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60215821D1 true DE60215821D1 (de) | 2006-12-14 |
DE60215821T2 DE60215821T2 (de) | 2007-09-06 |
Family
ID=8180710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60215821T Expired - Fee Related DE60215821T2 (de) | 2001-07-26 | 2002-07-19 | Verfahren zum messen der leistung eine raster-elektronenmikroskops |
Country Status (9)
Country | Link |
---|---|
US (1) | US6960764B2 (de) |
EP (1) | EP1415320B1 (de) |
JP (1) | JP2004537142A (de) |
KR (1) | KR20040028623A (de) |
CN (1) | CN1305100C (de) |
AT (1) | ATE344530T1 (de) |
DE (1) | DE60215821T2 (de) |
TW (1) | TW571335B (de) |
WO (1) | WO2003010792A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4263416B2 (ja) * | 2001-08-24 | 2009-05-13 | 株式会社日立製作所 | 荷電粒子顕微鏡評価システム |
DE10250893B4 (de) * | 2002-10-31 | 2008-04-03 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren und Vorrichtung zum Bestimmen der Abmessung eines Strukturelements durch Variieren eines die Auflösung bestimmenden Parameters |
US7358493B2 (en) * | 2005-06-08 | 2008-04-15 | Infineon Technologies Richmond, Lp | Method and apparatus for automated beam optimization in a scanning electron microscope |
GB0519066D0 (en) * | 2005-09-19 | 2005-10-26 | Aion Diagnostics | Analytical device |
DE102006061978A1 (de) * | 2006-12-21 | 2008-06-26 | Forschungszentrum Jülich GmbH | Elektronenmikroskop und Verfahren zur Messung der Defokusstreuung |
CN101964289B (zh) * | 2010-08-25 | 2012-05-30 | 北京中科科仪技术发展有限责任公司 | 一种用于透射电镜的加速极的制造方法及其陶瓷环 |
JP5723249B2 (ja) * | 2011-09-13 | 2015-05-27 | 日本電子株式会社 | 信号処理方法、及び信号処理装置 |
CN104266572B (zh) * | 2014-09-16 | 2017-08-11 | 电子科技大学 | 一种测量扫描电子显微镜电子束斑尺寸的方法 |
US10366862B2 (en) * | 2015-09-21 | 2019-07-30 | KLA-Tencor Corporaton | Method and system for noise mitigation in a multi-beam scanning electron microscopy system |
DE102018201411A1 (de) * | 2018-01-30 | 2019-08-01 | Robert Bosch Gmbh | Verfahren zum Ermitteln eines zeitlichen Verlaufs einer Messgröße, Prognosesystem, Aktorsteuerungssystem, Verfahren zum Trainieren des Aktorsteuerungssystems,Trainingssystem, Computerprogramm und maschinenlesbares Speichermedium |
CN111447364B (zh) * | 2020-04-15 | 2021-11-26 | 上海华力集成电路制造有限公司 | 一种cdsem图像处理方法及其装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4335189A (en) * | 1980-07-28 | 1982-06-15 | International Business Machines Corp. | Resolution standard for scanning electron microscope comprising palladium spines on a metal substrate |
JP3490490B2 (ja) * | 1994-01-28 | 2004-01-26 | 株式会社東芝 | パターン画像処理装置及び画像処理方法 |
JPH07272664A (ja) * | 1994-03-30 | 1995-10-20 | Hitachi Ltd | 走査電子顕微鏡の分解能評価用試料の作製方法 |
JP2671860B2 (ja) * | 1995-03-30 | 1997-11-05 | 日本電気株式会社 | フラッシュメモリ用ファイルシステム |
JP3250721B2 (ja) * | 1995-12-12 | 2002-01-28 | キヤノン株式会社 | Soi基板の製造方法 |
US6107637A (en) * | 1997-08-11 | 2000-08-22 | Hitachi, Ltd. | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus |
US6757645B2 (en) * | 1997-09-17 | 2004-06-29 | Numerical Technologies, Inc. | Visual inspection and verification system |
US7107571B2 (en) * | 1997-09-17 | 2006-09-12 | Synopsys, Inc. | Visual analysis and verification system using advanced tools |
JPH11224640A (ja) * | 1998-02-10 | 1999-08-17 | Hitachi Ltd | 電子顕微鏡およびその分解能評価方法並びにそれを用いた半導体製造方法 |
US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
US6825480B1 (en) * | 1999-06-23 | 2004-11-30 | Hitachi, Ltd. | Charged particle beam apparatus and automatic astigmatism adjustment method |
US6657431B2 (en) * | 2000-06-06 | 2003-12-02 | Brown University Research Foundation | Scanning magnetic microscope having improved magnetic sensor |
-
2002
- 2002-07-19 CN CNB028029887A patent/CN1305100C/zh not_active Expired - Fee Related
- 2002-07-19 EP EP02751492A patent/EP1415320B1/de not_active Expired - Lifetime
- 2002-07-19 DE DE60215821T patent/DE60215821T2/de not_active Expired - Fee Related
- 2002-07-19 WO PCT/IB2002/003025 patent/WO2003010792A1/en active IP Right Grant
- 2002-07-19 US US10/482,200 patent/US6960764B2/en not_active Expired - Fee Related
- 2002-07-19 JP JP2003516082A patent/JP2004537142A/ja active Pending
- 2002-07-19 KR KR10-2003-7004121A patent/KR20040028623A/ko not_active Application Discontinuation
- 2002-07-19 AT AT02751492T patent/ATE344530T1/de not_active IP Right Cessation
- 2002-08-27 TW TW091119393A patent/TW571335B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20040173748A1 (en) | 2004-09-09 |
US6960764B2 (en) | 2005-11-01 |
KR20040028623A (ko) | 2004-04-03 |
EP1415320A1 (de) | 2004-05-06 |
CN1476627A (zh) | 2004-02-18 |
DE60215821T2 (de) | 2007-09-06 |
WO2003010792A1 (en) | 2003-02-06 |
JP2004537142A (ja) | 2004-12-09 |
CN1305100C (zh) | 2007-03-14 |
TW571335B (en) | 2004-01-11 |
ATE344530T1 (de) | 2006-11-15 |
EP1415320B1 (de) | 2006-11-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |