DE602008003641D1 - Pellicle and process for its preparation - Google Patents
Pellicle and process for its preparationInfo
- Publication number
- DE602008003641D1 DE602008003641D1 DE200860003641 DE602008003641T DE602008003641D1 DE 602008003641 D1 DE602008003641 D1 DE 602008003641D1 DE 200860003641 DE200860003641 DE 200860003641 DE 602008003641 T DE602008003641 T DE 602008003641T DE 602008003641 D1 DE602008003641 D1 DE 602008003641D1
- Authority
- DE
- Germany
- Prior art keywords
- pellicle
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007270843 | 2007-10-18 | ||
JP2007293692A JP4861963B2 (en) | 2007-10-18 | 2007-11-12 | Pellicle and method for manufacturing pellicle |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602008003641D1 true DE602008003641D1 (en) | 2011-01-05 |
Family
ID=40594710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200860003641 Active DE602008003641D1 (en) | 2007-10-18 | 2008-10-14 | Pellicle and process for its preparation |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4861963B2 (en) |
CN (1) | CN101414118A (en) |
DE (1) | DE602008003641D1 (en) |
TW (1) | TWI414883B (en) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4928494B2 (en) * | 2008-05-02 | 2012-05-09 | 信越化学工業株式会社 | Pellicle and method for manufacturing pellicle |
JP4934099B2 (en) * | 2008-05-22 | 2012-05-16 | 信越化学工業株式会社 | Pellicle and method for manufacturing pellicle |
JP5672920B2 (en) * | 2010-10-05 | 2015-02-18 | 凸版印刷株式会社 | Pellicle and exposure apparatus |
NL2011237A (en) * | 2012-08-03 | 2014-02-04 | Asml Netherlands Bv | Lithographic apparatus and method. |
CN103676459B (en) * | 2012-09-13 | 2016-08-31 | 中芯国际集成电路制造(上海)有限公司 | Light shield apparatus |
JP6148112B2 (en) * | 2013-04-02 | 2017-06-14 | リソテック ジャパン株式会社 | Light transmittance measurement method |
CN105229776B (en) | 2013-05-24 | 2019-05-03 | 三井化学株式会社 | Protect membrane module and the EUV exposure device containing it |
JP5686394B1 (en) | 2014-04-11 | 2015-03-18 | レーザーテック株式会社 | Pellicle inspection device |
SG11201608777TA (en) | 2014-05-02 | 2016-12-29 | Mitsui Chemicals Inc | Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device |
KR20180072844A (en) | 2014-05-19 | 2018-06-29 | 미쯔이가가꾸가부시끼가이샤 | Pellicle film, pellicle, exposure master, exposure device, and method for manufacturing semiconductor device |
TWI556055B (en) * | 2014-08-12 | 2016-11-01 | Micro Lithography Inc | A mask protective film module and manufacturing method thereof |
US10031411B2 (en) | 2014-11-26 | 2018-07-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for EUV mask and fabrication thereof |
US9709884B2 (en) | 2014-11-26 | 2017-07-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV mask and manufacturing method by using the same |
KR101624078B1 (en) * | 2015-04-24 | 2016-05-25 | 한양대학교 에리카산학협력단 | Pellicle and method of fabricating the same |
US9835940B2 (en) * | 2015-09-18 | 2017-12-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method to fabricate mask-pellicle system |
KR20220140650A (en) * | 2015-12-14 | 2022-10-18 | 에이에스엠엘 네델란즈 비.브이. | A membrane for euv lithography |
JP6944768B2 (en) | 2016-08-29 | 2021-10-06 | エア・ウォーター株式会社 | How to make a pellicle |
US10001701B1 (en) * | 2016-12-15 | 2018-06-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle structures and methods of fabricating thereof |
KR101981950B1 (en) * | 2017-11-10 | 2019-05-24 | 주식회사 에스앤에스텍 | Pellicle for Extreme Ultraviolet Lithography |
CN111373328B (en) * | 2017-11-21 | 2023-06-09 | Asml荷兰有限公司 | Porous graphite surface film |
JP7319059B2 (en) | 2019-02-25 | 2023-08-01 | エア・ウォーター株式会社 | Method for producing pellicle intermediate and method for producing pellicle |
CN113253566B (en) * | 2020-02-10 | 2024-04-09 | 永恒光实业股份有限公司 | Composite fine mask |
KR102375433B1 (en) * | 2020-12-02 | 2022-03-18 | 한국전자기술연구원 | Pellicle for extreme ultraviolet exposure including a three-component core layer |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63262651A (en) * | 1987-04-21 | 1988-10-28 | Seiko Epson Corp | Photomask protective film |
JPH0262542A (en) * | 1988-08-29 | 1990-03-02 | Shin Etsu Chem Co Ltd | Pellicle for excimer laser lithography |
JPH06100826B2 (en) * | 1989-03-03 | 1994-12-12 | 信越化学工業株式会社 | Pellicle for lithograph |
US5935733A (en) * | 1996-04-05 | 1999-08-10 | Intel Corporation | Photolithography mask and method of fabrication |
US6171982B1 (en) * | 1997-12-26 | 2001-01-09 | Canon Kabushiki Kaisha | Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same |
JPH11231508A (en) * | 1998-02-17 | 1999-08-27 | Shin Etsu Chem Co Ltd | Method for preparing reproduced reticle and reproduced reticle |
JP2000292908A (en) * | 1999-04-02 | 2000-10-20 | Shin Etsu Chem Co Ltd | Pellicle for lithography |
DE10016008A1 (en) * | 2000-03-31 | 2001-10-11 | Zeiss Carl | Village system and its manufacture |
US6623893B1 (en) * | 2001-01-26 | 2003-09-23 | Advanced Micro Devices, Inc. | Pellicle for use in EUV lithography and a method of making such a pellicle |
JP2005529362A (en) * | 2002-06-10 | 2005-09-29 | トッパン、フォウタマスクス、インク | Photomask and defect repair method |
JP2005070120A (en) * | 2003-08-27 | 2005-03-17 | Shin Etsu Chem Co Ltd | Pellicle for lithography |
WO2005029181A2 (en) * | 2003-09-23 | 2005-03-31 | Koninklijke Philips Electronics N.V. | Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
JP2005215508A (en) * | 2004-01-30 | 2005-08-11 | Nikon Corp | Substrate, exposure apparatus and exposure system |
US7416820B2 (en) * | 2007-01-31 | 2008-08-26 | International Business Machines Corporation | Pellicle film optimized for immersion lithography systems with NA>1 |
-
2007
- 2007-11-12 JP JP2007293692A patent/JP4861963B2/en active Active
-
2008
- 2008-10-14 DE DE200860003641 patent/DE602008003641D1/en active Active
- 2008-10-17 TW TW97139865A patent/TWI414883B/en active
- 2008-10-17 CN CN 200810149932 patent/CN101414118A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TWI414883B (en) | 2013-11-11 |
JP4861963B2 (en) | 2012-01-25 |
JP2009116284A (en) | 2009-05-28 |
CN101414118A (en) | 2009-04-22 |
TW200919082A (en) | 2009-05-01 |
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