DE602008003641D1 - Pellicle and process for its preparation - Google Patents

Pellicle and process for its preparation

Info

Publication number
DE602008003641D1
DE602008003641D1 DE200860003641 DE602008003641T DE602008003641D1 DE 602008003641 D1 DE602008003641 D1 DE 602008003641D1 DE 200860003641 DE200860003641 DE 200860003641 DE 602008003641 T DE602008003641 T DE 602008003641T DE 602008003641 D1 DE602008003641 D1 DE 602008003641D1
Authority
DE
Germany
Prior art keywords
pellicle
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200860003641
Other languages
German (de)
Inventor
Yoshihiro Kubota
Shoji Akiyama
Toshihiko Shindoo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE602008003641D1 publication Critical patent/DE602008003641D1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

DE200860003641 2007-10-18 2008-10-14 Pellicle and process for its preparation Active DE602008003641D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007270843 2007-10-18
JP2007293692A JP4861963B2 (en) 2007-10-18 2007-11-12 Pellicle and method for manufacturing pellicle

Publications (1)

Publication Number Publication Date
DE602008003641D1 true DE602008003641D1 (en) 2011-01-05

Family

ID=40594710

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200860003641 Active DE602008003641D1 (en) 2007-10-18 2008-10-14 Pellicle and process for its preparation

Country Status (4)

Country Link
JP (1) JP4861963B2 (en)
CN (1) CN101414118A (en)
DE (1) DE602008003641D1 (en)
TW (1) TWI414883B (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4928494B2 (en) * 2008-05-02 2012-05-09 信越化学工業株式会社 Pellicle and method for manufacturing pellicle
JP4934099B2 (en) * 2008-05-22 2012-05-16 信越化学工業株式会社 Pellicle and method for manufacturing pellicle
JP5672920B2 (en) * 2010-10-05 2015-02-18 凸版印刷株式会社 Pellicle and exposure apparatus
NL2011237A (en) * 2012-08-03 2014-02-04 Asml Netherlands Bv Lithographic apparatus and method.
CN103676459B (en) * 2012-09-13 2016-08-31 中芯国际集成电路制造(上海)有限公司 Light shield apparatus
JP6148112B2 (en) * 2013-04-02 2017-06-14 リソテック ジャパン株式会社 Light transmittance measurement method
CN105229776B (en) 2013-05-24 2019-05-03 三井化学株式会社 Protect membrane module and the EUV exposure device containing it
JP5686394B1 (en) 2014-04-11 2015-03-18 レーザーテック株式会社 Pellicle inspection device
SG11201608777TA (en) 2014-05-02 2016-12-29 Mitsui Chemicals Inc Pellicle frame, pellicle and method of manufacturing the same,original plate for exposure and method of manufacturing thesame, exposure device, and method of manufacturingsemiconductor device
KR20180072844A (en) 2014-05-19 2018-06-29 미쯔이가가꾸가부시끼가이샤 Pellicle film, pellicle, exposure master, exposure device, and method for manufacturing semiconductor device
TWI556055B (en) * 2014-08-12 2016-11-01 Micro Lithography Inc A mask protective film module and manufacturing method thereof
US10031411B2 (en) 2014-11-26 2018-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle for EUV mask and fabrication thereof
US9709884B2 (en) 2014-11-26 2017-07-18 Taiwan Semiconductor Manufacturing Company, Ltd. EUV mask and manufacturing method by using the same
KR101624078B1 (en) * 2015-04-24 2016-05-25 한양대학교 에리카산학협력단 Pellicle and method of fabricating the same
US9835940B2 (en) * 2015-09-18 2017-12-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method to fabricate mask-pellicle system
KR20220140650A (en) * 2015-12-14 2022-10-18 에이에스엠엘 네델란즈 비.브이. A membrane for euv lithography
JP6944768B2 (en) 2016-08-29 2021-10-06 エア・ウォーター株式会社 How to make a pellicle
US10001701B1 (en) * 2016-12-15 2018-06-19 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle structures and methods of fabricating thereof
KR101981950B1 (en) * 2017-11-10 2019-05-24 주식회사 에스앤에스텍 Pellicle for Extreme Ultraviolet Lithography
CN111373328B (en) * 2017-11-21 2023-06-09 Asml荷兰有限公司 Porous graphite surface film
JP7319059B2 (en) 2019-02-25 2023-08-01 エア・ウォーター株式会社 Method for producing pellicle intermediate and method for producing pellicle
CN113253566B (en) * 2020-02-10 2024-04-09 永恒光实业股份有限公司 Composite fine mask
KR102375433B1 (en) * 2020-12-02 2022-03-18 한국전자기술연구원 Pellicle for extreme ultraviolet exposure including a three-component core layer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262651A (en) * 1987-04-21 1988-10-28 Seiko Epson Corp Photomask protective film
JPH0262542A (en) * 1988-08-29 1990-03-02 Shin Etsu Chem Co Ltd Pellicle for excimer laser lithography
JPH06100826B2 (en) * 1989-03-03 1994-12-12 信越化学工業株式会社 Pellicle for lithograph
US5935733A (en) * 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
US6171982B1 (en) * 1997-12-26 2001-01-09 Canon Kabushiki Kaisha Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same
JPH11231508A (en) * 1998-02-17 1999-08-27 Shin Etsu Chem Co Ltd Method for preparing reproduced reticle and reproduced reticle
JP2000292908A (en) * 1999-04-02 2000-10-20 Shin Etsu Chem Co Ltd Pellicle for lithography
DE10016008A1 (en) * 2000-03-31 2001-10-11 Zeiss Carl Village system and its manufacture
US6623893B1 (en) * 2001-01-26 2003-09-23 Advanced Micro Devices, Inc. Pellicle for use in EUV lithography and a method of making such a pellicle
JP2005529362A (en) * 2002-06-10 2005-09-29 トッパン、フォウタマスクス、インク Photomask and defect repair method
JP2005070120A (en) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd Pellicle for lithography
WO2005029181A2 (en) * 2003-09-23 2005-03-31 Koninklijke Philips Electronics N.V. Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination
JP2005215508A (en) * 2004-01-30 2005-08-11 Nikon Corp Substrate, exposure apparatus and exposure system
US7416820B2 (en) * 2007-01-31 2008-08-26 International Business Machines Corporation Pellicle film optimized for immersion lithography systems with NA>1

Also Published As

Publication number Publication date
TWI414883B (en) 2013-11-11
JP4861963B2 (en) 2012-01-25
JP2009116284A (en) 2009-05-28
CN101414118A (en) 2009-04-22
TW200919082A (en) 2009-05-01

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