DE602007009492D1 - Magnetoresistive sensorvorrichtung und verfahren zur herstellung einer solchen magnetoresistiven sensorvorrichtung - Google Patents
Magnetoresistive sensorvorrichtung und verfahren zur herstellung einer solchen magnetoresistiven sensorvorrichtungInfo
- Publication number
- DE602007009492D1 DE602007009492D1 DE602007009492T DE602007009492T DE602007009492D1 DE 602007009492 D1 DE602007009492 D1 DE 602007009492D1 DE 602007009492 T DE602007009492 T DE 602007009492T DE 602007009492 T DE602007009492 T DE 602007009492T DE 602007009492 D1 DE602007009492 D1 DE 602007009492D1
- Authority
- DE
- Germany
- Prior art keywords
- sensor device
- magnetoresistive sensor
- sensing element
- wafer
- esistive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/096—Magnetoresistive devices anisotropic magnetoresistance sensors
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Measuring Magnetic Variables (AREA)
- Hall/Mr Elements (AREA)
- Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06110312 | 2006-02-23 | ||
PCT/IB2007/050466 WO2007096806A2 (en) | 2006-02-23 | 2007-02-13 | Magnetoresistive sensor device and method of fabricating such magnetoresistive sensor device |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602007009492D1 true DE602007009492D1 (de) | 2010-11-11 |
Family
ID=38321998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602007009492T Active DE602007009492D1 (de) | 2006-02-23 | 2007-02-13 | Magnetoresistive sensorvorrichtung und verfahren zur herstellung einer solchen magnetoresistiven sensorvorrichtung |
Country Status (8)
Country | Link |
---|---|
US (1) | US9304175B2 (de) |
EP (1) | EP1989564B1 (de) |
JP (1) | JP2009527758A (de) |
KR (1) | KR20080098426A (de) |
CN (1) | CN101389972B (de) |
AT (1) | ATE483170T1 (de) |
DE (1) | DE602007009492D1 (de) |
WO (1) | WO2007096806A2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8080993B2 (en) * | 2008-03-27 | 2011-12-20 | Infineon Technologies Ag | Sensor module with mold encapsulation for applying a bias magnetic field |
US20090315551A1 (en) * | 2008-06-20 | 2009-12-24 | Jingshi Hu | Linear magnetoresistance sensor |
US8283921B2 (en) * | 2008-11-26 | 2012-10-09 | General Electric Company | Magnetoresistance sensors for position and orientation determination |
US8358128B2 (en) * | 2008-11-28 | 2013-01-22 | General Electric Company | Surgical navigation system with magnetoresistance sensors |
US8483800B2 (en) * | 2008-11-29 | 2013-07-09 | General Electric Company | Surgical navigation enabled imaging table environment |
KR101165237B1 (ko) * | 2009-11-09 | 2012-07-16 | 중앙대학교 산학협력단 | 누설자속 측정에 의한 비파괴 탐상장치 |
FR2955942B1 (fr) * | 2010-01-29 | 2013-01-04 | Centre Nat Rech Scient | Magnetometre integre et son procede de fabrication |
CN102298126B (zh) * | 2011-01-17 | 2013-03-13 | 江苏多维科技有限公司 | 独立封装的桥式磁场传感器 |
US9207292B2 (en) | 2011-02-02 | 2015-12-08 | Infineon Technologies Ag | Magnetoresistive device and method for manufacturing the same |
TW201327956A (zh) * | 2011-12-28 | 2013-07-01 | Ind Tech Res Inst | 磁感應器 |
CN102565727B (zh) | 2012-02-20 | 2016-01-20 | 江苏多维科技有限公司 | 用于测量磁场的磁电阻传感器 |
CN102590768B (zh) | 2012-03-14 | 2014-04-16 | 江苏多维科技有限公司 | 一种磁电阻磁场梯度传感器 |
CN104425708A (zh) * | 2013-09-06 | 2015-03-18 | 上海矽睿科技有限公司 | 两轴磁传感装置的制备工艺 |
KR101890561B1 (ko) | 2016-02-03 | 2018-08-22 | 고려대학교 세종산학협력단 | 스핀홀 현상을 이용한 자기장 측정 장치 및 방법 |
DE102022105706A1 (de) | 2022-03-10 | 2023-09-14 | Infineon Technologies Ag | Magnetfeldsensor mit mechanisch geschütztem Permanentmagneten |
DE102022208562A1 (de) | 2022-08-18 | 2024-02-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren zum herstellen eines magnetfeldsensorchips mit einem integrierten back-bias magneten |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3408573A (en) * | 1965-06-19 | 1968-10-29 | Philips Corp | Coil core manufactured from softmagnetic and permanent-magnetic materials |
DE3429708C1 (de) * | 1984-08-11 | 1986-01-02 | MTU Motoren- und Turbinen-Union München GmbH, 8000 München | Buerstendichtung |
JPH04152688A (ja) | 1990-10-17 | 1992-05-26 | Fujitsu Ltd | 磁気抵抗素子 |
JP3253556B2 (ja) | 1997-05-07 | 2002-02-04 | 株式会社東芝 | 磁気抵抗効果素子とそれを用いた磁気ヘッドおよび磁気記憶装置 |
GB9718915D0 (en) | 1997-09-05 | 1997-11-12 | Greenbrook Electrical Plc | Magneto-resistor |
EP0905523B1 (de) * | 1997-09-24 | 2004-11-10 | Infineon Technologies AG | Sensoreinrichtung zur Richtungserfassung eines äu eren Magnetfeldes mittels eines magnetoresistiven Sensorelementes |
JP3544141B2 (ja) | 1998-05-13 | 2004-07-21 | 三菱電機株式会社 | 磁気検出素子および磁気検出装置 |
JP2002151757A (ja) | 2000-11-09 | 2002-05-24 | Alps Electric Co Ltd | 薄膜磁気素子及びその製造方法 |
US6946834B2 (en) | 2001-06-01 | 2005-09-20 | Koninklijke Philips Electronics N.V. | Method of orienting an axis of magnetization of a first magnetic element with respect to a second magnetic element, semimanufacture for obtaining a sensor, sensor for measuring a magnetic field |
US6790378B2 (en) * | 2001-10-05 | 2004-09-14 | R. William Graham | Coating composition having magnetic properties |
JP3835447B2 (ja) | 2002-10-23 | 2006-10-18 | ヤマハ株式会社 | 磁気センサ、同磁気センサの製造方法及び同製造方法に適したマグネットアレイ |
US6872467B2 (en) * | 2002-11-12 | 2005-03-29 | Nve Corporation | Magnetic field sensor with augmented magnetoresistive sensing layer |
US7229746B2 (en) * | 2003-04-02 | 2007-06-12 | Delphi Technologies, Inc. | Printed high strength permanent magnet targets for magnetic sensors |
EP1498744B1 (de) | 2003-07-18 | 2011-08-10 | Yamaha Corporation | Magnetfeldsensor und dessen Herstellungsverfahren |
-
2007
- 2007-02-13 KR KR1020087023037A patent/KR20080098426A/ko not_active Application Discontinuation
- 2007-02-13 WO PCT/IB2007/050466 patent/WO2007096806A2/en active Application Filing
- 2007-02-13 JP JP2008555914A patent/JP2009527758A/ja not_active Withdrawn
- 2007-02-13 EP EP07705864A patent/EP1989564B1/de active Active
- 2007-02-13 CN CN2007800062646A patent/CN101389972B/zh active Active
- 2007-02-13 DE DE602007009492T patent/DE602007009492D1/de active Active
- 2007-02-13 US US12/278,981 patent/US9304175B2/en active Active
- 2007-02-13 AT AT07705864T patent/ATE483170T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2009527758A (ja) | 2009-07-30 |
EP1989564B1 (de) | 2010-09-29 |
CN101389972A (zh) | 2009-03-18 |
KR20080098426A (ko) | 2008-11-07 |
EP1989564A2 (de) | 2008-11-12 |
US9304175B2 (en) | 2016-04-05 |
WO2007096806A3 (en) | 2007-11-01 |
WO2007096806A2 (en) | 2007-08-30 |
US20090058413A1 (en) | 2009-03-05 |
ATE483170T1 (de) | 2010-10-15 |
CN101389972B (zh) | 2012-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602007009492D1 (de) | Magnetoresistive sensorvorrichtung und verfahren zur herstellung einer solchen magnetoresistiven sensorvorrichtung | |
EP2194391B8 (de) | Magnetischer Sensor mit grossem Messbereich und Herstellungsprozess für den Sensor | |
WO2007087121A3 (en) | Arrangements for an integrated sensor | |
ATE352517T1 (de) | Verfahren zur herstellung einer elektronischen vorrichtung und elektronische vorrichtung | |
DE102006001792B8 (de) | Halbleitermodul mit Halbleiterchipstapel und Verfahren zur Herstellung desselben | |
WO2007120697A3 (en) | Methods and apparatus for integrated circuit having multiple dies with at least one on chip capacitor | |
DK1994202T3 (da) | Beskyttelsescoating til sølv | |
WO2007142167A8 (en) | Semiconductor device including an oxide semiconductor thin film layer of zinc oxide and manufacturing method thereof | |
ATE526685T1 (de) | Mehrschichtiges halbleitersubstrat und darauf gebildeter bildsensor zur verbesserten infrarotempfindlichkeit | |
WO2006001978A3 (en) | Integrated three-dimensional magnetic sensing device and fabrication method | |
EP1732064A3 (de) | Magnetische Aufzeichnungsköpfe mit Auflageflächenschutz und Herstellungsverfahren dafür | |
GB0623486D0 (en) | Organic thin film transistor and method for manufacturing the same | |
EP1870945A4 (de) | Verfahren zur herstellung eines ingaaln-films und lichtemittierendes bauelement auf einem siliziumsubstrat | |
TW200736819A (en) | Four-gradation photomask manufacturing method and photomask blank for use therein | |
WO2007078686A3 (en) | Method of polishing a semiconductor-on-insulator structure | |
WO2007124209A3 (en) | Stressor integration and method thereof | |
GB2439599B (en) | Thin film transistor array substrate and method fabricating the same | |
FR2902566B1 (fr) | Dispositif d'affichage et son procede de fabrication. | |
TWI318458B (en) | Thin film transistor substrate and manufacturing method thereof | |
WO2008123141A1 (ja) | 化合物半導体積層体及びその製造方法並びに半導体デバイス | |
ATE541325T1 (de) | Anordnung mit magnetoresistivem effekt sowie verwendungen davon | |
WO2007125036A3 (de) | Organo-magnetoresistiver sensor und verwendungen dazu | |
TWI348221B (en) | Thin film transistor array substrate structures and fabrication method thereof | |
EP1850373A3 (de) | Verfahren zur Bildung eines stark orientierten Siliziumfilms, Verfahren zur Herstellung eines dreidimensionalen Halbleiterbauelements und dreidimensionales Halbleiterbauelement | |
DE60322479D1 (de) | Halbleiter-Beschleunigungsaufnehmer mit dotierten Halbleiterschichten zur Verdrahtung |