DE602006017832D1 - Verfahren zur schaffung eines artikels mit einer nadel eines mikroarrayspotters - Google Patents
Verfahren zur schaffung eines artikels mit einer nadel eines mikroarrayspottersInfo
- Publication number
- DE602006017832D1 DE602006017832D1 DE602006017832T DE602006017832T DE602006017832D1 DE 602006017832 D1 DE602006017832 D1 DE 602006017832D1 DE 602006017832 T DE602006017832 T DE 602006017832T DE 602006017832 T DE602006017832 T DE 602006017832T DE 602006017832 D1 DE602006017832 D1 DE 602006017832D1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- sub
- article
- needle
- creating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000002493 microarray Methods 0.000 title 1
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2049—Exposure; Apparatus therefor using a cantilever
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Laminated Bodies (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
- Supply And Installment Of Electrical Components (AREA)
- Infusion, Injection, And Reservoir Apparatuses (AREA)
- Printing Methods (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0509213.5A GB0509213D0 (en) | 2005-05-04 | 2005-05-04 | A method for creating a chemically patterned surface |
| PCT/GB2006/001570 WO2006117527A2 (en) | 2005-05-04 | 2006-04-28 | An article, and a method for creating the article, with a chemically patterned surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602006017832D1 true DE602006017832D1 (de) | 2010-12-09 |
Family
ID=34685149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602006017832T Active DE602006017832D1 (de) | 2005-05-04 | 2006-04-28 | Verfahren zur schaffung eines artikels mit einer nadel eines mikroarrayspotters |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20100055413A1 (de) |
| EP (1) | EP1888455B1 (de) |
| AT (1) | ATE486042T1 (de) |
| DE (1) | DE602006017832D1 (de) |
| DK (1) | DK1888455T3 (de) |
| ES (1) | ES2353246T3 (de) |
| GB (2) | GB0509213D0 (de) |
| PL (1) | PL1888455T3 (de) |
| PT (1) | PT1888455E (de) |
| WO (1) | WO2006117527A2 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005059040A2 (en) * | 2003-12-16 | 2005-06-30 | Sun Chemical Corporation | Method of forming a radiation curable coating and coated article |
| EP2389613A1 (de) * | 2009-01-26 | 2011-11-30 | Nanoink, Inc. | Herstellung einer homogenen grossflächigen anordnung mit aufdampfung mit gesteuerter spitzenbeladung |
| GB2535988A (en) * | 2015-02-26 | 2016-09-07 | Surface Innovations Ltd | Patterned functional surface |
| CN207396531U (zh) * | 2017-01-31 | 2018-05-22 | 杭州探真纳米科技有限公司 | 一种悬臂末端纳米探针 |
| CN109776842B (zh) * | 2019-01-11 | 2020-06-09 | 西南交通大学 | 区域选择性可控化固定双分子薄膜及其制备方法 |
| US11705535B2 (en) * | 2019-08-05 | 2023-07-18 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Nano-indent process for creating single photon emitters in a two-dimensional materials platform |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4252848A (en) * | 1977-04-11 | 1981-02-24 | Rca Corporation | Perfluorinated polymer thin films |
| JPS5916779A (ja) * | 1982-07-20 | 1984-01-27 | Jeol Ltd | カラ−印字又は印刷方式及び装置 |
| US5002794A (en) * | 1989-08-31 | 1991-03-26 | The Board Of Regents Of The University Of Washington | Method of controlling the chemical structure of polymeric films by plasma |
| EP0814116A1 (de) * | 1996-06-19 | 1997-12-29 | Hüls Aktiengesellschaft | Hydrophile Beschichtung von Oberflächen polymerer Substrate |
| JP4208305B2 (ja) * | 1998-09-17 | 2009-01-14 | 株式会社東芝 | マスクパターンの形成方法 |
| US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| US6489102B2 (en) * | 1999-08-05 | 2002-12-03 | Wisconsin Alumni Research Foundation | Biomolecule and/or cellular arrays on metal surfaces and product produced thereby |
| US6696008B2 (en) * | 2000-05-25 | 2004-02-24 | Westar Photonics Inc. | Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation |
| US6841663B2 (en) * | 2001-10-18 | 2005-01-11 | Agilent Technologies, Inc. | Chemical arrays |
| US6984485B2 (en) * | 2002-04-23 | 2006-01-10 | Beckman Coulter, Inc. | Polymer-coated substrates for immobilization of biomolecules and cells |
| AU2002952384A0 (en) * | 2002-10-31 | 2002-11-14 | Swinburne University Of Technology | Structures |
| US20050008851A1 (en) * | 2003-02-18 | 2005-01-13 | Fuji Photo Film Co., Ltd. | Biosensor |
-
2005
- 2005-05-04 GB GBGB0509213.5A patent/GB0509213D0/en not_active Ceased
-
2006
- 2006-04-28 WO PCT/GB2006/001570 patent/WO2006117527A2/en active Application Filing
- 2006-04-28 DE DE602006017832T patent/DE602006017832D1/de active Active
- 2006-04-28 DK DK06726950.6T patent/DK1888455T3/da active
- 2006-04-28 GB GB0716244A patent/GB2437688A/en not_active Withdrawn
- 2006-04-28 US US11/919,185 patent/US20100055413A1/en not_active Abandoned
- 2006-04-28 PL PL06726950T patent/PL1888455T3/pl unknown
- 2006-04-28 AT AT06726950T patent/ATE486042T1/de active
- 2006-04-28 PT PT06726950T patent/PT1888455E/pt unknown
- 2006-04-28 EP EP06726950A patent/EP1888455B1/de not_active Not-in-force
- 2006-04-28 ES ES06726950T patent/ES2353246T3/es active Active
Also Published As
| Publication number | Publication date |
|---|---|
| ATE486042T1 (de) | 2010-11-15 |
| DK1888455T3 (da) | 2011-01-10 |
| ES2353246T3 (es) | 2011-02-28 |
| GB0509213D0 (en) | 2005-06-15 |
| WO2006117527A2 (en) | 2006-11-09 |
| GB2437688A (en) | 2007-10-31 |
| GB0716244D0 (en) | 2007-09-26 |
| PT1888455E (pt) | 2010-12-21 |
| PL1888455T3 (pl) | 2011-04-29 |
| EP1888455B1 (de) | 2010-10-27 |
| WO2006117527A3 (en) | 2007-04-05 |
| EP1888455A2 (de) | 2008-02-20 |
| US20100055413A1 (en) | 2010-03-04 |
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