DE602006015583D1 - Strahlenhärtende Zusammensetzung für optische Lichtleiter, optische Lichtleiter und deren Herstellungsmethode - Google Patents

Strahlenhärtende Zusammensetzung für optische Lichtleiter, optische Lichtleiter und deren Herstellungsmethode

Info

Publication number
DE602006015583D1
DE602006015583D1 DE602006015583T DE602006015583T DE602006015583D1 DE 602006015583 D1 DE602006015583 D1 DE 602006015583D1 DE 602006015583 T DE602006015583 T DE 602006015583T DE 602006015583 T DE602006015583 T DE 602006015583T DE 602006015583 D1 DE602006015583 D1 DE 602006015583D1
Authority
DE
Germany
Prior art keywords
light guides
optical light
radiation
production method
curing composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006015583T
Other languages
English (en)
Inventor
Yukio Maeda
Yuuichi Eriyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE602006015583D1 publication Critical patent/DE602006015583D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G02B1/046—Light guides characterised by the core material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G02B1/048—Light guides characterised by the cladding material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE602006015583T 2005-09-29 2006-09-28 Strahlenhärtende Zusammensetzung für optische Lichtleiter, optische Lichtleiter und deren Herstellungsmethode Active DE602006015583D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005285699 2005-09-29

Publications (1)

Publication Number Publication Date
DE602006015583D1 true DE602006015583D1 (de) 2010-09-02

Family

ID=37633196

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006015583T Active DE602006015583D1 (de) 2005-09-29 2006-09-28 Strahlenhärtende Zusammensetzung für optische Lichtleiter, optische Lichtleiter und deren Herstellungsmethode

Country Status (6)

Country Link
US (1) US20070081782A1 (de)
EP (1) EP1772754B1 (de)
KR (1) KR20070036708A (de)
CN (1) CN1940725A (de)
DE (1) DE602006015583D1 (de)
TW (1) TW200728330A (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4554665B2 (ja) * 2006-12-25 2010-09-29 富士フイルム株式会社 パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液
US8637229B2 (en) * 2006-12-25 2014-01-28 Fujifilm Corporation Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
US8530148B2 (en) * 2006-12-25 2013-09-10 Fujifilm Corporation Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
US8603733B2 (en) 2007-04-13 2013-12-10 Fujifilm Corporation Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
US8034547B2 (en) * 2007-04-13 2011-10-11 Fujifilm Corporation Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
JP4562784B2 (ja) 2007-04-13 2010-10-13 富士フイルム株式会社 パターン形成方法、該パターン形成方法に用いられるレジスト組成物、現像液及びリンス液
US8476001B2 (en) 2007-05-15 2013-07-02 Fujifilm Corporation Pattern forming method
WO2008140119A1 (ja) 2007-05-15 2008-11-20 Fujifilm Corporation パターン形成方法
WO2008153110A1 (ja) 2007-06-12 2008-12-18 Fujifilm Corporation ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法
US8632942B2 (en) 2007-06-12 2014-01-21 Fujifilm Corporation Method of forming patterns
JP4590431B2 (ja) 2007-06-12 2010-12-01 富士フイルム株式会社 パターン形成方法
US8617794B2 (en) 2007-06-12 2013-12-31 Fujifilm Corporation Method of forming patterns
JP4617337B2 (ja) 2007-06-12 2011-01-26 富士フイルム株式会社 パターン形成方法
WO2009004929A1 (ja) * 2007-07-03 2009-01-08 Konica Minolta Opto, Inc. 撮像装置の製造方法、撮像装置及び光学素子
KR100924009B1 (ko) * 2007-12-28 2009-10-28 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
TWI441865B (zh) * 2008-01-24 2014-06-21 Hitachi Chemical Co Ltd 包覆層形成用樹脂組成物、使用該組成物的包覆層形成用樹脂膜以及使用該樹脂膜的光波導與光模組
CN102027400B (zh) * 2008-05-13 2016-03-30 日立化成工业株式会社 光波导的制造方法及光波导
US9605143B2 (en) * 2010-08-24 2017-03-28 Hitachi Chemicals Company, Ltd. Resin composition for formation of optical waveguide, resin film for formation of optical waveguide which comprises the resin composition, and optical waveguide produced using the resin composition or the resin film
WO2016149397A1 (en) * 2015-03-16 2016-09-22 Pacific Biosciences Of California, Inc. Integrated devices and systems for free-space optical coupling
CA2989344C (en) 2015-06-12 2023-09-26 Pacific Biosciences Of California, Inc. Integrated target waveguide devices and systems for optical coupling
RU192307U1 (ru) * 2019-06-24 2019-09-12 Российская Федерация, от лица которой выступает Министерство Промышленности и торговли Российской Федерации Оптический бортовой радиационно стойкий кабель

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0206086B1 (de) * 1985-06-10 1992-09-09 Canon Kabushiki Kaisha Strahlenhärtbare Harzzusammensetzung
DE3620254C2 (de) * 1985-06-18 1994-05-05 Canon Kk Durch Strahlen mit wirksamer Energie härtbare Harzmischung
DE3688956T2 (de) * 1985-06-26 1994-02-17 Canon Kk Strahlenhärtbare Zusammensetzung.
US5578417A (en) * 1989-01-10 1996-11-26 Canon Kabushiki Kaisha Liquid jet recording head and recording apparatus having same
JP3599363B2 (ja) * 1993-09-07 2004-12-08 三菱レイヨン株式会社 大口径プラスチック光ファイバ
DE69631703T2 (de) * 1995-07-29 2005-01-13 Sanyo Chemical Industries, Ltd. UV-härtbare Harzmasse für Fresnel-Linse, Fresnel-Linse und Retroprojektionswand
JP4196562B2 (ja) * 2001-12-26 2008-12-17 Ｊｓｒ株式会社 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
US20090065140A1 (en) * 2005-04-28 2009-03-12 Toagosei Co., Ltd. Active energy beam-curable adhesive composition

Also Published As

Publication number Publication date
US20070081782A1 (en) 2007-04-12
CN1940725A (zh) 2007-04-04
KR20070036708A (ko) 2007-04-03
TW200728330A (en) 2007-08-01
EP1772754A1 (de) 2007-04-11
EP1772754B1 (de) 2010-07-21

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