DE602006002564D1 - Ultraschallreinigungsvorrichtung zur Reinigung des Randbereiches eines Werkstückes - Google Patents

Ultraschallreinigungsvorrichtung zur Reinigung des Randbereiches eines Werkstückes

Info

Publication number
DE602006002564D1
DE602006002564D1 DE602006002564T DE602006002564T DE602006002564D1 DE 602006002564 D1 DE602006002564 D1 DE 602006002564D1 DE 602006002564 T DE602006002564 T DE 602006002564T DE 602006002564 T DE602006002564 T DE 602006002564T DE 602006002564 D1 DE602006002564 D1 DE 602006002564D1
Authority
DE
Germany
Prior art keywords
workpiece
edge region
cleaning
cleaning device
ultrasonic cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006002564T
Other languages
English (en)
Inventor
Yosuke Honda
Yuichi Asayama
Yuichi Maita
Tomomi Hikita
Yoshikazu Muramatsu
Ryoji Kondo
Haruo Yamamori
Naoyuki Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Electronics Co Ltd
Original Assignee
Honda Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005204863A external-priority patent/JP4691638B2/ja
Priority claimed from JP2005347109A external-priority patent/JP4848556B2/ja
Application filed by Honda Electronics Co Ltd filed Critical Honda Electronics Co Ltd
Publication of DE602006002564D1 publication Critical patent/DE602006002564D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE602006002564T 2005-07-13 2006-07-11 Ultraschallreinigungsvorrichtung zur Reinigung des Randbereiches eines Werkstückes Active DE602006002564D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005204863A JP4691638B2 (ja) 2005-07-13 2005-07-13 超音波洗浄装置
JP2005347109A JP4848556B2 (ja) 2005-11-30 2005-11-30 洗浄用超音波振動子

Publications (1)

Publication Number Publication Date
DE602006002564D1 true DE602006002564D1 (de) 2008-10-16

Family

ID=37401517

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006002564T Active DE602006002564D1 (de) 2005-07-13 2006-07-11 Ultraschallreinigungsvorrichtung zur Reinigung des Randbereiches eines Werkstückes

Country Status (4)

Country Link
US (1) US7942158B2 (de)
EP (1) EP1743715B1 (de)
KR (1) KR101052399B1 (de)
DE (1) DE602006002564D1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150107619A1 (en) * 2013-10-22 2015-04-23 Taiwan Semiconductor Manufacturing Company Limited Wafer particle removal
US20170260441A1 (en) * 2016-03-11 2017-09-14 Conocophillips Company Preflush chemicals for scale inhibitor squeeze

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4834124A (en) * 1987-01-09 1989-05-30 Honda Electronics Co., Ltd. Ultrasonic cleaning device
KR0175278B1 (ko) * 1996-02-13 1999-04-01 김광호 웨이퍼 세정장치
JPH11257851A (ja) * 1998-03-10 1999-09-24 Tokyo Electron Ltd 乾燥装置及び乾燥方法
US6202658B1 (en) * 1998-11-11 2001-03-20 Applied Materials, Inc. Method and apparatus for cleaning the edge of a thin disc
US6523553B1 (en) * 1999-03-30 2003-02-25 Applied Materials, Inc. Wafer edge cleaning method and apparatus
JP3978296B2 (ja) * 1999-08-05 2007-09-19 株式会社カイジョー 基板端面用超音波励振装置及びこれを備えた基板端面用超音波洗浄装置
JP2001079013A (ja) * 1999-09-13 2001-03-27 Olympus Optical Co Ltd 超音波処置装置
US6679272B2 (en) * 2001-08-03 2004-01-20 Verteq, Inc. Megasonic probe energy attenuator
KR100445259B1 (ko) * 2001-11-27 2004-08-21 삼성전자주식회사 세정방법 및 이를 수행하기 위한 세정 장치
KR100526192B1 (ko) * 2003-05-28 2005-11-03 삼성전자주식회사 웨이퍼 세정장치 및 세정방법
JP3981064B2 (ja) * 2003-10-22 2007-09-26 株式会社カイジョー 両面式超音波シャワー洗浄装置
JP4522329B2 (ja) * 2005-06-24 2010-08-11 株式会社Ｓｏｋｕｄｏ 基板処理装置

Also Published As

Publication number Publication date
KR20070008441A (ko) 2007-01-17
US20070012343A1 (en) 2007-01-18
US7942158B2 (en) 2011-05-17
EP1743715B1 (de) 2008-09-03
KR101052399B1 (ko) 2011-07-28
EP1743715A1 (de) 2007-01-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition