DE602005026248D1 - Nahtlose Belichtung von Druckformen in Mehrstrahlbelichtungsverfahren - Google Patents

Nahtlose Belichtung von Druckformen in Mehrstrahlbelichtungsverfahren

Info

Publication number
DE602005026248D1
DE602005026248D1 DE602005026248T DE602005026248T DE602005026248D1 DE 602005026248 D1 DE602005026248 D1 DE 602005026248D1 DE 602005026248 T DE602005026248 T DE 602005026248T DE 602005026248 T DE602005026248 T DE 602005026248T DE 602005026248 D1 DE602005026248 D1 DE 602005026248D1
Authority
DE
Germany
Prior art keywords
sets
tracks
exposing
scan direction
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005026248T
Other languages
English (en)
Inventor
Thomas Klein
Wolfgang Sievers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Esko Graphics Imaging GmbH
Original Assignee
Esko Graphics Imaging GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Esko Graphics Imaging GmbH filed Critical Esko Graphics Imaging GmbH
Publication of DE602005026248D1 publication Critical patent/DE602005026248D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/24Curved surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/04Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05Heat-generating engraving heads, e.g. laser beam, electron beam
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K2215/00Arrangements for producing a permanent visual presentation of the output data
    • G06K2215/111Arrangements for producing a permanent visual presentation of the output data with overlapping swaths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Facsimile Scanning Arrangements (AREA)
DE602005026248T 2004-12-13 2005-12-13 Nahtlose Belichtung von Druckformen in Mehrstrahlbelichtungsverfahren Active DE602005026248D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63580904P 2004-12-13 2004-12-13
US11/022,576 US7193641B2 (en) 2004-12-13 2004-12-22 Stitching prevention in multibeam imaging for exposing printing plates

Publications (1)

Publication Number Publication Date
DE602005026248D1 true DE602005026248D1 (de) 2011-03-24

Family

ID=36282950

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005026248T Active DE602005026248D1 (de) 2004-12-13 2005-12-13 Nahtlose Belichtung von Druckformen in Mehrstrahlbelichtungsverfahren

Country Status (4)

Country Link
US (1) US7193641B2 (de)
EP (1) EP1674930B1 (de)
AT (1) ATE498150T1 (de)
DE (1) DE602005026248D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5078163B2 (ja) * 2008-12-05 2012-11-21 富士フイルム株式会社 マルチビーム露光走査方法及び装置並びに印刷版の製造方法
JP5213272B2 (ja) * 2010-03-31 2013-06-19 富士フイルム株式会社 マルチビーム露光走査方法及び装置並びに印刷版の製造方法
US8772740B2 (en) * 2011-04-08 2014-07-08 Esko-Graphics Imaging Gmbh UV curing creating flattop and roundtop structures on a single printing plate
NL2019051B1 (en) 2017-06-12 2018-12-19 Xeikon Prepress Nv Method and apparatus for writing imageable material using multiple beams
CN114280895B (zh) * 2021-12-24 2024-01-05 深圳市先地图像科技有限公司 一种激光成像过程中像素行分配方法、系统及相关设备
NL2031541B1 (en) * 2022-04-08 2023-11-03 Xsys Prepress N V Method for imaging a mask layer and associated imaging system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5278578A (en) * 1989-12-18 1994-01-11 Eastman Kodak Company Thermal printer capable of using dummy lines to prevent banding
US5818498A (en) * 1995-10-16 1998-10-06 Creo Products Inc. Method of multi-channel thermal recording
DE69733133T2 (de) * 1997-07-29 2006-02-02 Esko-Graphics A/S Auflösungsverbesserung bei einem Bildsetzer
US6985261B2 (en) * 2000-03-08 2006-01-10 Esko-Graphics A/S Method and apparatus for seamless imaging of sleeves as used in flexography
US6597388B2 (en) * 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking

Also Published As

Publication number Publication date
EP1674930A2 (de) 2006-06-28
US7193641B2 (en) 2007-03-20
US20060125912A1 (en) 2006-06-15
EP1674930B1 (de) 2011-02-09
ATE498150T1 (de) 2011-02-15
EP1674930A3 (de) 2009-08-05

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