DE602005021751D1 - Direkt photodefinierbare polymerzusammensetzungen und verfahren - Google Patents

Direkt photodefinierbare polymerzusammensetzungen und verfahren

Info

Publication number
DE602005021751D1
DE602005021751D1 DE602005021751T DE602005021751T DE602005021751D1 DE 602005021751 D1 DE602005021751 D1 DE 602005021751D1 DE 602005021751 T DE602005021751 T DE 602005021751T DE 602005021751 T DE602005021751 T DE 602005021751T DE 602005021751 D1 DE602005021751 D1 DE 602005021751D1
Authority
DE
Germany
Prior art keywords
direct
polymeric compositions
photodefinable
photodefinable polymeric
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005021751T
Other languages
English (en)
Inventor
Edmund Elce
Larry F Rhodes
Robert Shick
Saikumar Jayaraman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Promerus LLC
Original Assignee
Promerus LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Promerus LLC filed Critical Promerus LLC
Publication of DE602005021751D1 publication Critical patent/DE602005021751D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/40—Esters of unsaturated alcohols, e.g. allyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE602005021751T 2004-01-30 2005-01-28 Direkt photodefinierbare polymerzusammensetzungen und verfahren Active DE602005021751D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US54061904P 2004-01-30 2004-01-30
US11/044,484 US7378456B2 (en) 2004-01-30 2005-01-27 Directly photodefinable polymer compositions and methods thereof
PCT/US2005/003460 WO2005076076A2 (en) 2004-01-30 2005-01-28 Directly photodefinable polymer compositions and methods thereof

Publications (1)

Publication Number Publication Date
DE602005021751D1 true DE602005021751D1 (de) 2010-07-22

Family

ID=34840517

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005021751T Active DE602005021751D1 (de) 2004-01-30 2005-01-28 Direkt photodefinierbare polymerzusammensetzungen und verfahren

Country Status (5)

Country Link
US (1) US7378456B2 (de)
EP (1) EP1711542B1 (de)
DE (1) DE602005021751D1 (de)
TW (1) TWI361197B (de)
WO (1) WO2005076076A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100663624B1 (ko) * 2004-04-29 2007-01-02 엘지.필립스 엘시디 주식회사 액정표시장치 제조방법
KR100873779B1 (ko) 2006-06-26 2008-12-15 주식회사 엘지화학 노보넨 단량체 조성물의 제조 방법, 이로부터 제조되는노보넨 중합체, 상기 노보넨 중합체를 포함하는 광학 필름,및 상기 노보넨 중합체의 제조 방법
JP2008078557A (ja) * 2006-09-25 2008-04-03 Fujifilm Corp 組成物、膜、およびその製造方法
US8263709B2 (en) * 2009-11-16 2012-09-11 University Of Massachusetts Crystal nucleating agents, crystalline polymer composition, methods of manufacture thereof, and articles thereof
CN103097420B (zh) * 2010-09-02 2016-06-22 默克专利股份有限公司 用于电子器件的夹层
CN105038069B (zh) * 2010-09-02 2017-10-17 默克专利股份有限公司 用于电子器件的栅绝缘层
CN104221176B (zh) * 2012-01-16 2017-03-01 住友电木株式会社 用于微电子和光电子器件及其组件的热氧化稳定的、侧链聚醚官能化的聚降冰片烯
WO2014044359A1 (en) 2012-09-21 2014-03-27 Merck Patent Gmbh Organic semiconductor formulations
US10623846B2 (en) * 2016-12-06 2020-04-14 Bose Corporation Earpieces employing viscoelastic materials

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5912313A (en) * 1995-11-22 1999-06-15 The B. F. Goodrich Company Addition polymers of polycycloolefins containing silyl functional groups
AU5196998A (en) * 1996-11-04 1998-05-29 B.F. Goodrich Company, The Photodefinable dielectric compositions
US5953627A (en) * 1997-11-06 1999-09-14 International Business Machines Corporation Process for manufacture of integrated circuit device
AU6291999A (en) 1998-10-05 2000-04-26 B.F. Goodrich Company, The Catalyst and methods for polymerizing cycloolefins
US6911518B2 (en) * 1999-12-23 2005-06-28 Hybrid Plastics, Llc Polyhedral oligomeric -silsesquioxanes, -silicates and -siloxanes bearing ring-strained olefinic functionalities
AU2001279056A1 (en) 2000-07-28 2002-02-13 Goodrich Corporation Optical waveguides and methods for making the same
US7011932B2 (en) 2001-05-01 2006-03-14 E. I. Du Pont De Nemours And Company Polymer waveguide fabrication process

Also Published As

Publication number Publication date
US7378456B2 (en) 2008-05-27
WO2005076076A2 (en) 2005-08-18
US20050186502A1 (en) 2005-08-25
WO2005076076A3 (en) 2005-12-29
EP1711542B1 (de) 2010-06-09
TWI361197B (en) 2012-04-01
EP1711542A2 (de) 2006-10-18
TW200538474A (en) 2005-12-01

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