DE602004015806D1 - Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens - Google Patents

Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens

Info

Publication number
DE602004015806D1
DE602004015806D1 DE602004015806T DE602004015806T DE602004015806D1 DE 602004015806 D1 DE602004015806 D1 DE 602004015806D1 DE 602004015806 T DE602004015806 T DE 602004015806T DE 602004015806 T DE602004015806 T DE 602004015806T DE 602004015806 D1 DE602004015806 D1 DE 602004015806D1
Authority
DE
Germany
Prior art keywords
producing
scale
resist layer
carrying
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004015806T
Other languages
English (en)
Inventor
De Rijdt Johannes H Van
Roger Timmermans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE602004015806D1 publication Critical patent/DE602004015806D1/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
    • G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/326—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by application of light, e.g. using a LED array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G2215/00—Apparatus for electrophotographic processes
    • G03G2215/04—Arrangements for exposing and producing an image
    • G03G2215/0402—Exposure devices
    • G03G2215/0407—Light-emitting array or panel
    • G03G2215/0414—Liquid-crystal display elements, i.e. LCD-shutter array

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Holo Graphy (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602004015806T 2003-08-27 2004-08-10 Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens Expired - Fee Related DE602004015806D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03103225 2003-08-27
PCT/IB2004/051434 WO2005022265A2 (en) 2003-08-27 2004-08-10 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method

Publications (1)

Publication Number Publication Date
DE602004015806D1 true DE602004015806D1 (de) 2008-09-25

Family

ID=34259212

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004015806T Expired - Fee Related DE602004015806D1 (de) 2003-08-27 2004-08-10 Verfahren zur erzeugung optischer bilder, vorrichtung zum ausführen des verfahrens und prozess zur herstellung eines bauelements unter verwendung des verfahrens

Country Status (9)

Country Link
US (1) US7405807B2 (de)
EP (1) EP1660944B1 (de)
JP (1) JP2007503613A (de)
KR (1) KR20060120608A (de)
CN (1) CN1842747A (de)
AT (1) ATE404907T1 (de)
DE (1) DE602004015806D1 (de)
TW (1) TW200528939A (de)
WO (1) WO2005022265A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1842748A (zh) * 2003-08-27 2006-10-04 皇家飞利浦电子股份有限公司 使用光阀阵列和光会聚阵列形成光学图像
JP5801558B2 (ja) * 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
US9507271B1 (en) * 2008-12-17 2016-11-29 Applied Materials, Inc. System and method for manufacturing multiple light emitting diodes in parallel
JP2011203678A (ja) * 2010-03-26 2011-10-13 Fuji Xerox Co Ltd 露光装置、露光装置の信号伝達機構、及び画像形成装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001500628A (ja) * 1996-02-28 2001-01-16 ケニス シー ジョンソン マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡
JPH11320968A (ja) 1998-05-13 1999-11-24 Ricoh Microelectronics Co Ltd 光像形成方法及びその装置、画像形成装置並びにリソグラフィ用露光装置
US6424404B1 (en) * 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
US6537738B1 (en) * 2000-08-08 2003-03-25 Ball Semiconductor, Inc. System and method for making smooth diagonal components with a digital photolithography system
US6897941B2 (en) * 2001-11-07 2005-05-24 Applied Materials, Inc. Optical spot grid array printer
EP1459133A1 (de) * 2001-12-17 2004-09-22 Koninklijke Philips Electronics N.V. Verfahren zur erzeugung optischer bilder, diffraktionselement zur verwendung mit diesem verfahren, vorrichtung zur ausführung dieses verfahrens
KR20040102089A (ko) * 2002-04-15 2004-12-03 코닌클리케 필립스 일렉트로닉스 엔.브이. 이미징 방법

Also Published As

Publication number Publication date
EP1660944B1 (de) 2008-08-13
US7405807B2 (en) 2008-07-29
KR20060120608A (ko) 2006-11-27
WO2005022265A2 (en) 2005-03-10
ATE404907T1 (de) 2008-08-15
EP1660944A2 (de) 2006-05-31
US20060256310A1 (en) 2006-11-16
WO2005022265A3 (en) 2006-02-23
TW200528939A (en) 2005-09-01
CN1842747A (zh) 2006-10-04
JP2007503613A (ja) 2007-02-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee