DE60142126D1 - Verfahren und vorrichtung zur ionenstrahl-sputterbeschichtung - Google Patents

Verfahren und vorrichtung zur ionenstrahl-sputterbeschichtung

Info

Publication number
DE60142126D1
DE60142126D1 DE60142126T DE60142126T DE60142126D1 DE 60142126 D1 DE60142126 D1 DE 60142126D1 DE 60142126 T DE60142126 T DE 60142126T DE 60142126 T DE60142126 T DE 60142126T DE 60142126 D1 DE60142126 D1 DE 60142126D1
Authority
DE
Germany
Prior art keywords
vox
ion beam
beam sputter
controlled
environment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142126T
Other languages
English (en)
Inventor
Barrett E Cole
Christopher J Zins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Application granted granted Critical
Publication of DE60142126D1 publication Critical patent/DE60142126D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K17/00—Measuring quantity of heat
    • G01K17/003—Measuring quantity of heat for measuring the power of light beams, e.g. laser beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/20—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Fluid Mechanics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Radiation Pyrometers (AREA)
DE60142126T 2001-06-01 2001-06-01 Verfahren und vorrichtung zur ionenstrahl-sputterbeschichtung Expired - Lifetime DE60142126D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2001/017755 WO2002099155A1 (en) 2001-06-01 2001-06-01 Ion beam sputter deposition process

Publications (1)

Publication Number Publication Date
DE60142126D1 true DE60142126D1 (de) 2010-06-24

Family

ID=21742617

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60142126T Expired - Lifetime DE60142126D1 (de) 2001-06-01 2001-06-01 Verfahren und vorrichtung zur ionenstrahl-sputterbeschichtung

Country Status (5)

Country Link
EP (1) EP1395688B1 (de)
JP (1) JP4911875B2 (de)
AT (1) ATE467695T1 (de)
DE (1) DE60142126D1 (de)
WO (1) WO2002099155A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060030543A (ko) * 2004-10-06 2006-04-11 주식회사 케이씨텍 중성화 빔을 이용한 ｏｌｅｄ 및 그 제조 방법
JP4962837B2 (ja) * 2006-02-27 2012-06-27 独立行政法人産業技術総合研究所 赤外線センサの製造方法
GB0805328D0 (en) * 2008-03-25 2008-04-30 Aviza Technologies Ltd Deposition of an amorphous layer
JP4941412B2 (ja) * 2008-06-19 2012-05-30 住友金属鉱山株式会社 耐熱遮光フィルムの製造方法
JP6216222B2 (ja) * 2013-11-11 2017-10-18 株式会社アルバック 酸化膜形成方法、ボロメータ素子製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166784A (en) * 1978-04-28 1979-09-04 Applied Films Lab, Inc. Feedback control for vacuum deposition apparatus
US5286976A (en) * 1988-11-07 1994-02-15 Honeywell Inc. Microstructure design for high IR sensitivity
JPH04136165A (ja) * 1990-09-26 1992-05-11 Shimadzu Corp 反応性ガス導入型成膜装置
US5801383A (en) * 1995-11-22 1998-09-01 Masahiro Ota, Director General, Technical Research And Development Institute, Japan Defense Agency VOX film, wherein X is greater than 1.875 and less than 2.0, and a bolometer-type infrared sensor comprising the VOX film
US6322670B2 (en) * 1996-12-31 2001-11-27 Honeywell International Inc. Flexible high performance microbolometer detector material fabricated via controlled ion beam sputter deposition process
US5900799A (en) * 1997-10-03 1999-05-04 Mcdonnell Douglas Corporation High responsivity thermochromic infrared detector
JP3727208B2 (ja) * 1999-11-15 2005-12-14 シャープ株式会社 感温抵抗変化膜およびその製造方法、並びにそれを用いた遠赤外線センサー

Also Published As

Publication number Publication date
JP4911875B2 (ja) 2012-04-04
JP2004530047A (ja) 2004-09-30
EP1395688A1 (de) 2004-03-10
EP1395688B1 (de) 2010-05-12
WO2002099155A1 (en) 2002-12-12
ATE467695T1 (de) 2010-05-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition