DE60043570D1 - Entwicklerzusammensetzung für alkalientwickelbare Lithographiedruckplatten mit verschiedenen Zwischenschichten - Google Patents

Entwicklerzusammensetzung für alkalientwickelbare Lithographiedruckplatten mit verschiedenen Zwischenschichten

Info

Publication number
DE60043570D1
DE60043570D1 DE60043570T DE60043570T DE60043570D1 DE 60043570 D1 DE60043570 D1 DE 60043570D1 DE 60043570 T DE60043570 T DE 60043570T DE 60043570 T DE60043570 T DE 60043570T DE 60043570 D1 DE60043570 D1 DE 60043570D1
Authority
DE
Germany
Prior art keywords
alkali
lithographic printing
intermediate layers
printing plates
developer composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60043570T
Other languages
English (en)
Inventor
Ulrich Fiebag
Uwe Tondock
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Application granted granted Critical
Publication of DE60043570D1 publication Critical patent/DE60043570D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C11D7/14—Silicates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C11D7/16—Phosphates including polyphosphates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE60043570T 1999-11-24 2000-11-22 Entwicklerzusammensetzung für alkalientwickelbare Lithographiedruckplatten mit verschiedenen Zwischenschichten Expired - Lifetime DE60043570D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/449,074 US6255042B1 (en) 1999-11-24 1999-11-24 Developing system for alkaline-developable lithographic printing plates with different interlayers

Publications (1)

Publication Number Publication Date
DE60043570D1 true DE60043570D1 (de) 2010-02-04

Family

ID=23782773

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60043570T Expired - Lifetime DE60043570D1 (de) 1999-11-24 2000-11-22 Entwicklerzusammensetzung für alkalientwickelbare Lithographiedruckplatten mit verschiedenen Zwischenschichten

Country Status (3)

Country Link
US (1) US6255042B1 (de)
EP (1) EP1103859B1 (de)
DE (1) DE60043570D1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4230130B2 (ja) * 2001-07-04 2009-02-25 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法
US6562555B2 (en) * 2001-08-01 2003-05-13 Kodak Polychrome Graphics Llc Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
US20060234161A1 (en) * 2002-10-04 2006-10-19 Eric Verschueren Method of making a lithographic printing plate precursor
US20060000377A1 (en) * 2002-10-04 2006-01-05 Agfa-Gevaert Method of marking a lithographic printing plate precursor
US7455949B2 (en) * 2002-10-15 2008-11-25 Agfa Graphics, N.V. Polymer for heat-sensitive lithographic printing plate precursor
US7458320B2 (en) * 2002-10-15 2008-12-02 Agfa Graphics, N.V. Polymer for heat-sensitive lithographic printing plate precursor
US20060060096A1 (en) * 2002-10-15 2006-03-23 Agfa-Gevaert Polymer for heat-sensitive lithographic printing plate precursor
GB0226101D0 (en) * 2002-11-08 2002-12-18 Rhodia Cons Spec Ltd White rust corrosion inhibitors
KR100967562B1 (ko) * 2003-02-11 2010-07-05 아그파 그래픽스 엔브이 감열 리소그래피 인쇄판 전구체
JP2004271985A (ja) † 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版用現像液及び平版印刷版の製版方法
CN1802603A (zh) 2003-07-17 2006-07-12 霍尼韦尔国际公司 用于高级微电子应用的平面化薄膜及其生产装置和方法
US20050059565A1 (en) * 2003-09-03 2005-03-17 Sutton David C. Cleaning composition
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
US20050076801A1 (en) * 2003-10-08 2005-04-14 Miller Gary Roger Developer system
ATE517758T1 (de) * 2006-03-17 2011-08-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
US20100129756A1 (en) * 2007-05-15 2010-05-27 Willi-Kurt Gries Gum solution for developing and gumming a photopolymer printing plate
US20080299491A1 (en) * 2007-05-31 2008-12-04 Miller Gary R Highly alkaline developer composition and methods of use
US7883833B2 (en) * 2007-06-20 2011-02-08 Eastman Kodak Company Use of highly alkaline developer regenerator composition
EP2040124A1 (de) * 2007-09-24 2009-03-25 Eastman Kodak Company Verfahren zur Herstellung von Lithografiedruckformen
CN101441422B (zh) * 2007-11-22 2011-04-27 乐凯集团第二胶片厂 热敏阳图ctp版用显影液
EP2366545B1 (de) 2010-03-19 2012-12-05 Agfa Graphics N.V. Lithographiedruckplattenvorläufer

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA6807938B (de) 1967-12-04
US3907976A (en) 1974-11-29 1975-09-23 Mallinckrodt Inc Continuous process for preparing potassium fluotantalate crystals
US4259434A (en) 1977-10-24 1981-03-31 Fuji Photo Film Co., Ltd. Method for developing positive acting light-sensitive planographic printing plate
JPS5754938A (en) 1980-09-20 1982-04-01 Konishiroku Photo Ind Co Ltd Developing method for positive type photosensitive lithographic printing plate
DE3126627A1 (de) 1981-07-06 1983-01-20 Hoechst Ag, 6000 Frankfurt Polyvinylmethylphosphinsaeure, verfahren zu ihrer herstellung und ihre verwendung
US4983379A (en) * 1983-03-01 1991-01-08 Schaeffer Hans A Dental preparation, article and method for storage and delivery thereof
DE3406101A1 (de) 1984-02-21 1985-08-22 Hoechst Ag, 6230 Frankfurt Verfahren zur zweistufigen hydrophilierenden nachbehandlung von aluminiumoxidschichten mit waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern
ZA872295B (de) 1986-03-13 1987-09-22
US4822723A (en) 1987-11-30 1989-04-18 Hoechst Celanese Corporation Developer compositions for heavy-duty lithographic printing plates
US4828965A (en) * 1988-01-06 1989-05-09 Olin Hunt Specialty Products Inc. Aqueous developing solution and its use in developing positive-working photoresist composition
JP3086354B2 (ja) 1993-03-30 2000-09-11 富士写真フイルム株式会社 感光性平版印刷版用の現像液および現像補充液
US5372915A (en) 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
CA2127341C (en) * 1994-07-04 2006-09-19 Ronald Albert Porter Fire extinguishing composition
US5466557A (en) 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
US5491046A (en) 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
US5766826A (en) 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5897985A (en) 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5811221A (en) 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US5863710A (en) * 1997-06-05 1999-01-26 Tokyo Ohka Kogyo Co., Ltd. Developer solution for photolithographic patterning

Also Published As

Publication number Publication date
US6255042B1 (en) 2001-07-03
EP1103859A1 (de) 2001-05-30
EP1103859B1 (de) 2009-12-23

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