DE60005888D1 - Verfahren und Vorrichtung zur Druckmessung in einer CVD/CVI-Kammer - Google Patents
Verfahren und Vorrichtung zur Druckmessung in einer CVD/CVI-KammerInfo
- Publication number
- DE60005888D1 DE60005888D1 DE60005888T DE60005888T DE60005888D1 DE 60005888 D1 DE60005888 D1 DE 60005888D1 DE 60005888 T DE60005888 T DE 60005888T DE 60005888 T DE60005888 T DE 60005888T DE 60005888 D1 DE60005888 D1 DE 60005888D1
- Authority
- DE
- Germany
- Prior art keywords
- cvd
- pressure measurement
- cvi chamber
- cvi
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D21/00—Arrangements of monitoring devices; Arrangements of safety devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
- F27D2019/0006—Monitoring the characteristics (composition, quantities, temperature, pressure) of at least one of the gases of the kiln atmosphere and using it as a controlling value
- F27D2019/0009—Monitoring the pressure in an enclosure or kiln zone
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D21/00—Arrangements of monitoring devices; Arrangements of safety devices
- F27D2021/0007—Monitoring the pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
- F27D99/0006—Electric heating elements or system
- F27D2099/0015—Induction heating
- F27D2099/002—Core heating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/10—Chemical vapor infiltration, i.e. CVI
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49764—Method of mechanical manufacture with testing or indicating
- Y10T29/49771—Quantitative measuring or gauging
- Y10T29/49776—Pressure, force, or weight determining
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49826—Assembling or joining
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13758799P | 1999-06-04 | 1999-06-04 | |
US137587P | 1999-06-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60005888D1 true DE60005888D1 (de) | 2003-11-20 |
DE60005888T2 DE60005888T2 (de) | 2004-07-29 |
Family
ID=22478132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60005888T Expired - Fee Related DE60005888T2 (de) | 1999-06-04 | 2000-06-02 | Verfahren und Vorrichtung zur Druckmessung in einer CVD/CVI-Kammer |
Country Status (3)
Country | Link |
---|---|
US (1) | US6383298B1 (de) |
EP (1) | EP1065294B1 (de) |
DE (1) | DE60005888T2 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6758909B2 (en) * | 2001-06-05 | 2004-07-06 | Honeywell International Inc. | Gas port sealing for CVD/CVI furnace hearth plates |
US20030233977A1 (en) * | 2002-06-20 | 2003-12-25 | Yeshwanth Narendar | Method for forming semiconductor processing components |
US6881262B1 (en) | 2002-12-23 | 2005-04-19 | Saint-Gobain Ceramics & Plastics, Inc. | Methods for forming high purity components and components formed thereby |
US6825123B2 (en) * | 2003-04-15 | 2004-11-30 | Saint-Goban Ceramics & Plastics, Inc. | Method for treating semiconductor processing components and components formed thereby |
US7501370B2 (en) * | 2004-01-06 | 2009-03-10 | Saint-Gobain Ceramics & Plastics, Inc. | High purity silicon carbide wafer boats |
US7424045B2 (en) * | 2004-09-01 | 2008-09-09 | Wilcox Dale R | Method and apparatus for heating a workpiece in an inert atmosphere or in vacuum |
US20070269597A1 (en) * | 2006-05-17 | 2007-11-22 | Honeywell International Inc. | Modified CVD cooling loop |
TWI421965B (zh) * | 2007-12-20 | 2014-01-01 | Saint Gobain Ceramics | 處理半導體製程元件之方法及其形成之元件 |
US10689753B1 (en) | 2009-04-21 | 2020-06-23 | Goodrich Corporation | System having a cooling element for densifying a substrate |
US20110091700A1 (en) * | 2009-10-20 | 2011-04-21 | Saint-Gobain Ceramics & Plastics, Inc. | Microelectronic processing component having a corrosion-resistant layer, microelectronic workpiece processing apparatus incorporating same, and method of forming an article having the corrosion-resistant layer |
KR20130107001A (ko) * | 2012-03-21 | 2013-10-01 | 엘지이노텍 주식회사 | 증착 장치 |
CN112794715B (zh) * | 2020-12-29 | 2022-07-08 | 中南大学 | 一种多料柱式cvi炉及飞机刹车盘制造方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3995187A (en) | 1971-09-07 | 1976-11-30 | Telic Corporation | Electrode type glow discharge apparatus |
US4030996A (en) | 1971-09-07 | 1977-06-21 | Telic Corporation | Electrode type glow discharge method and apparatus |
US3884793A (en) | 1971-09-07 | 1975-05-20 | Telic Corp | Electrode type glow discharge apparatus |
US4031424A (en) | 1971-09-07 | 1977-06-21 | Telic Corporation | Electrode type glow discharge apparatus |
FR2490246A1 (fr) | 1980-09-17 | 1982-03-19 | Cit Alcatel | Dispositif de deposition chimique activee sous plasma |
US4573431A (en) | 1983-11-16 | 1986-03-04 | Btu Engineering Corporation | Modular V-CVD diffusion furnace |
US4606650A (en) | 1984-11-26 | 1986-08-19 | Domtar Inc. | Microwave, a closed vessel and methods of determining volatile material content |
US4609562A (en) * | 1984-12-20 | 1986-09-02 | Westinghouse Electric Corp. | Apparatus and method for depositing coating onto porous substrate |
US5073241A (en) | 1986-01-31 | 1991-12-17 | Kabushiki Kaisha Meidenshae | Method for carbon film production |
JPS6312128A (ja) | 1986-03-20 | 1988-01-19 | Toshiba Mach Co Ltd | バレル型気相成長装置 |
US4854266A (en) | 1987-11-02 | 1989-08-08 | Btu Engineering Corporation | Cross-flow diffusion furnace |
US4993358A (en) | 1989-07-28 | 1991-02-19 | Watkins-Johnson Company | Chemical vapor deposition reactor and method of operation |
WO1992002659A1 (en) | 1990-08-10 | 1992-02-20 | Viratec Thin Films, Inc. | Shielding for arc suppression in rotating magnetron sputtering systems |
US5284676A (en) * | 1990-08-17 | 1994-02-08 | Carbon Implants, Inc. | Pyrolytic deposition in a fluidized bed |
FR2711646B1 (fr) * | 1993-10-27 | 1996-02-09 | Europ Propulsion | Procédé d'infiltration chimique en phase vapeur d'une matrice pyrocarbone au sein d'un substrat poreux avec établissement d'un gradient de température dans le substrat. |
FR2714076B1 (fr) * | 1993-12-16 | 1996-03-15 | Europ Propulsion | Procédé de densification de substrats poreux par infiltration chimique en phase vapeur de carbure de silicium. |
US5625170A (en) | 1994-01-18 | 1997-04-29 | Nanometrics Incorporated | Precision weighing to monitor the thickness and uniformity of deposited or etched thin film |
US5480678A (en) | 1994-11-16 | 1996-01-02 | The B. F. Goodrich Company | Apparatus for use with CVI/CVD processes |
EP0832863B1 (de) | 1994-11-16 | 2002-04-03 | The B.F. Goodrich Company | Vorrichtung zur Druckfeld CVD/CVI, Verfahren und Produkt |
DE60013208T2 (de) * | 1999-06-04 | 2005-08-11 | Goodrich Corp. | Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung |
-
2000
- 2000-06-02 DE DE60005888T patent/DE60005888T2/de not_active Expired - Fee Related
- 2000-06-02 EP EP00112048A patent/EP1065294B1/de not_active Expired - Lifetime
- 2000-06-02 US US09/587,101 patent/US6383298B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1065294B1 (de) | 2003-10-15 |
US6383298B1 (en) | 2002-05-07 |
DE60005888T2 (de) | 2004-07-29 |
EP1065294A1 (de) | 2001-01-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |