DE502006008357D1 - DEVICE AND METHOD FOR CLEANING A FIXED WAFER BLOCK - Google Patents

DEVICE AND METHOD FOR CLEANING A FIXED WAFER BLOCK

Info

Publication number
DE502006008357D1
DE502006008357D1 DE502006008357T DE502006008357T DE502006008357D1 DE 502006008357 D1 DE502006008357 D1 DE 502006008357D1 DE 502006008357 T DE502006008357 T DE 502006008357T DE 502006008357 T DE502006008357 T DE 502006008357T DE 502006008357 D1 DE502006008357 D1 DE 502006008357D1
Authority
DE
Germany
Prior art keywords
cleaning
wafer block
outlet port
sawn
basin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE502006008357T
Other languages
German (de)
Inventor
Wolfgang Stangl
Hans-Juergen Stangl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stangl Semiconductor Equipment AG
Original Assignee
Stangl Semiconductor Equipment AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stangl Semiconductor Equipment AG filed Critical Stangl Semiconductor Equipment AG
Publication of DE502006008357D1 publication Critical patent/DE502006008357D1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid.
DE502006008357T 2005-12-06 2006-12-06 DEVICE AND METHOD FOR CLEANING A FIXED WAFER BLOCK Active DE502006008357D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005058269A DE102005058269B4 (en) 2005-12-06 2005-12-06 Device for cleaning a sawn wafer block
PCT/EP2006/011724 WO2007065665A1 (en) 2005-12-06 2006-12-06 Apparatus and method for cleaning a sawn wafer block

Publications (1)

Publication Number Publication Date
DE502006008357D1 true DE502006008357D1 (en) 2010-12-30

Family

ID=37728200

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102005058269A Expired - Fee Related DE102005058269B4 (en) 2005-12-06 2005-12-06 Device for cleaning a sawn wafer block
DE502006008357T Active DE502006008357D1 (en) 2005-12-06 2006-12-06 DEVICE AND METHOD FOR CLEANING A FIXED WAFER BLOCK

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102005058269A Expired - Fee Related DE102005058269B4 (en) 2005-12-06 2005-12-06 Device for cleaning a sawn wafer block

Country Status (7)

Country Link
US (1) US20080308125A1 (en)
EP (1) EP1957247B1 (en)
AT (1) ATE488345T1 (en)
CA (2) CA2719395A1 (en)
DE (2) DE102005058269B4 (en)
MY (1) MY141037A (en)
WO (1) WO2007065665A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202006020339U1 (en) * 2006-12-15 2008-04-10 Rena Sondermaschinen Gmbh Device for cleaning objects, in particular thin disks
DE102007058260A1 (en) 2007-11-27 2009-05-28 Gebr. Schmid Gmbh & Co. Cut wafer block cleaning method for use during manufacture of solar cell, involves turning lateral edges of wafer block and/or wafer about vertical axis, so that cleaning liquid is supplied between wafers
EP2218004B1 (en) * 2007-12-10 2012-02-15 RENA GmbH Apparatus for, and method of, cleaning articles
KR101177038B1 (en) * 2007-12-10 2012-08-27 레나 게엠베하 Apparatus for, and method of, cleaning articles
DE102008004548A1 (en) * 2008-01-15 2009-07-16 Rec Scan Wafer As Wafer batch cleaning
US8241432B2 (en) * 2008-03-07 2012-08-14 Mei, Llc Solar wafer cleaning systems, apparatus and methods
JP5778156B2 (en) * 2009-09-15 2015-09-16 クアンタム グローバル テクノロジーズ リミテッド ライアビリティ カンパニー Shower head cleaning method and apparatus

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5356813A (en) * 1992-04-30 1994-10-18 Energy Biosystems Corporation Process for the desulfurization and the desalting of a fossil fuel
US5950645A (en) * 1993-10-20 1999-09-14 Verteq, Inc. Semiconductor wafer cleaning system
JPH07249604A (en) * 1994-03-09 1995-09-26 Fujitsu Ltd Washing method and washing equipment
US5772784A (en) * 1994-11-14 1998-06-30 Yieldup International Ultra-low particle semiconductor cleaner
US5950643A (en) * 1995-09-06 1999-09-14 Miyazaki; Takeshiro Wafer processing system
JPH10172947A (en) * 1996-12-11 1998-06-26 Hitachi Ltd Single tank-type cleaning method and device therefor
JP3209403B2 (en) * 1996-12-24 2001-09-17 株式会社東京精密 Wafer cleaning equipment
JP3697063B2 (en) * 1997-05-15 2005-09-21 東京エレクトロン株式会社 Cleaning system
US6164297A (en) * 1997-06-13 2000-12-26 Tokyo Electron Limited Cleaning and drying apparatus for objects to be processed
JP3494202B2 (en) * 1997-09-30 2004-02-09 荒川化学工業株式会社 Wafer-like work cleaning method, cleaning basket and cleaning housing used in the cleaning method
US6514355B1 (en) * 1999-02-08 2003-02-04 International Business Machines Corporation Method and apparatus for recovery of semiconductor wafers from a chemical tank
US6837253B1 (en) * 2002-04-22 2005-01-04 Imtec Acculine, Inc. Processing tank with improved quick dump valve
US20050061775A1 (en) * 2003-09-19 2005-03-24 Kuo-Tang Hsu Novel design to eliminate wafer sticking

Also Published As

Publication number Publication date
EP1957247A1 (en) 2008-08-20
WO2007065665A1 (en) 2007-06-14
ATE488345T1 (en) 2010-12-15
MY141037A (en) 2010-02-25
CA2632387A1 (en) 2007-12-06
EP1957247B1 (en) 2010-11-17
US20080308125A1 (en) 2008-12-18
DE102005058269B4 (en) 2011-12-01
CA2719395A1 (en) 2007-12-06
CA2632387C (en) 2012-04-17
DE102005058269A1 (en) 2007-06-14

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