DE50013442D1 - Rhodium bath and method for depositing rhodium - Google Patents
Rhodium bath and method for depositing rhodiumInfo
- Publication number
- DE50013442D1 DE50013442D1 DE50013442T DE50013442T DE50013442D1 DE 50013442 D1 DE50013442 D1 DE 50013442D1 DE 50013442 T DE50013442 T DE 50013442T DE 50013442 T DE50013442 T DE 50013442T DE 50013442 D1 DE50013442 D1 DE 50013442D1
- Authority
- DE
- Germany
- Prior art keywords
- rhodium
- bath
- depositing
- depositing rhodium
- rhodium bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE50013442T DE50013442D1 (en) | 1999-03-05 | 2000-02-16 | Rhodium bath and method for depositing rhodium |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1999109678 DE19909678C1 (en) | 1999-03-05 | 1999-03-05 | Rhodium plating bath useful for electroless plating of ceramics and metals comprises water and a readily water-soluble rhodium compound |
DE50013442T DE50013442D1 (en) | 1999-03-05 | 2000-02-16 | Rhodium bath and method for depositing rhodium |
Publications (1)
Publication Number | Publication Date |
---|---|
DE50013442D1 true DE50013442D1 (en) | 2006-10-26 |
Family
ID=7899803
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1999109678 Expired - Fee Related DE19909678C1 (en) | 1999-03-05 | 1999-03-05 | Rhodium plating bath useful for electroless plating of ceramics and metals comprises water and a readily water-soluble rhodium compound |
DE50013442T Expired - Fee Related DE50013442D1 (en) | 1999-03-05 | 2000-02-16 | Rhodium bath and method for depositing rhodium |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1999109678 Expired - Fee Related DE19909678C1 (en) | 1999-03-05 | 1999-03-05 | Rhodium plating bath useful for electroless plating of ceramics and metals comprises water and a readily water-soluble rhodium compound |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1035229B1 (en) |
JP (1) | JP2000282248A (en) |
DE (2) | DE19909678C1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110952081A (en) * | 2018-09-27 | 2020-04-03 | Imec 非营利协会 | Method and solution for forming interconnects |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5081830B2 (en) | 2005-10-13 | 2012-11-28 | ヴェロシス インコーポレイテッド | Electroless plating in microchannels |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1771053A1 (en) * | 1968-03-28 | 1971-11-25 | Telefunken Patent | Process for the electroless deposition of metal layers of the platinum metal group on surfaces of metallic and non-metallic parts |
CH606475A5 (en) * | 1976-02-05 | 1978-10-31 | Bbc Brown Boveri & Cie | |
US4402802A (en) * | 1981-01-03 | 1983-09-06 | Dequssa Aktiengesellschaft | Electrolytic bath for the deposition of rhodium coatings |
JPS5939504B2 (en) * | 1982-05-19 | 1984-09-25 | 工業技術院長 | Electroless plating bath for rhodium or rhodium alloys |
US4789437A (en) * | 1986-07-11 | 1988-12-06 | University Of Hong Kong | Pulse electroplating process |
-
1999
- 1999-03-05 DE DE1999109678 patent/DE19909678C1/en not_active Expired - Fee Related
-
2000
- 2000-02-16 EP EP20000103134 patent/EP1035229B1/en not_active Expired - Lifetime
- 2000-02-16 DE DE50013442T patent/DE50013442D1/en not_active Expired - Fee Related
- 2000-03-02 JP JP2000057560A patent/JP2000282248A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110952081A (en) * | 2018-09-27 | 2020-04-03 | Imec 非营利协会 | Method and solution for forming interconnects |
Also Published As
Publication number | Publication date |
---|---|
EP1035229B1 (en) | 2006-09-13 |
EP1035229A1 (en) | 2000-09-13 |
JP2000282248A (en) | 2000-10-10 |
DE19909678C1 (en) | 2000-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |