DE3884970D1 - Monolitische tunnelmaske mit einer amorphen/einkristallinen struktur. - Google Patents

Monolitische tunnelmaske mit einer amorphen/einkristallinen struktur.

Info

Publication number
DE3884970D1
DE3884970D1 DE88909414T DE3884970T DE3884970D1 DE 3884970 D1 DE3884970 D1 DE 3884970D1 DE 88909414 T DE88909414 T DE 88909414T DE 3884970 T DE3884970 T DE 3884970T DE 3884970 D1 DE3884970 D1 DE 3884970D1
Authority
DE
Germany
Prior art keywords
monolitian
amorphine
single crystal
crystal structure
tunnel mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88909414T
Other languages
English (en)
Other versions
DE3884970T2 (de
Inventor
Gary Atkinson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of DE3884970D1 publication Critical patent/DE3884970D1/de
Application granted granted Critical
Publication of DE3884970T2 publication Critical patent/DE3884970T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
DE88909414T 1987-10-09 1988-08-30 Monolitische tunnelmaske mit einer amorphen/einkristallinen struktur. Expired - Fee Related DE3884970T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10628587A 1987-10-09 1987-10-09
PCT/US1988/002961 WO1989003544A1 (en) 1987-10-09 1988-08-30 Monolithic channeling mask having amorphous/single crystal construction

Publications (2)

Publication Number Publication Date
DE3884970D1 true DE3884970D1 (de) 1993-11-18
DE3884970T2 DE3884970T2 (de) 1994-04-21

Family

ID=22310592

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88909414T Expired - Fee Related DE3884970T2 (de) 1987-10-09 1988-08-30 Monolitische tunnelmaske mit einer amorphen/einkristallinen struktur.

Country Status (4)

Country Link
EP (1) EP0424375B1 (de)
JP (1) JPH0675190B2 (de)
DE (1) DE3884970T2 (de)
WO (1) WO1989003544A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5304437A (en) * 1992-04-03 1994-04-19 At&T Bell Laboratories Mask for x-ray pattern delineation
CN1196175C (zh) 2000-05-25 2005-04-06 凸版印刷株式会社 转印掩模的制造方法
US7659039B2 (en) 2005-06-08 2010-02-09 Canon Kabushiki Kaisha Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method
DE102010015124A1 (de) * 2010-04-16 2011-10-20 Karlsruher Institut für Technologie Röntgenlithographiemaske aus Nickel oder einer Nickelbasislegierung

Also Published As

Publication number Publication date
JPH0675190B2 (ja) 1994-09-21
EP0424375B1 (de) 1993-10-13
EP0424375A1 (de) 1991-05-02
JPH02503239A (ja) 1990-10-04
WO1989003544A1 (en) 1989-04-20
DE3884970T2 (de) 1994-04-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee