DE3875532D1 - Bildaufzeichnungsverfahren. - Google Patents
Bildaufzeichnungsverfahren.Info
- Publication number
- DE3875532D1 DE3875532D1 DE8888810426T DE3875532T DE3875532D1 DE 3875532 D1 DE3875532 D1 DE 3875532D1 DE 8888810426 T DE8888810426 T DE 8888810426T DE 3875532 T DE3875532 T DE 3875532T DE 3875532 D1 DE3875532 D1 DE 3875532D1
- Authority
- DE
- Germany
- Prior art keywords
- image recording
- recording method
- image
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB878715435A GB8715435D0 (en) | 1987-07-01 | 1987-07-01 | Forming images |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3875532D1 true DE3875532D1 (de) | 1992-12-03 |
DE3875532T2 DE3875532T2 (de) | 1993-04-15 |
Family
ID=10619879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8888810426T Expired - Fee Related DE3875532T2 (de) | 1987-07-01 | 1988-06-22 | Bildaufzeichnungsverfahren. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4978604A (de) |
EP (1) | EP0298030B1 (de) |
JP (1) | JP2627430B2 (de) |
CA (1) | CA1338955C (de) |
DE (1) | DE3875532T2 (de) |
GB (1) | GB8715435D0 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5219712A (en) * | 1987-11-28 | 1993-06-15 | Thorn Emi Plc | Method of forming a solid article |
MX169037B (es) * | 1988-03-29 | 1993-06-17 | Rohm & Haas | Procedimiento para preparar revestimientos fotocurados |
DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
EP0425440B1 (de) * | 1989-10-27 | 1994-11-17 | Ciba-Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen |
EP0460919A3 (en) * | 1990-06-05 | 1993-04-28 | Nippon Paint Co., Ltd. | Process for exposing a photosensitive resin composition to light |
DE4027301A1 (de) * | 1990-08-29 | 1992-03-05 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial |
US5230986A (en) * | 1991-02-01 | 1993-07-27 | Stereographics Limited Partnership | Photosensitive compositions containing benzospiropyrans and uses thereof |
US5707781A (en) * | 1995-05-05 | 1998-01-13 | Bayer Corporation | Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner |
US6361925B1 (en) | 1996-03-04 | 2002-03-26 | Ciba Specialty Chemicals Corporation | Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides |
SE520727C2 (sv) * | 1996-03-04 | 2003-08-19 | Ciba Sc Holding Ag | Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar |
JP3518158B2 (ja) * | 1996-04-02 | 2004-04-12 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
US5935763A (en) * | 1996-06-11 | 1999-08-10 | International Business Machines Corporation | Self-aligned pattern over a reflective layer |
US8071260B1 (en) * | 2004-06-15 | 2011-12-06 | Inphase Technologies, Inc. | Thermoplastic holographic media |
DE102008052586A1 (de) * | 2008-10-21 | 2010-04-22 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3859091A (en) * | 1971-09-08 | 1975-01-07 | Grace W R & Co | Preparation of printing or pattern plates |
US3784378A (en) * | 1971-10-18 | 1974-01-08 | Du Pont | Double-exposure method for producing reverse images in photopolymers |
FI60194C (fi) * | 1972-07-28 | 1981-12-10 | Ciba Geigy Ag | Foerfarande foer framstaellning av bensil-monoketaler |
US3926643A (en) * | 1974-05-16 | 1975-12-16 | Du Pont | Photopolymerizable compositions comprising initiator combinations comprising thioxanthenones |
US4318791A (en) * | 1977-12-22 | 1982-03-09 | Ciba-Geigy Corporation | Use of aromatic-aliphatic ketones as photo sensitizers |
US4428807A (en) * | 1978-06-30 | 1984-01-31 | The Dow Chemical Company | Composition containing polymerizable entities having oxirane groups and terminal olefinic unsaturation in combination with free-radical and cationic photopolymerizations means |
DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
JPS5559456A (en) * | 1978-10-25 | 1980-05-02 | Fuji Photo Film Co Ltd | Electron beam recording method |
US4227978A (en) * | 1979-06-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photohardenable composition |
US4291118A (en) * | 1979-12-26 | 1981-09-22 | W. R. Grace & Co. | Relief imaging liquids |
US4413052A (en) * | 1981-02-04 | 1983-11-01 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl group and anthryl group |
US4416975A (en) * | 1981-02-04 | 1983-11-22 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl groups and maleimide groups |
EP0088050B1 (de) * | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Photohärtbare gefärbte Massen |
GB2127324B (en) * | 1982-09-21 | 1986-03-12 | Newbury Electronics Limited | Manufacture of printed circuit boards |
US4426431A (en) * | 1982-09-22 | 1984-01-17 | Eastman Kodak Company | Radiation-curable compositions for restorative and/or protective treatment of photographic elements |
DE3380028D1 (en) * | 1982-10-01 | 1989-07-13 | Ciba Geigy Ag | Propiophenone derivatives as photoinitiators in the photopolymerization |
US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
US4590287A (en) * | 1983-02-11 | 1986-05-20 | Ciba-Geigy Corporation | Fluorinated titanocenes and photopolymerizable composition containing same |
US4559371A (en) * | 1983-02-18 | 1985-12-17 | Ciba Geigy Corporation | Photocurable colored compositions employing alpha-amino phenone initiator |
DE3335309C1 (de) * | 1983-09-29 | 1984-08-16 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Photographisches Aufzeichnungsverfahren unter Verwendung lichthaertbarer Materialien |
JPS61500974A (ja) * | 1983-10-28 | 1986-05-15 | ロクタイト.コ−ポレ−シヨン | 2つの硬化タイプのプレポリマ−を含む光硬化性組成物 |
US4571377A (en) * | 1984-01-23 | 1986-02-18 | Battelle Memorial Institute | Photopolymerizable composition containing a photosensitive donor and photoinitiating acceptor |
JPS6161154A (ja) * | 1984-09-03 | 1986-03-28 | Oki Electric Ind Co Ltd | 微細ネガレジストパターン形成方法 |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
JPS63262645A (ja) * | 1986-02-03 | 1988-10-28 | イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− | 黄色光予備露光を用いる増大された光重合体感度 |
CH678897A5 (de) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag |
-
1987
- 1987-07-01 GB GB878715435A patent/GB8715435D0/en active Pending
-
1988
- 1988-06-20 US US07/208,524 patent/US4978604A/en not_active Expired - Lifetime
- 1988-06-22 DE DE8888810426T patent/DE3875532T2/de not_active Expired - Fee Related
- 1988-06-22 EP EP88810426A patent/EP0298030B1/de not_active Expired
- 1988-06-29 CA CA000570730A patent/CA1338955C/en not_active Expired - Fee Related
- 1988-07-01 JP JP63164803A patent/JP2627430B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6435438A (en) | 1989-02-06 |
EP0298030A3 (en) | 1989-07-12 |
DE3875532T2 (de) | 1993-04-15 |
JP2627430B2 (ja) | 1997-07-09 |
US4978604A (en) | 1990-12-18 |
GB8715435D0 (en) | 1987-08-05 |
EP0298030B1 (de) | 1992-10-28 |
CA1338955C (en) | 1997-03-04 |
EP0298030A2 (de) | 1989-01-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: NOVARTIS AG, BASEL, CH |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: CIBA SPECIALTY CHEMICALS HOLDING INC., BASEL, CH |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: VANTICO AG, BASEL, CH |
|
8339 | Ceased/non-payment of the annual fee |