DE3771004D1 - Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern. - Google Patents
Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern.Info
- Publication number
- DE3771004D1 DE3771004D1 DE8787105987T DE3771004T DE3771004D1 DE 3771004 D1 DE3771004 D1 DE 3771004D1 DE 8787105987 T DE8787105987 T DE 8787105987T DE 3771004 T DE3771004 T DE 3771004T DE 3771004 D1 DE3771004 D1 DE 3771004D1
- Authority
- DE
- Germany
- Prior art keywords
- polar
- paints
- photo
- carriers
- improvement procedure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87134886A | 1986-06-06 | 1986-06-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3771004D1 true DE3771004D1 (de) | 1991-08-01 |
Family
ID=25357257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787105987T Expired - Fee Related DE3771004D1 (de) | 1986-06-06 | 1987-04-24 | Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0252233B1 (de) |
JP (1) | JPS62293240A (de) |
DE (1) | DE3771004D1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4937055A (en) * | 1989-01-13 | 1990-06-26 | Andus Corporation | Surface treatment for thin metal or semiconductor oxide coatings |
EP0636471B1 (de) * | 1993-07-28 | 2001-03-21 | Asahi Glass Company Ltd. | Verfahren zur Herstellung eineS VerbundglasES |
JPH11511900A (ja) * | 1994-11-22 | 1999-10-12 | コンプレツクス フルイツド システムズ,インコーポレーテツド | マイクロエレクトロニクス用途のための非アミン系フォトレジスト密着促進剤 |
JP4096138B2 (ja) * | 1999-04-12 | 2008-06-04 | Jsr株式会社 | レジスト下層膜用組成物の製造方法 |
US7615329B2 (en) * | 2006-03-02 | 2009-11-10 | Intel Corporation | Branching self-assembling photoresist with decomposable backbone |
CN104617111B (zh) * | 2015-02-03 | 2017-08-25 | 京东方科技集团股份有限公司 | 基板及其制造方法、显示装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3520683A (en) * | 1967-05-19 | 1970-07-14 | Bell Telephone Labor Inc | Photoresist method and products produced thereby |
JPS58112078A (ja) * | 1981-12-26 | 1983-07-04 | Daikin Ind Ltd | フルオロアルキルアクリレ−ト類の重合体被膜を基体表面に形成する方法 |
US4535054A (en) * | 1983-05-05 | 1985-08-13 | Hughes Aircraft Company | Wet process for developing styrene polymer resists for submicron lithography |
JPS6095433A (ja) * | 1983-10-29 | 1985-05-28 | Daikin Ind Ltd | 重合体被膜の形成方法 |
-
1987
- 1987-04-24 EP EP19870105987 patent/EP0252233B1/de not_active Expired
- 1987-04-24 DE DE8787105987T patent/DE3771004D1/de not_active Expired - Fee Related
- 1987-05-01 JP JP10652987A patent/JPS62293240A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0252233B1 (de) | 1991-06-26 |
EP0252233A1 (de) | 1988-01-13 |
JPS62293240A (ja) | 1987-12-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |