DE3771004D1 - Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern. - Google Patents

Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern.

Info

Publication number
DE3771004D1
DE3771004D1 DE8787105987T DE3771004T DE3771004D1 DE 3771004 D1 DE3771004 D1 DE 3771004D1 DE 8787105987 T DE8787105987 T DE 8787105987T DE 3771004 T DE3771004 T DE 3771004T DE 3771004 D1 DE3771004 D1 DE 3771004D1
Authority
DE
Germany
Prior art keywords
polar
paints
photo
carriers
improvement procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787105987T
Other languages
English (en)
Inventor
Harold George Linde
Elizabeth Theresa Murphy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3771004D1 publication Critical patent/DE3771004D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0751Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8787105987T 1986-06-06 1987-04-24 Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern. Expired - Fee Related DE3771004D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87134886A 1986-06-06 1986-06-06

Publications (1)

Publication Number Publication Date
DE3771004D1 true DE3771004D1 (de) 1991-08-01

Family

ID=25357257

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787105987T Expired - Fee Related DE3771004D1 (de) 1986-06-06 1987-04-24 Haftungsverbesserungsverfahren fuer nicht polare photolacke auf polaren traegern.

Country Status (3)

Country Link
EP (1) EP0252233B1 (de)
JP (1) JPS62293240A (de)
DE (1) DE3771004D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937055A (en) * 1989-01-13 1990-06-26 Andus Corporation Surface treatment for thin metal or semiconductor oxide coatings
EP0636471B1 (de) * 1993-07-28 2001-03-21 Asahi Glass Company Ltd. Verfahren zur Herstellung eineS VerbundglasES
JPH11511900A (ja) * 1994-11-22 1999-10-12 コンプレツクス フルイツド システムズ,インコーポレーテツド マイクロエレクトロニクス用途のための非アミン系フォトレジスト密着促進剤
JP4096138B2 (ja) * 1999-04-12 2008-06-04 Jsr株式会社 レジスト下層膜用組成物の製造方法
US7615329B2 (en) * 2006-03-02 2009-11-10 Intel Corporation Branching self-assembling photoresist with decomposable backbone
CN104617111B (zh) * 2015-02-03 2017-08-25 京东方科技集团股份有限公司 基板及其制造方法、显示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3520683A (en) * 1967-05-19 1970-07-14 Bell Telephone Labor Inc Photoresist method and products produced thereby
JPS58112078A (ja) * 1981-12-26 1983-07-04 Daikin Ind Ltd フルオロアルキルアクリレ−ト類の重合体被膜を基体表面に形成する方法
US4535054A (en) * 1983-05-05 1985-08-13 Hughes Aircraft Company Wet process for developing styrene polymer resists for submicron lithography
JPS6095433A (ja) * 1983-10-29 1985-05-28 Daikin Ind Ltd 重合体被膜の形成方法

Also Published As

Publication number Publication date
EP0252233B1 (de) 1991-06-26
EP0252233A1 (de) 1988-01-13
JPS62293240A (ja) 1987-12-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee