DE3687903D1 - Verfahren und vorrichtung fuer photolackverarbeitung. - Google Patents

Verfahren und vorrichtung fuer photolackverarbeitung.

Info

Publication number
DE3687903D1
DE3687903D1 DE8686116311T DE3687903T DE3687903D1 DE 3687903 D1 DE3687903 D1 DE 3687903D1 DE 8686116311 T DE8686116311 T DE 8686116311T DE 3687903 T DE3687903 T DE 3687903T DE 3687903 D1 DE3687903 D1 DE 3687903D1
Authority
DE
Germany
Prior art keywords
paint processing
photo paint
photo
processing
paint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686116311T
Other languages
English (en)
Other versions
DE3687903T2 (de
Inventor
Shinji Suzuki
Tetsuji Arai
Kuniharu Ohno
Kazuyoshi Ueki
Yoshiki Mimura
Kazuya Tanaka
Shinji Sugioka
Hiroko Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE3687903D1 publication Critical patent/DE3687903D1/de
Application granted granted Critical
Publication of DE3687903T2 publication Critical patent/DE3687903T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19863687903 1986-03-31 1986-11-25 Verfahren und Vorrichtung für Photolackverarbeitung. Expired - Lifetime DE3687903T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61071080A JPH0685082B2 (ja) 1986-03-31 1986-03-31 レジスト処理方法

Publications (2)

Publication Number Publication Date
DE3687903D1 true DE3687903D1 (de) 1993-04-08
DE3687903T2 DE3687903T2 (de) 1993-10-14

Family

ID=13450185

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863687903 Expired - Lifetime DE3687903T2 (de) 1986-03-31 1986-11-25 Verfahren und Vorrichtung für Photolackverarbeitung.

Country Status (3)

Country Link
EP (1) EP0239669B1 (de)
JP (1) JPH0685082B2 (de)
DE (1) DE3687903T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0282703B1 (de) * 1987-03-20 1991-01-16 Ushio Denki Behandlungsverfahren für Photolacke
JPS63234527A (ja) * 1987-03-24 1988-09-29 Ushio Inc レジスト処理方法
JPS63234529A (ja) * 1987-03-24 1988-09-29 Ushio Inc レジスト処理方法
TW466382B (en) * 1997-11-17 2001-12-01 Sumitomo Chemical Co A method for forming a resist pattern and a positive resist composition used for the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JPS6129124A (ja) * 1984-07-20 1986-02-10 Ushio Inc 半導体ウエハ−の処理方法

Also Published As

Publication number Publication date
EP0239669A3 (en) 1988-03-23
JPH0685082B2 (ja) 1994-10-26
EP0239669A2 (de) 1987-10-07
EP0239669B1 (de) 1993-03-03
JPS62229142A (ja) 1987-10-07
DE3687903T2 (de) 1993-10-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition