DE3684298D1 - Verfahren zur herstellung eines kontakts unter verwendung der erweichung zweier glasschichten. - Google Patents

Verfahren zur herstellung eines kontakts unter verwendung der erweichung zweier glasschichten.

Info

Publication number
DE3684298D1
DE3684298D1 DE8686117137T DE3684298T DE3684298D1 DE 3684298 D1 DE3684298 D1 DE 3684298D1 DE 8686117137 T DE8686117137 T DE 8686117137T DE 3684298 T DE3684298 T DE 3684298T DE 3684298 D1 DE3684298 D1 DE 3684298D1
Authority
DE
Germany
Prior art keywords
softening
layers
glass
producing
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686117137T
Other languages
English (en)
Inventor
Stephen T Chambers
Stephen E Luce
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3684298D1 publication Critical patent/DE3684298D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Local Oxidation Of Silicon (AREA)
DE8686117137T 1986-01-09 1986-12-09 Verfahren zur herstellung eines kontakts unter verwendung der erweichung zweier glasschichten. Expired - Fee Related DE3684298D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81752386A 1986-01-09 1986-01-09

Publications (1)

Publication Number Publication Date
DE3684298D1 true DE3684298D1 (de) 1992-04-16

Family

ID=25223263

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686117137T Expired - Fee Related DE3684298D1 (de) 1986-01-09 1986-12-09 Verfahren zur herstellung eines kontakts unter verwendung der erweichung zweier glasschichten.

Country Status (5)

Country Link
US (1) US4824767A (de)
EP (1) EP0232508B1 (de)
JP (1) JP2587626B2 (de)
KR (1) KR950000096B1 (de)
DE (1) DE3684298D1 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0369336A3 (de) * 1988-11-14 1990-08-22 National Semiconductor Corporation Prozess zur Herstellung von Bipolar- und CMOS-Transistoren auf einem gemeinsamen Substrat
JPH0793354B2 (ja) * 1988-11-28 1995-10-09 株式会社東芝 半導体装置の製造方法
US4885262A (en) * 1989-03-08 1989-12-05 Intel Corporation Chemical modification of spin-on glass for improved performance in IC fabrication
KR920004541B1 (ko) * 1989-05-30 1992-06-08 현대전자산업 주식회사 반도체 소자에서 식각베리어층을 사용한 콘택홀 형성방법
US5275972A (en) * 1990-02-19 1994-01-04 Matsushita Electric Industrial Co., Ltd. Method for fabricating a semiconductor integrated circuit device including the self-aligned formation of a contact window
US5043790A (en) * 1990-04-05 1991-08-27 Ramtron Corporation Sealed self aligned contacts using two nitrides process
JPH04186657A (ja) * 1990-11-16 1992-07-03 Sharp Corp コンタクト配線の作製方法
US5164340A (en) * 1991-06-24 1992-11-17 Sgs-Thomson Microelectronics, Inc Structure and method for contacts in cmos devices
DE4132140A1 (de) * 1991-09-26 1993-04-08 Siemens Ag Verfahren zur herstellung einer selbstjustierten kontaktlochanordnung und selbstjustierte kontaktlochanordnung
US5246883A (en) * 1992-02-06 1993-09-21 Sgs-Thomson Microelectronics, Inc. Semiconductor contact via structure and method
US5308415A (en) * 1992-12-31 1994-05-03 Chartered Semiconductor Manufacturing Pte Ltd. Enhancing step coverage by creating a tapered profile through three dimensional resist pull back
US5702870A (en) * 1993-08-27 1997-12-30 Vlsi Technology, Inc. Integrated-circuit via formation using gradient photolithography
US5435888A (en) * 1993-12-06 1995-07-25 Sgs-Thomson Microelectronics, Inc. Enhanced planarization technique for an integrated circuit
US5439846A (en) * 1993-12-17 1995-08-08 Sgs-Thomson Microelectronics, Inc. Self-aligned method for forming contact with zero offset to gate
EP0660392A1 (de) 1993-12-17 1995-06-28 STMicroelectronics, Inc. Verfahren und Struktur der dielektrischen Zwischenschicht zur verbesserten metallischen Stufenbeschichtung
US6284584B1 (en) * 1993-12-17 2001-09-04 Stmicroelectronics, Inc. Method of masking for periphery salicidation of active regions
US6107194A (en) * 1993-12-17 2000-08-22 Stmicroelectronics, Inc. Method of fabricating an integrated circuit
US5610099A (en) * 1994-06-28 1997-03-11 Ramtron International Corporation Process for fabricating transistors using composite nitride structure
US6025277A (en) * 1997-05-07 2000-02-15 United Microelectronics Corp. Method and structure for preventing bonding pad peel back
US6271117B1 (en) * 1997-06-23 2001-08-07 Vanguard International Semiconductor Corporation Process for a nail shaped landing pad plug
JP4093395B2 (ja) * 2001-08-03 2008-06-04 富士通株式会社 半導体装置とその製造方法
TW569077B (en) * 2003-05-13 2004-01-01 Univ Nat Chiao Tung Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology
TWI220770B (en) * 2003-06-11 2004-09-01 Ind Tech Res Inst Method for forming a conductive layer
US20050098480A1 (en) * 2003-11-12 2005-05-12 Robert Galiasso Hydrotreating catalyst and method
US8878245B2 (en) 2006-11-30 2014-11-04 Cree, Inc. Transistors and method for making ohmic contact to transistors
US9634191B2 (en) 2007-11-14 2017-04-25 Cree, Inc. Wire bond free wafer level LED
US8368100B2 (en) * 2007-11-14 2013-02-05 Cree, Inc. Semiconductor light emitting diodes having reflective structures and methods of fabricating same
CN101960565B (zh) * 2008-02-28 2012-09-05 惠普开发有限公司 半导体基板接触通孔
KR101004842B1 (ko) 2008-07-25 2010-12-28 삼성전기주식회사 전자 칩 모듈
US8384115B2 (en) * 2008-08-01 2013-02-26 Cree, Inc. Bond pad design for enhancing light extraction from LED chips
US8741715B2 (en) * 2009-04-29 2014-06-03 Cree, Inc. Gate electrodes for millimeter-wave operation and methods of fabrication
US9070851B2 (en) 2010-09-24 2015-06-30 Seoul Semiconductor Co., Ltd. Wafer-level light emitting diode package and method of fabricating the same
USD826871S1 (en) 2014-12-11 2018-08-28 Cree, Inc. Light emitting diode device
CN205944139U (zh) 2016-03-30 2017-02-08 首尔伟傲世有限公司 紫外线发光二极管封装件以及包含此的发光二极管模块

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4372034B1 (en) * 1981-03-26 1998-07-21 Intel Corp Process for forming contact openings through oxide layers
US4363830A (en) * 1981-06-22 1982-12-14 Rca Corporation Method of forming tapered contact holes for integrated circuit devices
JPS6092623A (ja) * 1983-10-26 1985-05-24 Nec Corp 半導体装置の製造方法
US4508815A (en) * 1983-11-03 1985-04-02 Mostek Corporation Recessed metallization
JPS60198847A (ja) * 1984-03-23 1985-10-08 Nec Corp 半導体装置およびその製造方法

Also Published As

Publication number Publication date
US4824767A (en) 1989-04-25
JP2587626B2 (ja) 1997-03-05
KR870007566A (ko) 1987-08-20
EP0232508B1 (de) 1992-03-11
JPS62160743A (ja) 1987-07-16
EP0232508A3 (en) 1988-04-06
KR950000096B1 (ko) 1995-01-09
EP0232508A2 (de) 1987-08-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee