DE3672285D1 - Verfahren zur bildung duenner metallsulfidfilme. - Google Patents

Verfahren zur bildung duenner metallsulfidfilme.

Info

Publication number
DE3672285D1
DE3672285D1 DE8686900838T DE3672285T DE3672285D1 DE 3672285 D1 DE3672285 D1 DE 3672285D1 DE 8686900838 T DE8686900838 T DE 8686900838T DE 3672285 T DE3672285 T DE 3672285T DE 3672285 D1 DE3672285 D1 DE 3672285D1
Authority
DE
Germany
Prior art keywords
thin metal
metal sulfide
forming thin
sulfide films
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686900838T
Other languages
English (en)
Inventor
Yo Hasegawa
Kazuyuki Okano
Akira Nakanishi
Hiroshi Hatase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP60006441A external-priority patent/JPH0718015B2/ja
Priority claimed from JP644485A external-priority patent/JPS61166983A/ja
Priority claimed from JP60006417A external-priority patent/JPH06102831B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE3672285D1 publication Critical patent/DE3672285D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Chemical Vapour Deposition (AREA)
DE8686900838T 1985-01-17 1986-01-16 Verfahren zur bildung duenner metallsulfidfilme. Expired - Lifetime DE3672285D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP60006441A JPH0718015B2 (ja) 1985-01-17 1985-01-17 硫化物薄膜の形成方法
JP644485A JPS61166983A (ja) 1985-01-17 1985-01-17 硫化物薄膜の形成方法
JP60006417A JPH06102831B2 (ja) 1985-01-17 1985-01-17 金属硫化物薄膜の形成方法
PCT/JP1986/000015 WO1986004362A1 (en) 1985-01-17 1986-01-16 Process for forming thin metal sulfide film

Publications (1)

Publication Number Publication Date
DE3672285D1 true DE3672285D1 (de) 1990-08-02

Family

ID=27277164

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686900838T Expired - Lifetime DE3672285D1 (de) 1985-01-17 1986-01-16 Verfahren zur bildung duenner metallsulfidfilme.

Country Status (4)

Country Link
US (1) US4885188A (de)
EP (1) EP0211083B1 (de)
DE (1) DE3672285D1 (de)
WO (1) WO1986004362A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5202152A (en) * 1991-10-25 1993-04-13 Cornell Research Foundation, Inc. Synthesis of titanium nitride films
US5714391A (en) * 1995-05-17 1998-02-03 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a compound semiconductor thin film for a photoelectric or solar cell device
US5837320A (en) * 1996-02-27 1998-11-17 The University Of New Mexico Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate ligands
US5744198A (en) * 1996-02-27 1998-04-28 The University Of New Mexico Method of depositing metal sulfide films from metal thiocarboxylate complexes with multidentate ligands
DE102007026626B3 (de) * 2007-06-07 2008-09-11 Siemens Ag Verfahren zum Erzeugen einer Trockenschmierstoff-Schicht

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2905574A (en) * 1956-01-04 1959-09-22 Alpha Molykote Corp Method for forming metal sulfide coatings
NL251316A (de) * 1961-05-04
NL282696A (de) * 1961-08-30 1900-01-01
US3313632A (en) * 1962-11-27 1967-04-11 Engelhard Ind Inc Gold-silver coordination compounds and decorating compositions containing same
US3887383A (en) * 1971-10-28 1975-06-03 Engelhard Min & Chem Gold containing compositions for producing luster films on solid substrates
US4332879A (en) * 1978-12-01 1982-06-01 Hughes Aircraft Company Process for depositing a film of controlled composition using a metallo-organic photoresist
GB2049636A (en) * 1979-05-31 1980-12-31 Vecht A Methods of Producing Thin Films
US4310182A (en) * 1979-06-15 1982-01-12 Sealed Air Corporation Internal couplings for plastic solar collectors and the like
US4418099A (en) * 1982-02-05 1983-11-29 Engelhard Corporation Non-burnished precious metal composition
US4530742A (en) * 1983-01-26 1985-07-23 Ppg Industries, Inc. Electrode and method of preparing same
NL8301652A (nl) * 1983-05-10 1984-12-03 Philips Nv Werkwijze voor het aanbrengen van magnesiumfluoridelagen en antireflectieve lagen verkregen met deze werkwijze.

Also Published As

Publication number Publication date
EP0211083B1 (de) 1990-06-27
EP0211083A1 (de) 1987-02-25
US4885188A (en) 1989-12-05
WO1986004362A1 (en) 1986-07-31
EP0211083A4 (de) 1987-05-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee