DE3627248A1 - Verfahren zur herstellung eines antireflexionsfilms auf organischen linsen oder brillenglaesern - Google Patents
Verfahren zur herstellung eines antireflexionsfilms auf organischen linsen oder brillenglaesernInfo
- Publication number
- DE3627248A1 DE3627248A1 DE19863627248 DE3627248A DE3627248A1 DE 3627248 A1 DE3627248 A1 DE 3627248A1 DE 19863627248 DE19863627248 DE 19863627248 DE 3627248 A DE3627248 A DE 3627248A DE 3627248 A1 DE3627248 A1 DE 3627248A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- refractive index
- metal oxide
- low
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 24
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 18
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 61
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 7
- 239000012790 adhesive layer Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 6
- 230000035945 sensitivity Effects 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 230000005855 radiation Effects 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000011514 reflex Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH4542/85A CH670318A5 (enExample) | 1985-10-22 | 1985-10-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3627248A1 true DE3627248A1 (de) | 1987-04-23 |
Family
ID=4278024
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863627248 Withdrawn DE3627248A1 (de) | 1985-10-22 | 1986-08-12 | Verfahren zur herstellung eines antireflexionsfilms auf organischen linsen oder brillenglaesern |
Country Status (3)
| Country | Link |
|---|---|
| CH (1) | CH670318A5 (enExample) |
| DE (1) | DE3627248A1 (enExample) |
| IT (1) | IT1197886B (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3742204A1 (de) * | 1987-12-12 | 1989-06-22 | Leybold Ag | Verfahren zur herstellung einer korrosionsfesten, weitgehend absorptionsfreien schicht auf der oberflaeche eines werkstuecks |
| DE3941796A1 (de) * | 1989-12-19 | 1991-06-20 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags |
| US5091244A (en) * | 1990-08-10 | 1992-02-25 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| DE4117256A1 (de) * | 1989-12-19 | 1992-12-03 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist |
| US5170291A (en) * | 1989-12-19 | 1992-12-08 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating |
| US5216542A (en) * | 1989-12-19 | 1993-06-01 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating |
| US5407733A (en) * | 1990-08-10 | 1995-04-18 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| WO1998033077A3 (en) * | 1997-01-27 | 1998-09-11 | Peter D Haaland | Coatings, methods and apparatus for reducing reflection from optical substrates |
| US6172812B1 (en) | 1997-01-27 | 2001-01-09 | Peter D. Haaland | Anti-reflection coatings and coated articles |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113641008A (zh) * | 2020-04-27 | 2021-11-12 | 畅梓汀 | 一种美容眼镜镜片和美容眼镜 |
-
1985
- 1985-10-22 CH CH4542/85A patent/CH670318A5/de not_active IP Right Cessation
-
1986
- 1986-08-12 DE DE19863627248 patent/DE3627248A1/de not_active Withdrawn
- 1986-10-17 IT IT22042/86A patent/IT1197886B/it active
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3742204A1 (de) * | 1987-12-12 | 1989-06-22 | Leybold Ag | Verfahren zur herstellung einer korrosionsfesten, weitgehend absorptionsfreien schicht auf der oberflaeche eines werkstuecks |
| DE3941796A1 (de) * | 1989-12-19 | 1991-06-20 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist, und verfahren zur herstellung des belags |
| DE4117256A1 (de) * | 1989-12-19 | 1992-12-03 | Leybold Ag | Belag, bestehend aus einem optisch wirkenden schichtsystem, fuer substrate, wobei das schichtsystem insbesondere eine hohe antireflexwirkung aufweist |
| US5170291A (en) * | 1989-12-19 | 1992-12-08 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating |
| US5216542A (en) * | 1989-12-19 | 1993-06-01 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating |
| US5091244A (en) * | 1990-08-10 | 1992-02-25 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| US5407733A (en) * | 1990-08-10 | 1995-04-18 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
| WO1998033077A3 (en) * | 1997-01-27 | 1998-09-11 | Peter D Haaland | Coatings, methods and apparatus for reducing reflection from optical substrates |
| US5991081A (en) * | 1997-01-27 | 1999-11-23 | Haaland; Peter D. | Anti-reflection coatings and coated articles |
| US6096371A (en) * | 1997-01-27 | 2000-08-01 | Haaland; Peter D. | Methods and apparatus for reducing reflection from optical substrates |
| US6172812B1 (en) | 1997-01-27 | 2001-01-09 | Peter D. Haaland | Anti-reflection coatings and coated articles |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1197886B (it) | 1988-12-21 |
| IT8622042A0 (it) | 1986-10-17 |
| CH670318A5 (enExample) | 1989-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |