DE3583497D1 - Strahlungsgeraet mit hoher intensitaet. - Google Patents

Strahlungsgeraet mit hoher intensitaet.

Info

Publication number
DE3583497D1
DE3583497D1 DE8585116346T DE3583497T DE3583497D1 DE 3583497 D1 DE3583497 D1 DE 3583497D1 DE 8585116346 T DE8585116346 T DE 8585116346T DE 3583497 T DE3583497 T DE 3583497T DE 3583497 D1 DE3583497 D1 DE 3583497D1
Authority
DE
Germany
Prior art keywords
high intensity
radiation device
radiation
intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585116346T
Other languages
German (de)
English (en)
Inventor
David M Camm
Arne Kjorvel
Nicholas P Halpin
Anthony J D Housden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mattson Technology Canada Inc
Original Assignee
Vortek Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vortek Industries Ltd filed Critical Vortek Industries Ltd
Application granted granted Critical
Publication of DE3583497D1 publication Critical patent/DE3583497D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
DE8585116346T 1984-12-24 1985-12-20 Strahlungsgeraet mit hoher intensitaet. Expired - Lifetime DE3583497D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA000470997A CA1239437A (en) 1984-12-24 1984-12-24 High intensity radiation method and apparatus having improved liquid vortex flow

Publications (1)

Publication Number Publication Date
DE3583497D1 true DE3583497D1 (de) 1991-08-22

Family

ID=4129455

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585116346T Expired - Lifetime DE3583497D1 (de) 1984-12-24 1985-12-20 Strahlungsgeraet mit hoher intensitaet.

Country Status (6)

Country Link
US (1) US4700102A (https=)
EP (1) EP0186879B1 (https=)
JP (1) JPS61155999A (https=)
CN (1) CN1007561B (https=)
CA (1) CA1239437A (https=)
DE (1) DE3583497D1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937490A (en) * 1988-12-19 1990-06-26 Vortek Industries Ltd. High intensity radiation apparatus and fluid recirculating system therefor
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method
US5556791A (en) * 1995-01-03 1996-09-17 Texas Instruments Incorporated Method of making optically fused semiconductor powder for solar cells
GB9506010D0 (en) * 1995-03-23 1995-08-23 Anderson John E Electromagnetic energy directing method and apparatus
CA2310883A1 (en) 1999-06-07 2000-12-07 Norman L. Arrison Method and apparatus for fracturing brittle materials by thermal stressing
US6912356B2 (en) * 1999-06-07 2005-06-28 Diversified Industries Ltd. Method and apparatus for fracturing brittle materials by thermal stressing
US6621199B1 (en) 2000-01-21 2003-09-16 Vortek Industries Ltd. High intensity electromagnetic radiation apparatus and method
JP2005515425A (ja) 2001-12-26 2005-05-26 ボルテック インダストリーズ リミテッド 温度測定および熱処理方法およびシステム
KR20120045040A (ko) 2002-12-20 2012-05-08 맷슨 테크날러지 캐나다 인코퍼레이티드 피가공물 지지 방법
WO2005059991A1 (en) 2003-12-19 2005-06-30 Mattson Technology Canada Inc. Apparatuses and methods for suppressing thermally induced motion of a workpiece
US7781947B2 (en) 2004-02-12 2010-08-24 Mattson Technology Canada, Inc. Apparatus and methods for producing electromagnetic radiation
US20050180141A1 (en) * 2004-02-13 2005-08-18 Norman Arrison Protection device for high intensity radiation sources
JP5967859B2 (ja) 2006-11-15 2016-08-10 マトソン テクノロジー、インコーポレイテッド 熱処理中の被加工物を支持するシステムおよび方法
CN102089873A (zh) 2008-05-16 2011-06-08 加拿大马特森技术有限公司 工件破损防止方法及设备
EA201391270A1 (ru) 2011-03-10 2014-08-29 Месокоут, Инк. Способ и устройство для плакирования металлических изделий
US9196760B2 (en) 2011-04-08 2015-11-24 Ut-Battelle, Llc Methods for producing complex films, and films produced thereby
JP5960846B2 (ja) * 2012-02-24 2016-08-02 マトソン テクノロジー、インコーポレイテッド 電磁放射を発生させるための装置及び方法
BR112015023290A2 (pt) 2013-03-15 2017-07-18 Mesocoat Inc pó de aspersão térmica, método de fabricação de um pó de aspersão térmica, revestimento por aspersão térmica formado de um pó de aspersão térmica, e, método de formação de um revestimento por aspersão térmica em um substrato

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3292028A (en) * 1962-06-20 1966-12-13 Giannini Scient Corp Gas vortex-stabilized light source
US3405305A (en) * 1964-12-28 1968-10-08 Giannini Scient Corp Vortex-stabilized radiation source with a hollowed-out electrode
US3366815A (en) * 1965-12-29 1968-01-30 Union Carbide Corp High pressure arc cooled by a thin film of liquid on the wall of the envelope
US4027185A (en) * 1974-06-13 1977-05-31 Canadian Patents And Development Limited High intensity radiation source
JPS5340274A (en) * 1976-09-27 1978-04-12 Stanley Electric Co Ltd Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Also Published As

Publication number Publication date
CA1239437A (en) 1988-07-19
EP0186879A3 (en) 1988-11-17
JPH0568825B2 (https=) 1993-09-29
EP0186879B1 (en) 1991-07-17
JPS61155999A (ja) 1986-07-15
EP0186879A2 (en) 1986-07-09
US4700102A (en) 1987-10-13
CN1007561B (zh) 1990-04-11
CN85109598A (zh) 1986-07-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PRUFER & PARTNER GBR, 81545 MUENCHEN