DE3574187D1 - Apparatus for optical micro-lithography with a local alignment system - Google Patents

Apparatus for optical micro-lithography with a local alignment system

Info

Publication number
DE3574187D1
DE3574187D1 DE8585400335T DE3574187T DE3574187D1 DE 3574187 D1 DE3574187 D1 DE 3574187D1 DE 8585400335 T DE8585400335 T DE 8585400335T DE 3574187 T DE3574187 T DE 3574187T DE 3574187 D1 DE3574187 D1 DE 3574187D1
Authority
DE
Germany
Prior art keywords
lithography
alignment system
local alignment
optical micro
micro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585400335T
Other languages
English (en)
Inventor
Bernard Picard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE3574187D1 publication Critical patent/DE3574187D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8585400335T 1984-02-28 1985-02-22 Apparatus for optical micro-lithography with a local alignment system Expired DE3574187D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8403027A FR2560397B1 (fr) 1984-02-28 1984-02-28 Appareil de microlithographie optique a systeme d'alignement local

Publications (1)

Publication Number Publication Date
DE3574187D1 true DE3574187D1 (en) 1989-12-14

Family

ID=9301472

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585400335T Expired DE3574187D1 (en) 1984-02-28 1985-02-22 Apparatus for optical micro-lithography with a local alignment system

Country Status (5)

Country Link
US (1) US4685807A (de)
EP (1) EP0156683B1 (de)
JP (1) JPS60205453A (de)
DE (1) DE3574187D1 (de)
FR (1) FR2560397B1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4795244A (en) * 1985-09-20 1989-01-03 Nikon Corporation Projection type exposure apparatus
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
US5137363A (en) * 1986-06-04 1992-08-11 Canon Kabushiki Kaisha Projection exposure apparatus
US4782368A (en) * 1986-07-11 1988-11-01 Matsushita Electric Industrial, Co., Ltd. Method for correction for chromatic aberration and exposure apparatus using the same
US5317338A (en) * 1991-10-29 1994-05-31 International Business Machines Corporation Visual measurement technique and test pattern for aperture offsets in photoplotters
US5233460A (en) * 1992-01-31 1993-08-03 Regents Of The University Of California Method and means for reducing speckle in coherent laser pulses
US5519535A (en) * 1994-04-04 1996-05-21 Motorola, Inc. Precision placement apparatus having liquid crystal shuttered dual prism probe
US5943089A (en) * 1996-08-23 1999-08-24 Speedline Technologies, Inc. Method and apparatus for viewing an object and for viewing a device that acts upon the object
JPH1199704A (ja) * 1997-09-30 1999-04-13 Noritsu Koki Co Ltd 印画紙用カラープリントヘッド
JP4157204B2 (ja) * 1998-10-19 2008-10-01 セイコーインスツル株式会社 情報再生装置、情報記録装置、情報再生方法および情報記録方法
US7870891B2 (en) * 2004-05-29 2011-01-18 Kilr-Chilr, Llc Systems, devices and methods for regulating temperatures of tanks, containers and contents therein
CN102944978B (zh) * 2011-08-15 2014-08-06 中山新诺科技股份有限公司 曝光系统、校准系统、光学引擎、曝光方法和制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597431B2 (de) * 1967-09-30 1971-01-07 Telefunken Patentverwertungsge Seilschaft mbH, 790OUIm Verfahren zur Herstellung von Mikro strukturen auf einem Substrat
FR2082213A5 (de) * 1970-03-06 1971-12-10 Delmas Jean Raymond
JPS5117297B1 (de) * 1971-03-11 1976-06-01
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures
US3844655A (en) * 1973-07-27 1974-10-29 Kasper Instruments Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask
US4385838A (en) * 1980-01-19 1983-05-31 Nippon Kogaku K. K. Alignment device
US4419013A (en) * 1981-03-30 1983-12-06 Tre Semiconductor Equipment Corporation Phase contrast alignment system for a semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
JPS60205453A (ja) 1985-10-17
EP0156683B1 (de) 1989-11-08
US4685807A (en) 1987-08-11
EP0156683A1 (de) 1985-10-02
FR2560397A1 (fr) 1985-08-30
FR2560397B1 (fr) 1986-11-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee