DE3561910D1 - A photopolymerizable composition - Google Patents

A photopolymerizable composition

Info

Publication number
DE3561910D1
DE3561910D1 DE8585308674T DE3561910T DE3561910D1 DE 3561910 D1 DE3561910 D1 DE 3561910D1 DE 8585308674 T DE8585308674 T DE 8585308674T DE 3561910 T DE3561910 T DE 3561910T DE 3561910 D1 DE3561910 D1 DE 3561910D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585308674T
Other languages
German (de)
English (en)
Inventor
Shohei Nakamura
Katsuhiro Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17195792&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3561910(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Application granted granted Critical
Publication of DE3561910D1 publication Critical patent/DE3561910D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8585308674T 1984-11-28 1985-11-28 A photopolymerizable composition Expired DE3561910D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24962484A JPS61128243A (ja) 1984-11-28 1984-11-28 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
DE3561910D1 true DE3561910D1 (en) 1988-04-21

Family

ID=17195792

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585308674T Expired DE3561910D1 (en) 1984-11-28 1985-11-28 A photopolymerizable composition

Country Status (4)

Country Link
EP (1) EP0183552B2 (cg-RX-API-DMAC7.html)
JP (1) JPS61128243A (cg-RX-API-DMAC7.html)
AU (1) AU587790B2 (cg-RX-API-DMAC7.html)
DE (1) DE3561910D1 (cg-RX-API-DMAC7.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ212161A (en) * 1984-06-08 1988-06-30 Ishikawa Katsukiyo Photo-polymerisable composition and printing plate prepared therefrom
NZ215095A (en) * 1985-02-12 1989-04-26 Napp Systems Inc Photosensitive resin compositions
DE3814567A1 (de) * 1988-04-29 1989-11-09 Du Pont Deutschland Photopolymerisierbare zusammensetzungen mit carboxylgruppen enthaltenden bindemitteln
US5135837A (en) * 1990-09-05 1992-08-04 E. I. Du Pont De Nemours And Company Photosensitive elastomeric element having improved solvent resistance
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
ES2082466T3 (es) * 1991-03-25 1996-03-16 Exxon Chemical Patents Inc Polimeros injertados de una isomonoolefina y un alquilestireno.
US5462835A (en) * 1991-09-16 1995-10-31 P T Sub Inc. Photocurable composition, flexible, photosensitive articles made therefrom, and methods of improving solvent resistance and flexibility of those articles
DE4211391A1 (de) 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
DE4211390A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
US5422225A (en) * 1994-06-23 1995-06-06 Shell Oil Company Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend
JP4458389B2 (ja) 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
CN102257434B (zh) 2008-12-18 2013-04-24 旭化成电子材料株式会社 烧蚀层、感光性树脂结构体、使用了该感光性树脂结构体的凸版印刷版的制造方法
JP2012068357A (ja) 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版
CN119895335A (zh) 2022-09-21 2025-04-25 东洋纺艾睦希株式会社 制造再生显影液的方法以及适合于该方法的光敏树脂组合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3764324A (en) * 1972-04-13 1973-10-09 Mc Call Corp Photographic polymer composition and process for crosslinking
CA1105758A (en) * 1976-05-06 1981-07-28 Yoshihiro Hosaka PHOTOSENSITIVE COMPOSITIONS CONTAINING A COPOLYMER DERIVED FROM A CONJUGATED DIOLEFIN AND AN .alpha. .beta. ETHYLENICALLY UNSATURATED CARBOXYLIC ACID OR ANHYDRIDE
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates

Also Published As

Publication number Publication date
EP0183552A2 (en) 1986-06-04
EP0183552A3 (en) 1986-06-25
JPS61128243A (ja) 1986-06-16
EP0183552B1 (en) 1988-03-16
EP0183552B2 (en) 1991-10-16
AU5040985A (en) 1986-06-05
JPH057705B2 (cg-RX-API-DMAC7.html) 1993-01-29
AU587790B2 (en) 1989-08-31

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8328 Change in the person/name/address of the agent

Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT. GROENING, H., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN

8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee