DE3374441D1 - Method and apparatus for exposing photosensitive material - Google Patents

Method and apparatus for exposing photosensitive material

Info

Publication number
DE3374441D1
DE3374441D1 DE8484900469T DE3374441T DE3374441D1 DE 3374441 D1 DE3374441 D1 DE 3374441D1 DE 8484900469 T DE8484900469 T DE 8484900469T DE 3374441 T DE3374441 T DE 3374441T DE 3374441 D1 DE3374441 D1 DE 3374441D1
Authority
DE
Germany
Prior art keywords
photosensitive material
exposing photosensitive
exposing
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484900469T
Other languages
English (en)
Inventor
James Cowan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polaroid Corp
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polaroid Corp filed Critical Polaroid Corp
Application granted granted Critical
Publication of DE3374441D1 publication Critical patent/DE3374441D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8484900469T 1982-12-30 1983-12-28 Method and apparatus for exposing photosensitive material Expired DE3374441D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/454,728 US4496216A (en) 1982-12-30 1982-12-30 Method and apparatus for exposing photosensitive material
PCT/US1983/002032 WO1984002781A1 (en) 1982-12-30 1983-12-28 Method and apparatus for exposing photosensitive material

Publications (1)

Publication Number Publication Date
DE3374441D1 true DE3374441D1 (en) 1987-12-17

Family

ID=23805825

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484900469T Expired DE3374441D1 (en) 1982-12-30 1983-12-28 Method and apparatus for exposing photosensitive material

Country Status (7)

Country Link
US (1) US4496216A (de)
EP (1) EP0130214B1 (de)
JP (1) JPS60500100A (de)
AU (1) AU563318B2 (de)
CA (1) CA1207580A (de)
DE (1) DE3374441D1 (de)
WO (1) WO1984002781A1 (de)

Families Citing this family (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2195784B (en) * 1986-10-07 1990-01-10 Le I Yadernoi Fiz Im B P Konst Apparatus for synthesis of elongated holographic diffraction gratings
US4888260A (en) * 1987-08-10 1989-12-19 Polaroid Corporation Volume phase reflection holograms and methods for fabricating them
JP3245882B2 (ja) * 1990-10-24 2002-01-15 株式会社日立製作所 パターン形成方法、および投影露光装置
US5308180A (en) * 1991-12-09 1994-05-03 Minnesota Mining And Manufacturing Company Liquid applicator with metering insert
US5895111A (en) * 1992-04-08 1999-04-20 Anthony's Manufacturing Company, Inc. Display case with lens lighting system
ATE166771T1 (de) * 1992-04-08 1998-06-15 Anthony S Mfg Co Schauschrank und ein mit linsen ausgerüstetes lichtsystem dafür
US5902034A (en) * 1992-04-08 1999-05-11 Anthony's Manufacturing Company, Inc. Display case with lens lighting system
US5359411A (en) * 1992-06-08 1994-10-25 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for evaluating the optical spatial response characteristics of objects
US5822091A (en) * 1993-02-22 1998-10-13 Baker; Kenneth M. Extreme depth-of-field optical lens and holographic projector system for its production
CA2114703A1 (en) * 1993-02-22 1994-08-23 Kenneth M. Baker Directional light filter and holographic projector system for its production
US5471372A (en) * 1993-12-06 1995-11-28 Ardco, Inc. Lighting system for commercial refrigerator doors
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
WO1997021120A1 (en) * 1995-12-01 1997-06-12 The University Of Sydney Ring interferometer configuration for writing gratings
GB9524862D0 (en) * 1995-12-06 1996-02-07 The Technology Partnership Plc Colour diffractive structure
JP3689490B2 (ja) * 1996-06-07 2005-08-31 キヤノン株式会社 ノズル部材の製造方法及びそれを用いた加工装置
EP0979426A4 (de) * 1996-06-10 2000-02-16 Holographic Lithography System Holographisches verfahren der musterherstellung und vorrichtung für prduktionsumgebungen
JP2002501669A (ja) 1996-06-10 2002-01-15 ホログラフィック リソグラフィー システムズ，インコーポレイティド フォトレジスト中に選択された別個のパターンを記録する干渉リソグラフィーパターンを変調するプロセス
TW358236B (en) * 1997-12-19 1999-05-11 Nanya Technology Corp Improved local silicon oxidization method in the manufacture of semiconductor isolation
TW460758B (en) 1998-05-14 2001-10-21 Holographic Lithography System A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
EP0964305A1 (de) * 1998-06-08 1999-12-15 Corning Incorporated Methode zur Herstellung eines photonischen Kristalls
US6622392B1 (en) * 1999-03-19 2003-09-23 Laser Alignment, Inc. Target with diffractive elements for use with laser beam generating devices
WO2000079345A1 (en) * 1999-06-22 2000-12-28 Massachusetts Institute Of Technology Acousto-optic light projector
US6707518B1 (en) 1999-07-12 2004-03-16 Coho Holdings, Llc Electro-optic device allowing wavelength tuning
AU767482B2 (en) * 1999-07-15 2003-11-13 University Of Sydney, The Method of writing grating structures
AUPQ165599A0 (en) * 1999-07-15 1999-08-05 University Of Sydney, The Optical processing method and apparatus and products thereof
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
AU2001268465A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
AU2001269837A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Process for producing microfluidic articles
US7166409B2 (en) * 2000-06-15 2007-01-23 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
EP1303791B1 (de) * 2000-06-15 2009-08-19 3M Innovative Properties Company Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
DE60114820T2 (de) * 2000-06-15 2006-09-14 3M Innovative Properties Co., St. Paul Mikroherstellungsverfahren für organische optische bauteile
KR100811017B1 (ko) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
US7092165B2 (en) * 2000-07-31 2006-08-15 Corning Incorporated Microlens arrays having high focusing efficiency
US6835535B2 (en) * 2000-07-31 2004-12-28 Corning Incorporated Microlens arrays having high focusing efficiency
DE60117573T2 (de) 2000-08-18 2006-12-14 Reflexite Corp., Avon Verschiedenartig gehärtete materialen und verfahren zur deren herstellung
US7230764B2 (en) * 2000-08-18 2007-06-12 Reflexite Corporation Differentially-cured materials and process for forming same
US20040190102A1 (en) * 2000-08-18 2004-09-30 Mullen Patrick W. Differentially-cured materials and process for forming same
AU2001295694A1 (en) * 2000-10-13 2002-04-22 Highwave Optical Technologies Marseille Optical filters, method for making same and use thereof for a multiplex system
FR2815417B1 (fr) * 2000-10-13 2003-10-31 Shakticom Filtre optique, son procede de fabrication et son utilisation pour un systeme multiplex
AUPR158300A0 (en) * 2000-11-20 2000-12-14 Amcor Packaging (Australia) Pty Ltd Method for forming perforations in film
JP2003131390A (ja) * 2001-03-22 2003-05-09 Seiko Epson Corp 微細構造体の製造方法、電子装置の製造方法及び製造装置
DE10137860A1 (de) * 2001-04-12 2002-11-21 Tesa Ag Verfahren und Vorrichtung zum Herstellen von individualisierten Hologrammen
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US20030214690A1 (en) * 2001-11-26 2003-11-20 Escuti Michael J. Holographic polymer photonic crystal
JP4308467B2 (ja) * 2001-12-27 2009-08-05 新光電気工業株式会社 露光方法及び露光装置
AU2003217542A1 (en) * 2002-02-15 2003-09-09 Janusz Murakowski Process for making photonic crystal circuits using an electron beam and ultraviolet lithography combination
JP2003315973A (ja) * 2002-04-19 2003-11-06 Fujitsu Ltd マスク設計装置、マスク設計方法、プログラムおよび半導体装置製造方法
US7006747B2 (en) * 2003-01-17 2006-02-28 3M Innovative Properties Company Optical devices incorporating photo reactive polymers
US7354519B1 (en) 2003-02-03 2008-04-08 Hutchinson Technology Incorporated Method and apparatus for fabricating a stent
US7330315B2 (en) * 2003-05-02 2008-02-12 Reflexite Corporation Light-redirecting optical structures
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
US20060109532A1 (en) * 2004-11-19 2006-05-25 Savas Timothy A System and method for forming well-defined periodic patterns using achromatic interference lithography
US8187481B1 (en) 2005-05-05 2012-05-29 Coho Holdings, Llc Random texture anti-reflection optical surface treatment
US7897058B2 (en) * 2006-02-13 2011-03-01 Asml Netherlands B.V. Device manufacturing method and computer program product
US8582079B2 (en) * 2007-08-14 2013-11-12 Applied Materials, Inc. Using phase difference of interference lithography for resolution enhancement
US20100002210A1 (en) * 2007-08-31 2010-01-07 Applied Materials, Inc. Integrated interference-assisted lithography
US20090117491A1 (en) * 2007-08-31 2009-05-07 Applied Materials, Inc. Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques
US20090111056A1 (en) * 2007-08-31 2009-04-30 Applied Materials, Inc. Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques
TW200933223A (en) * 2008-01-31 2009-08-01 Univ Nat Taiwan Method for preparing photonic crystal slab waveguides
KR101560617B1 (ko) * 2008-09-10 2015-10-16 삼성전자주식회사 광 발생 장치 및 그 제어 방법
US8833216B2 (en) * 2009-08-10 2014-09-16 Amcor Limited Method and an apparatus for perforating polymeric film
US8636424B2 (en) 2010-10-22 2014-01-28 Panduit Corp. Optical communication connector
US11493701B2 (en) 2010-10-22 2022-11-08 Panduit Corp. Optical communications connectors
US8642232B2 (en) * 2011-11-18 2014-02-04 Periodic Structures, Inc. Method of direct writing with photons beyond the diffraction limit
CN102799063B (zh) * 2012-07-20 2013-11-20 北京科技大学 一种光刻胶模板及图案化ZnO纳米棒阵列的制备方法
TWI484307B (zh) * 2012-10-29 2015-05-11 Nat Univ Tsing Hua 以光纖作為空間濾波器與擴束器之雷射干涉微影設備
US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
JP2015129894A (ja) 2014-01-09 2015-07-16 セイコーエプソン株式会社 マイクロレンズアレイ、マイクロレンズアレイの製造方法、電気光学装置、及び電子機器
US20150248060A1 (en) * 2014-02-28 2015-09-03 Konica Minolta Laboratory U.S.A., Inc. Method of making thermal insulation film and thermal insulation film product
JP6547283B2 (ja) * 2014-12-02 2019-07-24 ウシオ電機株式会社 基板上構造体の製造方法
JP6953109B2 (ja) * 2015-09-24 2021-10-27 ウシオ電機株式会社 基板上構造体の製造方法
CN110806680B (zh) * 2019-10-31 2020-11-24 清华大学 激光干涉光刻系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3732363A (en) * 1971-08-16 1973-05-08 Columbia Broadcasting Syst Inc Information record utilizing diffraction grating and methods of recording and reproducing the information thereof
DE3125317A1 (de) * 1980-06-27 1982-04-01 Canon K.K., Tokyo Einstellscheibe

Also Published As

Publication number Publication date
US4496216A (en) 1985-01-29
WO1984002781A1 (en) 1984-07-19
AU563318B2 (en) 1987-07-02
AU2432284A (en) 1984-08-02
CA1207580A (en) 1986-07-15
EP0130214A1 (de) 1985-01-09
EP0130214B1 (de) 1987-11-11
JPS60500100A (ja) 1985-01-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee